Method for manufacturing active matrix substrate
    2.
    发明授权
    Method for manufacturing active matrix substrate 有权
    有源矩阵基板的制造方法

    公开(公告)号:US06778232B2

    公开(公告)日:2004-08-17

    申请号:US10188743

    申请日:2002-07-05

    IPC分类号: G02F1136

    摘要: In a step for forming a contact through hole in a protective film that covers a Thin Film Transistor (TFT) to connect a source electrode of the TFT and a pixel electrode to each other, location of a later-formed contact through hole is designed to be apart not less than 2.0 &mgr;m from location of the opening of an overcoat layer, which opening is formed on the protective film. This construction forces the opening of a novolac type photosensitive resist to be positioned inside the location of the opening of the overcoat layer and therefore, the contact through hole formed in the protective film is able to have a tapered cross sectional profile that is never affected by the opening of the overcoat layer, allowing for stable connection between the source electrode and the pixel electrode.

    摘要翻译: 在覆盖薄膜晶体管(TFT)的保护膜中形成接触通孔的步骤中,将TFT的源电极和像素电极彼此连接,将稍后形成的接触通孔的位置设计为 从保护膜的开口的位置开始分开不小于2.0μm,该保护膜形成开口。 这种结构迫使酚醛清漆型光敏抗蚀剂的开口位于外涂层开口位置的内侧,因此形成在保护膜中的接触通孔能够具有从不受 覆盖层的开口,允许源电极和像素电极之间的稳定连接。

    Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same
    10.
    发明授权
    Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same 有权
    用于曝光的掩模和用于制造使用该液晶显示装置的方法

    公开(公告)号:US07067764B2

    公开(公告)日:2006-06-27

    申请号:US10676132

    申请日:2003-10-02

    摘要: Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.

    摘要翻译: 单个光罩中的曝光区域103和遮光区域104在纵向和横向方向彼此交替地排列。 通过使用该掩模版的多畴光曝光将基板曝光,使得光掩模的各个区域暴露于相应的照射A至B,B至C。 。 。 在分隔板的边界部分中,N到M彼此不相邻,用于执行各个镜头,从而缓和各镜头之间的照度差和镜头边界部分的完成差异,这些差异变成 在显示液晶显示装置时人眼难以察觉。