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    Lithographic apparatus and device manufacturing method
    6.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07256866B2

    公开(公告)日：2007-08-14

    申请号：US10961391

    申请日：2004-10-12

    申请人： Henrikus Herman Marie Cox ,  Hans Butler ,  Ronald Casper Kunst ,  Harmen Klaas Van Der Schoot ,  Youssef Karel Maria De Vos

    发明人： Henrikus Herman Marie Cox ,  Hans Butler ,  Ronald Casper Kunst ,  Harmen Klaas Van Der Schoot ,  Youssef Karel Maria De Vos

    IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

    CPC分类号： G03F7/70725

    摘要： To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.

    摘要翻译： 为了实现光刻设备的图形支撑件或基板台的高加速度和高移动速度，图案支撑件和基板台之一由用于较大位移的致动器支撑，而省略了用于精确定位的致动器。 图案支撑件和衬底台中的另一个由包括用于精确定位的致动器和用于相对较大位移的致动器的致动器组件支撑。 图案形成装置和基板的对准精度通过提供一种控制系统来实现，该控制系统适于将图案支撑件和基板台中的另一个定位成使得图案支撑件和基板台之一的定位误差为 通过另一个的定位来补偿。

    Lithographic apparatus and device manufacturing method
    7.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07492440B2

    公开(公告)日：2009-02-17

    申请号：US10936712

    申请日：2004-09-09

    申请人： Koen Jacobus Johannes Maria Zaal ,  Edwin Johan Buis ,  Henrikus Herman Marie Cox ,  Noud Jan Gilissen ,  Harmen Klaas Van Der Schoot

    发明人： Koen Jacobus Johannes Maria Zaal ,  Edwin Johan Buis ,  Henrikus Herman Marie Cox ,  Noud Jan Gilissen ,  Harmen Klaas Van Der Schoot

    IPC分类号： G02B27/52 ,  G02B27/42 ,  H02K41/00

    CPC分类号： G03F7/70716 ,  G03F7/709

    摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

    摘要翻译： 在光刻设备中使用的基板或图案形成装置以及光刻装置的制造方法。 衬底和图案形成装置相对于图案化束对准并且由支撑件可移动地支撑。 然而，所述支撑件中的共振可能使制造的装置不可用和/或可能使控制系统复杂化。 因此，具有耦合到支撑件的柔性耦合装置的致动器组件框架设置有多个致动器，其构造成以多个自由度移动支撑件。 因此，谐振被柔性耦合装置阻尼，导致用于控制系统的较大带宽，从而使得支撑件具有更好的位置精度。

    Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
    9.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing substrate stage compensating 有权
    利用基板台补偿的平版印刷设备和器件制造方法

    公开(公告)号：US07292317B2

    公开(公告)日：2007-11-06

    申请号：US11147467

    申请日：2005-06-08

    申请人： Henrikus Herman Marie Cox ,  Hernes Jacobs ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters

    发明人： Henrikus Herman Marie Cox ,  Hernes Jacobs ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters

    IPC分类号： G03B27/58

    CPC分类号： G03F7/709

    摘要： A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.

    摘要翻译： 光刻设备具有调节辐射束的照明系统和支持图案形成装置的图案形成装置支撑件。 图案形成装置对辐射束进行图案化。 光刻设备还具有支撑基板的基板支撑件，支撑基板支撑件的机架，将图案化的光束投影到基板的目标部分上的投影系统以及将基板支撑件移动到基​​板支撑驱动器 至少一个方向。 光刻设备可以具有反应物料，平衡物质，基底框架，其中基底支撑驱动器构造成在基底支撑体和反应块之间的至少一个方向上产生力，平衡块或支撑体 帧。