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公开(公告)号：US07635842B2
公开(公告)日：2009-12-22
申请号：US12032526
申请日：2008-02-15
申请人： Mehran Nasser-Ghodsi , Ming Lun Yu , Stuart Friedman , Gabor Toth
发明人： Mehran Nasser-Ghodsi , Ming Lun Yu , Stuart Friedman , Gabor Toth
IPC分类号： H01J49/08 , G01N23/227 , G01N23/22
CPC分类号： G01N23/2276
摘要： A method and the instrument for characterization of the defects on a surface with Auger electron spectroscopy in a high vacuum environment are disclosed. Defects on the surface of a sample may be characterized with Auger electron spectroscopy in a high vacuum environment.
摘要翻译： 公开了一种在高真空环境中用俄歇电子能谱表征表面缺陷的方法和仪器。 样品表面的缺陷可以在高真空环境下用俄歇电子能谱表征。
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2.发明申请公开(公告)号：US20080197277A1
公开(公告)日：2008-08-21
申请号：US12032526
申请日：2008-02-15
申请人： Mehran Nasser-Ghodsi , Ming Lun Yu , Stuart Friedman , Gabor Toth
发明人： Mehran Nasser-Ghodsi , Ming Lun Yu , Stuart Friedman , Gabor Toth
IPC分类号： H01J40/00
CPC分类号： G01N23/2276
摘要： A method and the instrument for characterization of the defects on a surface with Auger electron spectroscopy in a high vacuum environment are disclosed. Defects on the surface of a sample may be characterized with Auger electron spectroscopy in a high vacuum environment at a pressure of about 10−7 Torr to 10−6 Torr.
摘要翻译： 公开了一种在高真空环境中用俄歇电子能谱表征表面缺陷的方法和仪器。 样品表面的缺陷可以在高真空环境中以约10 -7乇至10 -6乇的压力进行俄歇电子能谱表征。
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公开(公告)号：US08237120B1
公开(公告)日：2012-08-07
申请号：US12561974
申请日：2009-09-17
申请人： Gabor Toth , Rudy Garcia , Mehran Nasser-Ghodsi , Khashayar Shadman , Ming Lun Yu , Stuart Friedman
发明人： Gabor Toth , Rudy Garcia , Mehran Nasser-Ghodsi , Khashayar Shadman , Ming Lun Yu , Stuart Friedman
IPC分类号： G01N23/225
CPC分类号： G01N23/2251
摘要： A defect may be characterized using primary radiation directed from a primary electron source to a measurement location on the sample. An electron energy analyzer may capture secondary electrons emitted from the measurement location in a focusing direction by an electron energy analyzer. A transverse focusing device may focus electrons emitted from the measurement location in a transverse direction that is perpendicular to the focusing direction.
摘要翻译： 可以使用从初级电子源引导到样品上的测量位置的主辐射来表征缺陷。 电子能量分析仪可以通过电子能量分析仪捕获从聚焦方向从测量位置发射的二次电子。 横向聚焦装置可以在垂直于聚焦方向的横向上聚焦从测量位置发射的电子。
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公开(公告)号：US08008207B2
公开(公告)日：2011-08-30
申请号：US11752829
申请日：2007-05-23
申请人： Ming Lun Yu , Mehran Nasser-Ghodsi
发明人： Ming Lun Yu , Mehran Nasser-Ghodsi
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： G03F7/2043 , H01J2237/31732 , H01J2237/3174 , H01J2237/31744 , H01L21/02057 , H01L21/3065 , H01L21/31116 , H01L21/32136
摘要： A method for controlling chemical dry etching to improve smoothness of an etched surface is disclosed. Ions are implanted into a surface to form a volatilizable compound at a temperature low enough to avoid, reduce, or eliminate formation of three-dimensional structures of the volatilizable compound that might create the roughness at an etched surface of the volatilizable compound. The ions are applied in a sufficient energy to penetrate to a predetermined depth of material that is to be removed from the surface in an etching cycle, and in a sufficient dosage to achieve full formation of the volatilizable compound. The surface of the volatilizable compound is exposed to a gas composition for a time duration sufficient to completely etch the volatilizable compound.
摘要翻译： 公开了一种用于控制化学干蚀刻以改善蚀刻表面的平滑度的方法。 将离子植入表面以在足够低的温度下形成可挥发化合物，以避免，减少或消除可挥发化合物的三维结构的形成，这可能在可挥发化合物的蚀刻表面产生粗糙度。 以足够的能量施加离子以在蚀刻循环中渗透到要从表面除去的预定深度的材料，并以足够的剂量实现完全形成可挥发化合物。 可挥发化合物的表面暴露于气体组合物持续足够时间以完全蚀刻可挥发化合物。
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公开(公告)号：US08646408B2
公开(公告)日：2014-02-11
申请号：US12981759
申请日：2010-12-30
CPC分类号： G01N21/5907 , C23C14/544 , G01N21/3103 , G01N21/39 , G01N2021/399
摘要： A flux monitor system includes a light source and a sensor.
摘要翻译： 通量监测系统包括光源和传感器。
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公开(公告)号：US20120021556A1
公开(公告)日：2012-01-26
申请号：US13189251
申请日：2011-07-22
申请人： Markus E. Beck , Ashish Bodke , Ulrich Alexander Bonne , Benyamin Buller , Raffi Garabedian , Erel Milshtein , Ming Lun Yu
发明人： Markus E. Beck , Ashish Bodke , Ulrich Alexander Bonne , Benyamin Buller , Raffi Garabedian , Erel Milshtein , Ming Lun Yu
IPC分类号： H01L31/18 , C23C16/448 , H01L21/20
CPC分类号： C23C14/0623 , C23C14/0021 , C23C14/243 , C23C14/5866 , H01L21/02568 , H01L21/02631 , H01L31/0322 , Y02E10/541 , Y02P70/521
摘要： A selenium deposition system can improve the selenium vapor distribution.
摘要翻译： 硒沉积系统可以提高硒蒸气分布。
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公开(公告)号：US20110165315A1
公开(公告)日：2011-07-07
申请号：US12981759
申请日：2010-12-30
CPC分类号： G01N21/5907 , C23C14/544 , G01N21/3103 , G01N21/39 , G01N2021/399
摘要： A flux monitor system includes a light source and a sensor.
摘要翻译： 通量监测系统包括光源和传感器。
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公开(公告)号：US07879730B2
公开(公告)日：2011-02-01
申请号：US11622605
申请日：2007-01-12
申请人： Mehran Naser-Ghodsi , Garrett Pickard , Rudy F. Garcia , Tzu-Chin Chuang , Ming Lun Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles K. MacDonald
发明人： Mehran Naser-Ghodsi , Garrett Pickard , Rudy F. Garcia , Tzu-Chin Chuang , Ming Lun Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles K. MacDonald
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： C23F4/00 , H01J2237/31744 , H01L21/3065 , H01L21/32136
摘要： Etch selectivity enhancement during electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Selectivity of etching of the target due to interaction between the electron beam and gas composition may be enhanced in a number of ways.
摘要翻译： 公开了电子束激活化学蚀刻（EBACE）期间的蚀刻选择性增强。 当气体组合物和/或靶暴露于电子束时，靶或其部分可暴露于蚀刻靶的类型的气体组合物。 通过在气体组合物附近引导电子束朝向靶，电子束和气体组成之间的相互作用会蚀刻暴露于气体组成和电子束两者的靶的一部分。 可以以多种方式增强由于电子束和气体组成之间的相互作用而导致的靶的蚀刻选择性。
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公开(公告)号：US08734536B2
公开(公告)日：2014-05-27
申请号：US13187842
申请日：2011-07-21
申请人： Markus E. Beck , Ming Lun Yu
发明人： Markus E. Beck , Ming Lun Yu
IPC分类号： H01L21/66
CPC分类号： H01L22/20 , G01J3/02 , G01J3/0208 , G01J3/0218 , G01J3/0232 , G01J3/0286 , G01J3/28 , G01J3/44 , G01J3/4412 , G01J5/0846 , G01N21/65 , G01N2201/1211 , H01L31/0322 , H01L31/18 , Y10T29/41
摘要： A temperature-adjusted spectrometer can include a light source and a temperature sensor.
摘要翻译： 温度调节光谱仪可以包括光源和温度传感器。
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公开(公告)号：US08052885B2
公开(公告)日：2011-11-08
申请号：US11622625
申请日：2007-01-12
申请人： Mehran Naser-Ghodsi , Garrett Pickard , Rudy F. Garcia , Ming Lun Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles K. MacDonald
发明人： Mehran Naser-Ghodsi , Garrett Pickard , Rudy F. Garcia , Ming Lun Yu , Kenneth Krzeczowski , Matthew Lent , Sergey Lopatin , Chris Huang , Niles K. MacDonald
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , H01L21/302 , H01L21/461
CPC分类号： C23F4/00 , G02B5/1857 , H01J2237/31744 , H01L21/3065 , H01L21/32136 , H01L29/66795
摘要： Structural modification using electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Structural modifications of the target may be conducted by means of etching due to interaction between the electron beam and gas composition.
摘要翻译： 公开了使用电子束活化化学蚀刻（EBACE）的结构修饰。 当气体组合物和/或靶暴露于电子束时，靶或其部分可暴露于蚀刻靶的类型的气体组合物。 通过在气体组合物附近引导电子束朝向靶，电子束和气体组成之间的相互作用会蚀刻暴露于气体组成和电子束两者的靶的一部分。 由于电子束和气体组成之间的相互作用，靶的结构修饰可以通过蚀刻进行。
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