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    THREE-DIMENSIONAL IMAGING USING ELECTRON BEAM ACTIVATED CHEMICAL ETCH
    4.
    发明申请
    THREE-DIMENSIONAL IMAGING USING ELECTRON BEAM ACTIVATED CHEMICAL ETCH 失效
    使用电子束激活化学蚀刻的三维成像

    公开(公告)号：US20070158562A1

    公开(公告)日：2007-07-12

    申请号：US11622758

    申请日：2007-01-12

    申请人： MEHRAN NASSER-GHODSI ,  Tzu-Chin Chuang ,  Kenneth Krzeczowski ,  Matthew Lent ,  Chris Huang ,  Stanislaw Borowicz

    发明人： MEHRAN NASSER-GHODSI ,  Tzu-Chin Chuang ,  Kenneth Krzeczowski ,  Matthew Lent ,  Chris Huang ,  Stanislaw Borowicz

    IPC分类号： G21K7/00

    CPC分类号： H01J37/28 ,  H01J2237/226 ,  H01J2237/2611 ,  H01J2237/3174

    摘要： Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas composition includes one or more components that etch the substrate upon activation by interaction with a beam of electrons. A beam of electrons is directed to one or more portions of the surface of the substrate that are exposed to the gas composition to etch the one or more portions. A plurality of images is obtained of the one or more portions at different instances of time as the one or more portions are etched. A three-dimensional model of one or more structures embedded within the one or more portions of the substrate is generated from the plurality of images.

    摘要翻译： 公开了用于对结构进行成像和相关处理器可读介质的方法和装置。 将基材（或其一部分）的表面暴露于气体组合物。 气体组合物包括一种或多种在通过与电子束的相互作用激活时蚀刻衬底的组分。 电子束被引导到暴露于气体组合物的衬底的表面的一个或多个部分以蚀刻一个或多个部分。 当蚀刻一个或多个部分时，在不同的时间点获得一个或多个部分的多个图像。 从多个图像生成嵌入在基板的一个或多个部分内的一个或多个结构的三维模型。

    Three-dimensional imaging using electron beam activated chemical etch
    6.
    发明授权
    Three-dimensional imaging using electron beam activated chemical etch 失效
    使用电子束激活化学蚀刻的三维成像

    公开(公告)号：US07709792B2

    公开(公告)日：2010-05-04

    申请号：US11622758

    申请日：2007-01-12

    申请人： Mehran Naser-Ghodsi ,  Tzu-Chin Chuang ,  Kenneth Krzeczowski ,  Matthew Lent ,  Chris Huang ,  Stanislaw Marek Borowicz

    发明人： Mehran Naser-Ghodsi ,  Tzu-Chin Chuang ,  Kenneth Krzeczowski ,  Matthew Lent ,  Chris Huang ,  Stanislaw Marek Borowicz

    IPC分类号： H01J37/28 ,  H01J37/305 ,  G01N23/225

    CPC分类号： H01J37/28 ,  H01J2237/226 ,  H01J2237/2611 ,  H01J2237/3174

    摘要： Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas composition includes one or more components that etch the substrate upon activation by interaction with a beam of electrons. A beam of electrons is directed to one or more portions of the surface of the substrate that are exposed to the gas composition to etch the one or more portions. A plurality of images is obtained of the one or more portions at different instances of time as the one or more portions are etched. A three-dimensional model of one or more structures embedded within the one or more portions of the substrate is generated from the plurality of images.

    摘要翻译： 公开了用于对结构进行成像和相关处理器可读介质的方法和装置。 将基材（或其一部分）的表面暴露于气体组合物。 气体组合物包括一种或多种在通过与电子束的相互作用激活时蚀刻衬底的组分。 电子束被引导到暴露于气体组合物的衬底的表面的一个或多个部分以蚀刻一个或多个部分。 当蚀刻一个或多个部分时，在不同的时间点获得一个或多个部分的多个图像。 从多个图像生成嵌入在基板的一个或多个部分内的一个或多个结构的三维模型。

    Methods and Systems for Creating a Recipe for a Defect Review Process
    7.
    发明申请
    Methods and Systems for Creating a Recipe for a Defect Review Process 有权
    创建缺陷审查流程的方法和系统

    公开(公告)号：US20070067134A1

    公开(公告)日：2007-03-22

    申请号：US11533597

    申请日：2006-09-20

    申请人： S. Borowicz ,  Mehran Nasser-Ghodsi ,  Kenneth Krzeczowski

    发明人： S. Borowicz ,  Mehran Nasser-Ghodsi ,  Kenneth Krzeczowski

    IPC分类号： G01D1/00

    CPC分类号： G05B19/41875 ,  G05B2219/31304 ,  G05B2219/37206 ,  G05B2219/37224 ,  G06Q50/04 ,  G06T7/0004 ,  G06T2207/30148 ,  Y02P90/10 ,  Y02P90/20 ,  Y02P90/22 ,  Y02P90/30

    摘要： Methods and systems for creating a recipe for a defect review process are provided. One method includes determining an identity of a specimen on which the defect review process will be performed. The method also includes identifying inspection results for the specimen based on the identity. In addition, the method includes creating the recipe for the defect review process based on the inspection results. One system includes a sensor configured to generate output responsive to an identity of a specimen on which the defect review process will be performed. The system also includes a processor configured to determine the identity of the specimen using the output, to identify inspection results for the specimen based on the identity, and to create the recipe for the defect review process based on the inspection results.

    摘要翻译： 提供了用于创建缺陷审查过程的配方的方法和系统。 一种方法包括确定将在其上执行缺陷评估处理的样本的身份。 该方法还包括基于身份识别样本的检查结果。 此外，该方法包括基于检查结果创建缺陷评估过程的配方。 一个系统包括被配置为响应于将在其上执行缺陷评估处理的样本的身份产生输出的传感器。 该系统还包括处理器，其被配置为使用输出来确定样本的身份，基于身份识别样本的检查结果，并且基于检查结果创建缺陷评估过程的配方。