摘要:
For providing a recording/reproducing apparatus, for recording/reproducing information through conduction of electricity upon contact of a probe, having large recording density and a large transfer speed, but less in deterioration of a probe chips thereof, and being long in the lifetime thereof, within the recording/reproducing apparatus, a multi-chip is formed, disposing probe chips in large numbers thereof at a tip of a cantilever, while the cantilever is of a double-sided beam type, and the multi-chip is disposed at a center of the beam, wherein recording/reproducing portions of the multi-chip are disposed to correspond to recording dots one by one, and the multi-chip forming surface is moved up and down in parallel with the surface of a recording medium, due to suction force, so as to bring it to be in contact with the recording dots, and electricity is conducted after the contact thereof, thereby conducting the recording, in the structure; wherein, since a large amount of data can be read/written at one time, therefore it is possible to improve data transfer speed. Also, with conducting the R/W by means of the multi-chip, comparing to the single chip, it is possible to reduce the traveling distance of the multi-chip, thereby to reduce the abrasion. Also, since the tip portion of the said chip has the curvature radius, being large, such as, equal to 50 nm or greater than that, and since it moves in parallel with the surface of the recording medium, it can be in contact with the surface under the condition of, not the point contact, but near to the plane contact, therefore, the abrasion can be further reduced, effectively.
摘要:
For providing a recording/reproducing apparatus, for recording/reproducing information through conduction of electricity upon contact of a probe, having large recording density and a large transfer speed, but less in deterioration of a probe chips thereof, and being long in the lifetime thereof, within the recording/reproducing apparatus, a multi-chip is formed, disposing probe chips in large numbers thereof at a tip of a cantilever, while the cantilever is of a double-sided beam type, and the multi-chip is disposed at a center of the beam, wherein recording/reproducing portions of the multi-chip are disposed to correspond to recording dots one by one, and the multi-chip forming surface is moved up and down in parallel with the surface of a recording medium, due to suction force, so as to bring it to be in contact with the recording dots, and electricity is conducted after the contact thereof, thereby conducting the recording, in the structure; wherein, since a large amount of data can be read/written at one time, therefore it is possible to improve data transfer speed. Also, with conducting the R/W by means of the multi-chip, comparing to the single chip, it is possible to reduce the traveling distance of the multi-chip, thereby to reduce the abrasion. Also, since the tip portion of the said chip has the curvature radius, being large, such as, equal to 50 nm or greater than that, and since it moves in parallel with the surface of the recording medium, it can be in contact with the surface under the condition of, not the point contact, but near to the plane contact, therefore, the abrasion can be further reduced, effectively.
摘要:
In a recording/reproducing apparatus having a large number of probes, being still usable continuously when several pieces of the probes are in trouble, wherein a plural number of probes are so disposed that they can make recording and/or reproducing onto the same recording area, which is in charge of the probes, respectively, and when defect, such as, a trouble is generated within a first probe, that defect is detected, automatically, so as to exchanged into a spare probe built within the frame, thereby compensating the defect.
摘要:
In a recording/reproducing apparatus having a large number of probes, being still usable continuously when several pieces of the probes are in trouble, wherein a plural number of probes are so disposed that they can make recording and/or reproducing onto the same recording area, which is in charge of the probes, respectively, and when defect, such as, a trouble is generated within a first probe, that defect is detected, automatically, so as to exchanged into a spare probe built within the frame, thereby compensating the defect.
摘要:
An apparatus is used for diagnosing the temperature state of a catalyst converter. The catalyst converter includes a catalyst for cleaning an emission, and a conductive carrier for carrying the catalyst. The conductive carrier is energized for temperature rise of the catalyst, and the conductive carrier has a characteristic in which resistance drops with temperature increase. In the apparatus, a first obtaining unit obtains a first parameter having a first correlation with supply power to the conductive carrier for energization of the conductive carrier. A second obtaining unit obtains a second parameter having a second correlation with a temperature of the conductive carrier. A diagnosing unit diagnoses the temperature state of the conductive carrier based on a comparison between the first parameter and the second parameter.
摘要:
The present invention provides a method for manufacturing a group III nitride semiconductor light emitting element, with which warping can be suppressed upon the formation of respective layers on the substrate, a semiconductor layer including a light emitting layer of excellent crystallinity can be formed, and excellent light emission characteristics can be obtained; such a group III nitride semiconductor light emitting element; and a lamp. Specifically disclosed is a method for manufacturing a group III nitride semiconductor light emitting element, in which an intermediate layer, an underlayer, an n-type contact layer, an n-type cladding layer, a light emitting layer, a p-type cladding layer, and a p-type contact layer are laminated in sequence on a principal plane of a substrate, wherein a substrate having a diameter of 4 inches (100 mm) or larger, with having an amount of warping H within a range from 0.1 to 30 μm and at least a part of the edge of the substrate warping toward the principal plane at room temperature, is prepared as the substrate; the X-ray rocking curve full width at half maximum (FWHM) of the (0002) plane is 100 arcsec or less and the X-ray rocking curve FWHM of the (10-10) plane is 300 arcsec or less, in a state where the intermediate layer has been formed on the substrate and where thereafter the underlayer and the n-type contact layer are formed on the intermediate layer; and furthermore the n-type cladding layer, the light emitting layer, the p-type cladding layer, and the p-type contact layer are formed on the n-type contact layer.
摘要:
A side release buckle includes a plug and a socket into which the plug is inserted for engagement. The plug includes: a base provided with a belt attachment; a pair of legs projecting from the base; an engaging portion formed to the legs; and a connecting portion connecting the legs to each other. The socket includes: a body provided with a belt attachment and an insertion opening; a housing space formed in the body and housing the legs inserted from the insertion opening; an engaged portion formed in the body and engageable with the engaging portion; and a cutout dented toward the insertion opening from an edge of the belt attachment. The cutout is formed over an area surrounded by the legs and the connecting portion when the legs and the connecting portion are housed in the housing space while the engaging portion and the engaged portion are engaged.
摘要:
An imaging apparatus generates a GUI screen image for operating the imaging apparatus. A controller controls the generation of the GUI screen image upon detecting a predetermined operation.
摘要:
A power output apparatus for outputting power to a drive shaft includes a control unit that controls an internal combustion engine to perform an idle operation at a predetermined rotation speed, executes idle control amount learning, in which an idle control amount serving as a control amount obtained during the control is learned in accordance with establishment of a predetermined learning condition, within a range in which a rotation speed of the drive shaft is lower than a first speed, when the idle control amount learning is incomplete, and executes again the idle control amount learning within a range in which the rotation speed of the drive shaft is lower than a second speed, which is lower than the first speed, when the idle control amount learning is complete.
摘要:
A high-density N-type diffusion layer 116 formed in a separation area 115 makes it possible to reduce a collector current flowing through a parasitic NPN transistor 102. Thus, a normal CMOS process can be used to provide a driving circuit and a data line driver which make it possible to improve resistance to possible noise occurring between adjacent terminals, while controlling a chip size.