摘要:
An apparatus and method for controlling an application of power to power a plasma chamber. A detector detects actual power out from the power stage to the plasma chamber during a sampling interval. A compare module compares the actual power out during the sampling interval to a present power setting during the sampling interval and generates a compensation value. An adjust module updates the present power setting for the power stage with the compensation value to provide a new power setting for the power stage to control the power out from power stage to the plasma chamber during the deposition process whereby power losses occurring during the deposition process are compensated during the deposition process. If there is a fixed time period for the deposition process, the compensation method and apparatus may be used to compensate the deposition process for energy losses without extending the duration of the deposition process.
摘要:
An apparatus and method for controlling an application of power to power a plasma chamber. A detector detects actual power out from the power stage to the plasma chamber during a sampling interval. A compare module compares the actual power out during the sampling interval to a present power setting during the sampling interval and generates a compensation value. An adjust module updates the present power setting for the power stage with the compensation value to provide a new power setting for the power stage to control the power out from power stage to the plasma chamber during the deposition process whereby power losses occurring during the deposition process are compensated during the deposition process. If there is a fixed time period for the deposition process, the compensation method and apparatus may be used to compensate the deposition process for energy losses without extending the duration of the deposition process.
摘要:
Systems and methods are disclosed with multiple direct current (DC) voltage source inverters to supply power to an alternating current (AC) power system. The system includes a plurality of full bridge inverter stages, each having a primary node and a secondary node, each of said full bridge inverter stages having positive and negative node, each of said full bridge inverter stages having a voltage supporting device electrically connected in a parallel relationship between said positive node and said negative node and a direct current (DC) source connected between the positive and negative nodes; at least one stacked inverter phase, each stacked inverter phase having a plurality of said full bridge inverter stages, each of said full bridge inverter stages in each stacked inverter phase interconnected in a series relationship with said secondary node of one of said full bridge inverter stages connected to said primary node of another full bridge inverter, said series interconnection defining a first full bridge inverter stage and a last full bridge inverter stage, each phase having an input node at said primary node of said first full bridge inverter stage and an output node at said secondary node of said last full bridge inverter stage; a local controller coupled to each full bridge inverter stage providing the control signals to each full bridge inverter stage to output an approximate nearly sinusoidal voltage waveform; and a system controller which communicating with each local controller; the system controller generating system control signals for configuration, synchronization, activation, deactivation and operating mode selection of said local controller.
摘要:
A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.
摘要:
An interleaved soft switching bridge power converter comprises switching poles operated in an interleaved manner so as to substantially reduce turn-on switching losses and diode reverse-recovery losses in the switching pole elements. Switching poles are arranged into bridge circuits that are operated so as to provide a desired voltage, current and/or power waveform to a load. By reducing switching turn on and diode reverse recovery losses, soft switching power converters of the invention may operate efficiently at higher switching frequencies. Soft switching power converters of the invention are well suited to high power and high voltage applications such as plasma processing, active rectifiers, distributed generation, motor drive inverters and class D power amplifiers.
摘要:
A stacked voltage source inverter having separate DC sources is described herein. This inverter is applicable to low or medium voltage, low to medium power applications such as photovoltaic utility interface systems, battery storage application such as peak shaving with renewables, motor drive applications and for electric vehicle drive systems. The stacked inverter consists of at least one phase wherein each phase has a plurality of low voltage full bridge inverters equipped with an independent DC source. This inverter develops a near sinusoidal approximation voltage waveform with fast switching and small low pass AC output filter. A system controller controls operating parameters for each inverter. The inverter may have either single-phase or multi-phase embodiments connected in either wye or delta configurations.
摘要:
A multiple dc sources bi-directional energy converter includes a plurality of direct current (DC) power sources; one alternating current (AC) power source; at least one stacked alternating current (AC) phase, each stacked alternating current (AC) phase having at least two or more full bridge converters, each respectively coupled to one of the direct current power sources, each full bridge converter having an inductor electrically coupled thereto; and a local controller coupled to each full bridge converter controlling the firing sequence of the switching devices in said full bridge converter to generate an approximately nearly sinusoidal voltage waveform when operated as a voltage source inverter in one direction or generate an approximately nearly constant direct current (DC) output when operated as a full-wave active rectifier in the opposite direction.
摘要:
A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.
摘要:
Disclosed herein are an apparatus and method for charge-mode control. An embodiment of a charge mode controller may include an analog/digital converter configured to monitor the current through a duty cycle switch and convert the current to a switch current value; an accumulator module configured to integrate the switch current value during the switching cycle and output an accumulated charge value; and a comparator module responsive to the accumulated charge value and a charge set point configured to generate a gate drive signal for the duty cycle switch that turns the duty cycle switch ON when the accumulated charge value is less than the charge set point and turns the duty cycle switch OFF when the accumulated charge value reaches the charge set point and thereby controls the duty cycle of the converter and the power supplied by the power stage.
摘要:
A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.