Delivered energy compensation during plasma processing
    1.
    发明授权
    Delivered energy compensation during plasma processing 有权
    在等离子体处理期间提供能量补偿

    公开(公告)号:US08815329B2

    公开(公告)日:2014-08-26

    申请号:US12328831

    申请日:2008-12-05

    IPC分类号: G05F1/10 C23C16/52 H01J37/32

    摘要: An apparatus and method for controlling an application of power to power a plasma chamber. A detector detects actual power out from the power stage to the plasma chamber during a sampling interval. A compare module compares the actual power out during the sampling interval to a present power setting during the sampling interval and generates a compensation value. An adjust module updates the present power setting for the power stage with the compensation value to provide a new power setting for the power stage to control the power out from power stage to the plasma chamber during the deposition process whereby power losses occurring during the deposition process are compensated during the deposition process. If there is a fixed time period for the deposition process, the compensation method and apparatus may be used to compensate the deposition process for energy losses without extending the duration of the deposition process.

    摘要翻译: 一种用于控制对等离子体室供电的电力的应用的装置和方法。 在采样间隔期间,检测器检测从功率级到等离子体室的实际功率。 比较模块将采样间隔期间的实际功率输出与采样间隔期间的当前功率设置进行比较,并生成补偿值。 调整模块利用补偿值更新功率级的当前功率设置,以提供功率级的新功率设置,以在沉积过程中控制从功率级到等离子体室的功率,由此在沉积过程中发生功率损耗 在沉积过程中得到补偿。 如果沉积过程具有固定的时间段,则可以使用补偿方法和装置来补偿沉积过程中的能量损失,而不会延长沉积过程的持续时间。

    DELIVERED ENERGY COMPENSATION DURING PLASMA PROCESSING
    2.
    发明申请
    DELIVERED ENERGY COMPENSATION DURING PLASMA PROCESSING 有权
    在等离子体加工过程中提供能源补偿

    公开(公告)号:US20100141221A1

    公开(公告)日:2010-06-10

    申请号:US12328831

    申请日:2008-12-05

    IPC分类号: G05F1/10

    摘要: An apparatus and method for controlling an application of power to power a plasma chamber. A detector detects actual power out from the power stage to the plasma chamber during a sampling interval. A compare module compares the actual power out during the sampling interval to a present power setting during the sampling interval and generates a compensation value. An adjust module updates the present power setting for the power stage with the compensation value to provide a new power setting for the power stage to control the power out from power stage to the plasma chamber during the deposition process whereby power losses occurring during the deposition process are compensated during the deposition process. If there is a fixed time period for the deposition process, the compensation method and apparatus may be used to compensate the deposition process for energy losses without extending the duration of the deposition process.

    摘要翻译: 一种用于控制对等离子体室供电的电力的应用的装置和方法。 在采样间隔期间,检测器检测从功率级到等离子体室的实际功率。 比较模块将采样间隔期间的实际功率输出与采样间隔期间的当前功率设置进行比较,并生成补偿值。 调整模块利用补偿值更新功率级的当前功率设置,以提供功率级的新功率设置,以在沉积过程中控制从功率级到等离子体室的功率,由此在沉积过程中发生功率损耗 在沉积过程中得到补偿。 如果沉积过程具有固定的时间段,则可以使用补偿方法和装置来补偿沉积过程中的能量损失,而不会延长沉积过程的持续时间。

    Distributed voltage source inverters
    3.
    发明授权
    Distributed voltage source inverters 有权
    分布式电压源逆变器

    公开(公告)号:US09263971B2

    公开(公告)日:2016-02-16

    申请号:US13715655

    申请日:2012-12-14

    摘要: Systems and methods are disclosed with multiple direct current (DC) voltage source inverters to supply power to an alternating current (AC) power system. The system includes a plurality of full bridge inverter stages, each having a primary node and a secondary node, each of said full bridge inverter stages having positive and negative node, each of said full bridge inverter stages having a voltage supporting device electrically connected in a parallel relationship between said positive node and said negative node and a direct current (DC) source connected between the positive and negative nodes; at least one stacked inverter phase, each stacked inverter phase having a plurality of said full bridge inverter stages, each of said full bridge inverter stages in each stacked inverter phase interconnected in a series relationship with said secondary node of one of said full bridge inverter stages connected to said primary node of another full bridge inverter, said series interconnection defining a first full bridge inverter stage and a last full bridge inverter stage, each phase having an input node at said primary node of said first full bridge inverter stage and an output node at said secondary node of said last full bridge inverter stage; a local controller coupled to each full bridge inverter stage providing the control signals to each full bridge inverter stage to output an approximate nearly sinusoidal voltage waveform; and a system controller which communicating with each local controller; the system controller generating system control signals for configuration, synchronization, activation, deactivation and operating mode selection of said local controller.

    摘要翻译: 公开了具有多个直流(DC)电压源逆变器以向交流(AC)电力系统供电的系统和方法。 该系统包括多个全桥逆变器级,每个具有主节点和次节点,每个所述全桥逆变器级具有正节点和负节点,每个所述全桥逆变器级具有电连接在 所述正节点和所述负节点之间的并联关系和连接在所述正节点和所述负节点之间的直流(DC)源; 至少一个堆叠的逆变器相位,每个堆叠的逆变器相位具有多个所述全桥逆变器级,每个堆叠逆变器相中的每个所述全桥逆变器级与所述全桥逆变器级之一的所述次级节点串联连接 连接到另一全桥逆变器的所述主节点,所述串联互连定义第一全桥逆变器级和最后的全桥逆变器级,每相具有在所述第一全桥逆变器级的所述主节点处的输入节点和输出节点 在所述最后一个全桥逆变器级的所述次级节点处; 耦合到每个全桥逆变器级的本地控制器,向每个全桥逆变器级提供控制信号,以输出近似近似正弦的电压波形; 以及与每个本地控制器通信的系统控制器; 所述系统控制器产生用于所述本地控制器的配置,同步,激活,停用和操作模式选择的系统控制信号。

    Arc recovery with over-voltage protection for plasma-chamber power supplies
    4.
    发明授权
    Arc recovery with over-voltage protection for plasma-chamber power supplies 有权
    用于等离子体室电源的过电压保护的电弧恢复

    公开(公告)号:US08395078B2

    公开(公告)日:2013-03-12

    申请号:US12631735

    申请日:2009-12-04

    申请人: Milan Ilic

    发明人: Milan Ilic

    IPC分类号: B23K9/06

    摘要: A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.

    摘要翻译: 描述了用于管理传送到处理室的功率的系统和方法。 在一个实施例中,电流从等离子体处理室被拉出,同时在初始时间段期间开始向等离子体处理室施加电力,在初始时间段内电流的量被减少,从而增加量 在初始时间期间施加到等离子体处理室的功率。

    Interleaved soft switching bridge power converter
    5.
    发明申请
    Interleaved soft switching bridge power converter 失效
    交错式软开关桥式电源转换器

    公开(公告)号:US20070211507A1

    公开(公告)日:2007-09-13

    申请号:US11367905

    申请日:2006-03-03

    申请人: Milan Ilic

    发明人: Milan Ilic

    IPC分类号: H02M7/5387

    摘要: An interleaved soft switching bridge power converter comprises switching poles operated in an interleaved manner so as to substantially reduce turn-on switching losses and diode reverse-recovery losses in the switching pole elements. Switching poles are arranged into bridge circuits that are operated so as to provide a desired voltage, current and/or power waveform to a load. By reducing switching turn on and diode reverse recovery losses, soft switching power converters of the invention may operate efficiently at higher switching frequencies. Soft switching power converters of the invention are well suited to high power and high voltage applications such as plasma processing, active rectifiers, distributed generation, motor drive inverters and class D power amplifiers.

    摘要翻译: 交错式软开关桥式电源转换器包括以交错方式操作的开关极,以便大大减少开关极元件中的导通开关损耗和二极管反向恢复损耗。 开关极被布置成桥式电路,其被操作以向负载提供期望的电压,电流和/或功率波形。 通过减少开关导通和二极管反向恢复损耗,本发明的软开关功率转换器可以在更高的开关频率下有效地工作。 本发明的软开关电源转换器非常适用于诸如等离子处理,有源整流器,分布式发电,电机驱动逆变器和D类功率放大器之类的高功率和高电压应用。

    Stacked voltage source inverter with separate DC sources
    6.
    发明授权
    Stacked voltage source inverter with separate DC sources 有权
    具有独立直流电源的堆叠电压源逆变器

    公开(公告)号:US09143056B2

    公开(公告)日:2015-09-22

    申请号:US13357616

    申请日:2012-01-25

    摘要: A stacked voltage source inverter having separate DC sources is described herein. This inverter is applicable to low or medium voltage, low to medium power applications such as photovoltaic utility interface systems, battery storage application such as peak shaving with renewables, motor drive applications and for electric vehicle drive systems. The stacked inverter consists of at least one phase wherein each phase has a plurality of low voltage full bridge inverters equipped with an independent DC source. This inverter develops a near sinusoidal approximation voltage waveform with fast switching and small low pass AC output filter. A system controller controls operating parameters for each inverter. The inverter may have either single-phase or multi-phase embodiments connected in either wye or delta configurations.

    摘要翻译: 这里描述了具有分离的DC源的堆叠电压源逆变器。 该逆变器适用于低压或中压电力应用,如光伏应用接口系统,电池存储应用,如可再生能源的峰值剃须,电机驱动应用和电动车辆驱动系统。 堆叠式逆变器由至少一个相位组成,其中每相具有配备有独立DC源的多个低电压全桥逆变器。 该逆变器开发出具有快速开关和小的低通交流输出滤波器的近正弦近似电压波形。 系统控制器控制每个逆变器的运行参数。 逆变器可以具有以相位或三角形配置连接的单相或多相实施例。

    Bi-directional energy converter with multiple DC sources
    7.
    发明授权
    Bi-directional energy converter with multiple DC sources 有权
    具有多个直流电源的双向能量转换器

    公开(公告)号:US09099938B2

    公开(公告)日:2015-08-04

    申请号:US13441788

    申请日:2012-04-06

    摘要: A multiple dc sources bi-directional energy converter includes a plurality of direct current (DC) power sources; one alternating current (AC) power source; at least one stacked alternating current (AC) phase, each stacked alternating current (AC) phase having at least two or more full bridge converters, each respectively coupled to one of the direct current power sources, each full bridge converter having an inductor electrically coupled thereto; and a local controller coupled to each full bridge converter controlling the firing sequence of the switching devices in said full bridge converter to generate an approximately nearly sinusoidal voltage waveform when operated as a voltage source inverter in one direction or generate an approximately nearly constant direct current (DC) output when operated as a full-wave active rectifier in the opposite direction.

    摘要翻译: 多直流源双向能量转换器包括多个直流(DC)电源; 一个交流(AC)电源; 至少一个堆叠的交流(AC)相,每个堆叠的交流(AC)相具有至少两个或更多个全桥转换器,每个全桥转换器分别耦合到一个直流电源,每个全桥转换器具有电感耦合 到; 以及本地控制器,耦合到每个全桥转换器,其控制所述全桥转换器中的开关装置的点火顺序,以在一个方向上作为电压源逆变器工作时产生大致接近正弦的电压波形,或者产生大致接近恒定的直流电流 DC)输出,作为相反方向的全波有源整流器工作。

    Method and system for controlling a vapor deposition process
    8.
    发明授权
    Method and system for controlling a vapor deposition process 有权
    用于控制气相沉积工艺的方法和系统

    公开(公告)号:US08357266B2

    公开(公告)日:2013-01-22

    申请号:US12212506

    申请日:2008-09-17

    IPC分类号: C23C14/34

    摘要: A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.

    摘要翻译: 描述了用于调节气相沉积靶的方法和系统。 在一个示例性实施例中,操作气相沉积系统,其中使用气相沉积靶,在气相沉积系统中发现电弧,并且通过调节电源的输出电流来调节气相沉积靶, 为蒸镀系统提供动力并调整能量传送到每个电弧的时间间隔,以向每个电弧输送基本相同的能量。 在一些实施例中,输送到每个电弧的能量近似等于气相沉积靶能够承受而不被损坏的最大能量。 所描述的方法和系统显着地减少了从靶中除去杂质所需的时间,并且不需要真空室的排放或者从室中移出靶。

    Digital charge-mode control of a power supply
    9.
    发明授权
    Digital charge-mode control of a power supply 失效
    数字充电模式控制电源

    公开(公告)号:US07999526B2

    公开(公告)日:2011-08-16

    申请号:US12426698

    申请日:2009-04-20

    IPC分类号: G05F1/565 G05F1/575

    CPC分类号: H02M3/157 H02M2001/0019

    摘要: Disclosed herein are an apparatus and method for charge-mode control. An embodiment of a charge mode controller may include an analog/digital converter configured to monitor the current through a duty cycle switch and convert the current to a switch current value; an accumulator module configured to integrate the switch current value during the switching cycle and output an accumulated charge value; and a comparator module responsive to the accumulated charge value and a charge set point configured to generate a gate drive signal for the duty cycle switch that turns the duty cycle switch ON when the accumulated charge value is less than the charge set point and turns the duty cycle switch OFF when the accumulated charge value reaches the charge set point and thereby controls the duty cycle of the converter and the power supplied by the power stage.

    摘要翻译: 这里公开了一种用于充电模式控制的装置和方法。 充电模式控制器的实施例可以包括模拟/数字转换器,其被配置为监视通过占空比开关的电流并将电流转换为开关电流值; 累加器模块,被配置为在开关周期期间积分开关电流值,并输出累积电荷值; 以及响应于所述累积电荷值的比较器模块和被配置为产生所述占空比开关的栅极驱动信号的充电设定点,所述占空比开关在所述累积电荷值小于所述充电设定点时将所述占空比开关导通,并且使所述占空比 当累积的电荷值达到充电设定点时,循环开关OFF,从而控制转换器的占空比和由功率级提供的电力。

    Method and system for conditioning a vapor deposition target
    10.
    发明授权
    Method and system for conditioning a vapor deposition target 有权
    用于调节气相沉积靶的方法和系统

    公开(公告)号:US07445695B2

    公开(公告)日:2008-11-04

    申请号:US11413434

    申请日:2006-04-28

    IPC分类号: C23C14/34

    摘要: A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.

    摘要翻译: 描述了用于调节气相沉积靶的方法和系统。 在一个说明性实施例中,操作气相沉积系统,其中使用气相沉积靶,在气相沉积系统中发现电弧,并且通过调节电源的输出电流来调节气相沉积靶, 为蒸镀系统提供动力并调整能量传送到每个电弧的时间间隔,以向每个电弧输送基本相同的能量。 在一些实施例中,输送到每个电弧的能量近似等于气相沉积靶材能够承受而不被损坏的最大能量。 所描述的方法和系统显着地减少了从靶中除去杂质所需的时间,并且不需要真空室的排放或者从室中移出靶。