公开(公告)号：US06479212B1

公开(公告)日：2002-11-12

申请号：US09630187

申请日：2000-08-01

申请人： Minoru Matsuda ,  Hiroshi Maehara ,  Keita Sakai

发明人： Minoru Matsuda ,  Hiroshi Maehara ,  Keita Sakai

IPC分类号： C03F7004

CPC分类号： C08L81/06 ,  C08G75/23 ,  C08G2650/16 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/095 ,  Y10S430/106 ,  Y10S430/111

摘要： There is provided a photosensitive resin having at least three moieties in the backbone chain, two moieties of which moieties are an alicyclic group moiety and a sulfonyl moiety. The photosensitive resin has a superior solubility in solvents and a superior dry-etching resistance, and enables easy fabrication of highly integrated semiconductor devices.

摘要翻译： 提供在主链中具有至少三个部分的光敏树脂，其中两个部分是脂环族基团部分和磺酰基部分。 感光性树脂在溶剂中的溶解性优异，耐干蚀刻性优异，能够容易地制造高度集成的半导体装置。

公开(公告)号：US06225019B1

公开(公告)日：2001-05-01

申请号：US09244162

申请日：1999-02-04

申请人： Minoru Matsuda ,  Hiroshi Maehara ,  Keita Sakai

发明人： Minoru Matsuda ,  Hiroshi Maehara ,  Keita Sakai

IPC分类号： G03F7004

CPC分类号： G03F7/0045 ,  G03F7/039

摘要： Provided is a photosensitive resin with high sensitivity to exposure light. The photosensitive resin comprises a vinyl monomer moiety having an alicyclic group in a side chain thereof, and a sulfonyl moiety. B is an alicyclic group,

摘要翻译： 提供对曝光光具有高灵敏度的感光性树脂。 感光性树脂包含在侧链具有脂环基的乙烯基单体部分和磺酰基部分.B是脂环族基团，

公开(公告)号：US6087076A

公开(公告)日：2000-07-11

申请号：US968589

申请日：1997-11-13

申请人： Keita Sakai ,  Keiko Chiba ,  Hiroshi Maehara

发明人： Keita Sakai ,  Keiko Chiba ,  Hiroshi Maehara

IPC分类号： G03F7/004 ,  G03F7/30 ,  G03F7/38 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/0048

摘要： A method of manufacturing semiconductor devices includes a coating step for coating a substrate using a resist solution including a base resin and a low-oxygen or oxygen-free solvent in which oxygen is removed by nitrogen bubbling, a heating step for heating the substrate coated with the resist, an exposing step for exposing the substrate with radiation to transfer a pattern, and a developing step for developing the exposed substrate. The coating step, the heating step, the exposing step and the developing step are performed under an environment controlled in a low-oxygen or oxygen-free state.

摘要翻译： 一种制造半导体器件的方法包括：涂覆步骤，用于使用包含基础树脂的抗蚀剂溶液和通过氮气鼓泡除去氧的低氧或无氧溶剂的涂覆步骤，用于加热涂覆有 抗蚀剂，用于用辐射曝光衬底以转印图案的曝光步骤，以及用于显影曝光的衬底的显影步骤。 涂布步骤，加热步骤，曝光步骤和显影步骤在控制在低氧或无氧状态的环境下进行。

公开(公告)号：US6008942A

公开(公告)日：1999-12-28

申请号：US997704

申请日：1997-12-23

申请人： Makoto Ogusu ,  Hiroshi Maehara ,  Keita Sakai

发明人： Makoto Ogusu ,  Hiroshi Maehara ,  Keita Sakai

IPC分类号： G02B5/18 ,  G02B27/44

CPC分类号： G02B5/1866

摘要： A diffractive optical element for diffracting non-collimated light includes a base surface and a periodic structure formed on the base surface and having a plurality of diffractive surfaces and a plurality of boundary surfaces. The boundary surfaces are separated into plural zones, and in each zone, the boundary surface is placed substantially parallel to a main portion of a light beam impinging on that zone.

摘要翻译： 用于衍射非准直光的衍射光学元件包括形成在基底表面上并具有多个衍射面和多个边界面的基底表面和周期性结构。 边界表面被分成多个区域，并且在每个区域中，边界表面基本上平行于入射到该区域上的光束的主要部分。

公开(公告)号：US5952149A

公开(公告)日：1999-09-14

申请号：US621648

申请日：1996-03-26

申请人： Keita Sakai ,  Keiko Chiba ,  Hiroshi Maehara

发明人： Keita Sakai ,  Keiko Chiba ,  Hiroshi Maehara

IPC分类号： G03F7/004 ,  G03F7/30 ,  G03F7/38 ,  H01L21/027 ,  G03C1/73

CPC分类号： G03F7/0048

摘要： A resist solution for photolithography includes a base resin and an oxygen-free or low-oxygen solvent, wherein an oxygen volume in 1 ml of the solution is 0.05 cm.sup.3 or less under atmospheric pressure.

摘要翻译： 用于光刻的抗蚀剂溶液包括基础树脂和无氧或低氧溶剂，其中1ml溶液中的氧气体积在大气压下为0.05cm 3或更低。

公开(公告)号：US09164395B2

公开(公告)日：2015-10-20

申请号：US13314537

申请日：2011-12-08

申请人： Keita Sakai ,  Tatsuya Hayashi ,  Noriyasu Hasegawa

发明人： Keita Sakai ,  Tatsuya Hayashi ,  Noriyasu Hasegawa

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041

摘要： An exposure apparatus that includes a projection optical system, and exposes a substrate to light via the projection optical system and a liquid that is supplied between the projection optical system and the substrate. A plurality of recovery ports recover the liquid supplied between the projection optical system and the substrate, and are discretely arranged between vertices on each side of a polygon and at each of the vertices of the polygon. A chamber, connected to the plurality of recovery ports, receives the liquid. A pump attracts the liquid via the plurality of recovery ports and the chamber. A pressure difference between the pump and each of the recovery ports positioned at the vertices, among the plurality of recovery ports, is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices, among the plurality of recovery ports.

摘要翻译： 一种曝光装置，其包括投影光学系统，并且经由所述投影光学系统将基板暴露于光，以及供应在所述投影光学系统和所述基板之间的液体。 多个回收端口回收在投影光学系统和基板之间供应的液体，并且离散地布置在多边形的每一侧的顶点和多边形的每个顶点之间。 连接到多个回收端口的室接收液体。 泵通过多个回收口和腔室吸引液体。 在多个恢复端口中，定位在顶点处的泵和恢复端口中的每个恢复端口之间的压力差小于泵和定位在顶点之间的每个恢复端口之间的压力差，在多个恢复端口 。

公开(公告)号：US20120170007A1

公开(公告)日：2012-07-05

申请号：US13314537

申请日：2011-12-08

申请人： Keita Sakai ,  Tatsuya Hayashi ,  Noriyasu Hasegawa

发明人： Keita Sakai ,  Tatsuya Hayashi ,  Noriyasu Hasegawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041

摘要： The present invention provides an exposure apparatus including a projection optical system, and configured to expose a substrate to light via the projection optical system and a liquid, the apparatus including a plurality of recovery ports configured to recover the liquid supplied between the projection optical system and the substrate, a chamber connected to the plurality of recovery ports, and a pump configured to attract the liquid via the plurality of recovery ports and the chamber, wherein the plurality of recovery ports are discretely arranged between vertices on each side of a polygon and at each of vertices of the polygon, and a pressure difference between the pump and each of the recovery ports positioned at the vertices among the plurality of recovery ports is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices among the plurality of recovery ports.

摘要翻译： 本发明提供一种曝光装置，包括：投影光学系统，用于经由投影光学系统和液体将基板曝光，所述装置包括多个回收端口，所述多个回收端口被配置为回收在投影光学系统和 所述基板，连接到所述多个回收端口的室以及被配置为经由所述多个回收端口和所述室吸引所述液体的泵，其中所述多个回收端口离散地布置在多边形的每一侧的顶点和 所述多边形的顶点中的每一个以及位于所述多个恢复端口中的所述顶点处的所述泵与所述每个所述恢复端口之间的压力差小于所述泵与位于所述顶点之间的每个所述恢复端口之间的压力差， 多个恢复端口。

公开(公告)号：US06529226B2

公开(公告)日：2003-03-04

申请号：US09925609

申请日：2001-08-10

申请人： Keita Sakai ,  Koji Toyota ,  Shozou Shiraga ,  Satoshi Yamaura ,  Yuji Doi

发明人： Keita Sakai ,  Koji Toyota ,  Shozou Shiraga ,  Satoshi Yamaura ,  Yuji Doi

IPC分类号： G01D1524

CPC分类号： B41J2/32 ,  B41J3/36 ,  B41J3/407 ,  B41J11/04 ,  B41J13/106 ,  B41J15/042

摘要： The present invention relates to a thermal line printer for a small recording terminals such as a terminal for POS (point of sales), a handy terminal, a measuring apparatus or the like, and also relates to a driving device for the thermal line printer. In the structure of a conventional thermal line printer, there is a limitation to the ability to decrease the dimension of depth in a situation where the downsizing of an apparatus is desired. By installing the thermal line printer in an upright state, the dimension of the depth can be decreased. However, in this configuration, the user cannot see the state of the printing because the recording paper falls down toward the user's side, due to the gravity, when the paper is ejected after printing. The present invention solves the above problems by disposing a line type thermal head (5) and a platen roller (2) in such a manner that a tangential line to the platen roller (2) at a pressed point between the line type thermal head (5) and the platen roller (2) intersects the short side of the body of the printer in a plane projecting the body along the axial direction of the platen roller (2), and by ejecting the recording paper from the short side.

公开(公告)号：US07754011B2

公开(公告)日：2010-07-13

申请号：US12114223

申请日：2008-05-02

申请人： Keita Sakai

发明人： Keita Sakai

IPC分类号： C30B29/12

CPC分类号： C30B11/00 ,  C30B29/12 ,  C30B33/00 ,  Y10T117/1016

摘要： A method of manufacturing calcium fluoride single crystal includes cooling the calcium fluoride single crystal with variable cooling rates so that throughout a temperature range in the cooling step, maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (τc) of the calcium fluoride single crystal in a direction on a {0 0 1} plane of the calcium fluoride single crystal, and is maintained to be an approximately constant ratio, and adding strontium fluoride when growing the single crystal before the cooling step.

摘要翻译： 制造氟化钙单晶的方法包括以可变的冷却速度冷却氟化钙单晶，使得在冷却步骤的整个温度范围内，由热应力引起的氟化钙单晶内部的最大剪切应力近似等于或小于 在氟化钙单晶的{0 0 1}面上，在<110°方向上的氟化钙单晶的临界解析剪切应力（τc）保持为近似恒定的比例，并加入氟化锶 当在冷却步骤之前生长单晶时。

公开(公告)号：US20080229999A1

公开(公告)日：2008-09-25

申请号：US12114223

申请日：2008-05-02

申请人： Keita Sakai

发明人： Keita Sakai

IPC分类号： C30B15/14

CPC分类号： C30B11/00 ,  C30B29/12 ,  C30B33/00 ,  Y10T117/1016

摘要： A method for manufacturing calcium fluoride single crystal includes the step of cooling the calcium fluoride single crystal so that maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (τc) in a direction of on a {0 0 1} plane of the calcium fluoride single crystal.

摘要翻译： 氟化钙单晶的制造方法包括：使氟化钙单晶冷却的步骤，使得由热应力引起的氟化钙单晶内部的最大剪切应力大致等于或小于临界分解剪切应力（τC 在氟化钙单晶的{0 0 1}平面上的<1×10>方向上。