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1.
公开(公告)号:US08052885B2
公开(公告)日:2011-11-08
申请号:US11622625
申请日:2007-01-12
申请人: Mehran Naser-Ghodsi , Garrett Pickard , Rudy F. Garcia , Ming Lun Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles K. MacDonald
发明人: Mehran Naser-Ghodsi , Garrett Pickard , Rudy F. Garcia , Ming Lun Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles K. MacDonald
IPC分类号: B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , H01L21/302 , H01L21/461
CPC分类号: C23F4/00 , G02B5/1857 , H01J2237/31744 , H01L21/3065 , H01L21/32136 , H01L29/66795
摘要: Structural modification using electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Structural modifications of the target may be conducted by means of etching due to interaction between the electron beam and gas composition.
摘要翻译: 公开了使用电子束活化化学蚀刻(EBACE)的结构修饰。 当气体组合物和/或靶暴露于电子束时,靶或其部分可暴露于蚀刻靶的类型的气体组合物。 通过在气体组合物附近引导电子束朝向靶,电子束和气体组成之间的相互作用会蚀刻暴露于气体组成和电子束两者的靶的一部分。 由于电子束和气体组成之间的相互作用,靶的结构修饰可以通过蚀刻进行。
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2.
公开(公告)号:US07879730B2
公开(公告)日:2011-02-01
申请号:US11622605
申请日:2007-01-12
申请人: Mehran Naser-Ghodsi , Garrett Pickard , Rudy F. Garcia , Tzu-Chin Chuang , Ming Lun Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles K. MacDonald
发明人: Mehran Naser-Ghodsi , Garrett Pickard , Rudy F. Garcia , Tzu-Chin Chuang , Ming Lun Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles K. MacDonald
IPC分类号: H01L21/302 , H01L21/461
CPC分类号: C23F4/00 , H01J2237/31744 , H01L21/3065 , H01L21/32136
摘要: Etch selectivity enhancement during electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Selectivity of etching of the target due to interaction between the electron beam and gas composition may be enhanced in a number of ways.
摘要翻译: 公开了电子束激活化学蚀刻(EBACE)期间的蚀刻选择性增强。 当气体组合物和/或靶暴露于电子束时,靶或其部分可暴露于蚀刻靶的类型的气体组合物。 通过在气体组合物附近引导电子束朝向靶,电子束和气体组成之间的相互作用会蚀刻暴露于气体组成和电子束两者的靶的一部分。 可以以多种方式增强由于电子束和气体组成之间的相互作用而导致的靶的蚀刻选择性。
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3.
公开(公告)号:US20070158304A1
公开(公告)日:2007-07-12
申请号:US11622605
申请日:2007-01-12
申请人: Mehran Nasser-Ghodsi , Garrett Pickard , Rudy Garcia , Tzu-Chin Chuang , Ming Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles MacDonald
发明人: Mehran Nasser-Ghodsi , Garrett Pickard , Rudy Garcia , Tzu-Chin Chuang , Ming Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles MacDonald
CPC分类号: C23F4/00 , H01J2237/31744 , H01L21/3065 , H01L21/32136
摘要: Etch selectivity enhancement during electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Selectivity of etching of the target due to interaction between the electron beam and gas composition may be enhanced in a number of ways.
摘要翻译: 公开了电子束激活化学蚀刻(EBACE)期间的蚀刻选择性增强。 当气体组合物和/或靶暴露于电子束时,靶或其部分可暴露于蚀刻靶的类型的气体组合物。 通过在气体组合物附近引导电子束朝向靶,电子束和气体组成之间的相互作用会蚀刻暴露于气体组成和电子束两者的靶的一部分。 可以以多种方式增强由于电子束和气体组成之间的相互作用而导致的靶的蚀刻选择性。
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4.
公开(公告)号:US20070158303A1
公开(公告)日:2007-07-12
申请号:US11622625
申请日:2007-01-12
申请人: MEHRAN NASSER-GHODSI , Garrett Pickard , Rudy Garcia , Ming Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles MacDonald
发明人: MEHRAN NASSER-GHODSI , Garrett Pickard , Rudy Garcia , Ming Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles MacDonald
CPC分类号: C23F4/00 , G02B5/1857 , H01J2237/31744 , H01L21/3065 , H01L21/32136 , H01L29/66795
摘要: Structural modification using electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Structural modifications of the target may be conducted by means of etching due to interaction between the electron beam and gas composition.
摘要翻译: 公开了使用电子束活化化学蚀刻(EBACE)的结构修饰。 当气体组合物和/或靶暴露于电子束时,靶或其部分可暴露于蚀刻靶的类型的气体组合物。 通过在气体组合物附近引导电子束朝向靶,电子束和气体组成之间的相互作用会蚀刻暴露于气体组成和电子束两者的靶的一部分。 由于电子束和气体组成之间的相互作用,靶的结构修饰可以通过蚀刻进行。
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5.
公开(公告)号:US07709792B2
公开(公告)日:2010-05-04
申请号:US11622758
申请日:2007-01-12
申请人: Mehran Naser-Ghodsi , Tzu-Chin Chuang , Kenneth Krzeczowski , Matthew Lent , Chris Huang , Stanislaw Marek Borowicz
发明人: Mehran Naser-Ghodsi , Tzu-Chin Chuang , Kenneth Krzeczowski , Matthew Lent , Chris Huang , Stanislaw Marek Borowicz
IPC分类号: H01J37/28 , H01J37/305 , G01N23/225
CPC分类号: H01J37/28 , H01J2237/226 , H01J2237/2611 , H01J2237/3174
摘要: Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas composition includes one or more components that etch the substrate upon activation by interaction with a beam of electrons. A beam of electrons is directed to one or more portions of the surface of the substrate that are exposed to the gas composition to etch the one or more portions. A plurality of images is obtained of the one or more portions at different instances of time as the one or more portions are etched. A three-dimensional model of one or more structures embedded within the one or more portions of the substrate is generated from the plurality of images.
摘要翻译: 公开了用于对结构进行成像和相关处理器可读介质的方法和装置。 将基材(或其一部分)的表面暴露于气体组合物。 气体组合物包括一种或多种在通过与电子束的相互作用激活时蚀刻衬底的组分。 电子束被引导到暴露于气体组合物的衬底的表面的一个或多个部分以蚀刻一个或多个部分。 当蚀刻一个或多个部分时,在不同的时间点获得一个或多个部分的多个图像。 从多个图像生成嵌入在基板的一个或多个部分内的一个或多个结构的三维模型。
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6.
公开(公告)号:US20070158562A1
公开(公告)日:2007-07-12
申请号:US11622758
申请日:2007-01-12
申请人: MEHRAN NASSER-GHODSI , Tzu-Chin Chuang , Kenneth Krzeczowski , Matthew Lent , Chris Huang , Stanislaw Borowicz
发明人: MEHRAN NASSER-GHODSI , Tzu-Chin Chuang , Kenneth Krzeczowski , Matthew Lent , Chris Huang , Stanislaw Borowicz
IPC分类号: G21K7/00
CPC分类号: H01J37/28 , H01J2237/226 , H01J2237/2611 , H01J2237/3174
摘要: Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas composition includes one or more components that etch the substrate upon activation by interaction with a beam of electrons. A beam of electrons is directed to one or more portions of the surface of the substrate that are exposed to the gas composition to etch the one or more portions. A plurality of images is obtained of the one or more portions at different instances of time as the one or more portions are etched. A three-dimensional model of one or more structures embedded within the one or more portions of the substrate is generated from the plurality of images.
摘要翻译: 公开了用于对结构进行成像和相关处理器可读介质的方法和装置。 将基材(或其一部分)的表面暴露于气体组合物。 气体组合物包括一种或多种在通过与电子束的相互作用激活时蚀刻衬底的组分。 电子束被引导到暴露于气体组合物的衬底的表面的一个或多个部分以蚀刻一个或多个部分。 当蚀刻一个或多个部分时,在不同的时间点获得一个或多个部分的多个图像。 从多个图像生成嵌入在基板的一个或多个部分内的一个或多个结构的三维模型。
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7.
公开(公告)号:US07838833B1
公开(公告)日:2010-11-23
申请号:US11998502
申请日:2007-11-30
申请人: Matthew Lent , Stanislaw Marek Borowicz , Mehran Nasser-Ghodsi , Niles Kenneth MacDonald , Ye Yang , Kenneth J. Krzeczowski
发明人: Matthew Lent , Stanislaw Marek Borowicz , Mehran Nasser-Ghodsi , Niles Kenneth MacDonald , Ye Yang , Kenneth J. Krzeczowski
IPC分类号: G01N23/00
CPC分类号: G01N23/2251 , H01J37/263 , H01J37/28 , H01J37/2955 , H01J2237/24475 , H01J2237/2804
摘要: A method of imaging using an electron beam. An incident electron beam is focused onto the specimen surface, a scattered electron beam is extracted from the specimen surface, and a plurality of dark field signals are detected using a detection system. An interpolated dark field signal is generated using the plurality of dark field signals. In addition, a bright field signal may be detected using the detection system, and a final interpolated signal may be generated using the interpolated dark field signal and the bright field signal. User input may be received which determines a degree of interpolation between two adjacent dark field signals so as to generate the interpolated dark field signal and which determines an amount of interpolation between the interpolated dark field signal and the bright field signal so as to generate a final interpolated signal. Other embodiments, aspects and features are also disclosed.
摘要翻译: 使用电子束成像的方法。 入射电子束被聚焦在样本表面上,从样本表面提取散射的电子束,并且使用检测系统检测多个暗场信号。 使用多个暗场信号产生内插暗场信号。 此外,可以使用检测系统检测亮场信号,并且可以使用内插的暗场信号和亮场信号来产生最终的内插信号。 可以接收确定两个相邻暗场信号之间的内插程度的用户输入,以产生内插的暗场信号,并确定内插暗场信号和亮场信号之间的内插量,以便产生最终的 内插信号。 还公开了其它实施例,方面和特征。
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8.
公开(公告)号:US06995369B1
公开(公告)日:2006-02-07
申请号:US10876833
申请日:2004-06-24
申请人: Matthew Lent , Amir Azordegan , Hedong Yang
发明人: Matthew Lent , Amir Azordegan , Hedong Yang
IPC分类号: H01J37/28
CPC分类号: H01J37/28 , G06T5/002 , G06T5/50 , G06T2207/10061 , H01J37/222
摘要: One embodiment disclosed relates to a scanning electron beam apparatus. The apparatus includes an electron beam column, a scanning system, and a detection system. Circuitry in the apparatus is configured to store detected pixel data from each scan into one of the multiple frame buffers. A multi-frame data processor is configured to analyze the pixel data available in the multiple frame buffers. Another embodiment disclosed relates to a scanning electron beam apparatus having a data processor is configured to process the image data with a filter function having a filter strength, store results of the processing, and repeat the processing and the storing using various filter strengths. The results of the processing may comprise a critical dimension measurement at each filter strength.
摘要翻译: 公开的一个实施例涉及一种扫描电子束装置。 该装置包括电子束柱,扫描系统和检测系统。 设备中的电路被配置为将来自每个扫描的检测到的像素数据存储到多个帧缓冲器之一中。 多帧数据处理器被配置为分析在多帧缓冲器中可用的像素数据。 所公开的另一实施例涉及一种具有数据处理器的扫描电子束装置,其配置为利用具有滤波强度的滤波器功能处理图像数据,存储处理结果,并且使用各种滤波器强度重复处理和存储。 处理的结果可以包括在每个过滤器强度下的临界尺寸测量。
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