摘要:
Provided is a polishing liquid including cerium oxide particles, an organic acid A, a polymer compound B having a carboxyl acid group or a carboxylate group, and water, wherein the organic acid A has at least one group selected from the group consisting of —COOM group, -Ph-OM group, —SO3M group and —PO3M2 group, pKa of the organic acid A is less than 9, a content of the organic acid A is 0.001 to 1 mass % with respect to the total mass of the polishing liquid, and a content of the polymer compound B is 0.01 to 0.50 mass % with respect to the total mass of the polishing liquid, and pH is in the range of 4.0 to 7.0.
摘要翻译:本发明提供一种包括氧化铈颗粒,有机酸A,具有羧酸基或羧酸酯基的高分子化合物B和水的抛光液,其中有机酸A具有至少一个选自-COOM 基团-Ph-OM基团,-SO 3 M基团和-PO 3 M 2基团,有机酸A的pKa小于9,有机酸A的含量相对于研磨液的总质量为0.001〜1质量% ,相对于研磨液的总质量,高分子化合物B的含量为0.01〜0.50质量%,pH为4.0〜7.0。
摘要:
Provided is a polishing liquid including cerium oxide particles, an organic acid A, a polymer compound B having a carboxyl acid group or a carboxylate group, and water, wherein the organic acid A has at least one group selected from the group consisting of —COOM group, -Ph-OM group, —SO3M group and —PO3M2 group, pKa of the organic acid A is less than 9, a content of the organic acid A is 0.001 to 1 mass % with respect to the total mass of the polishing liquid, and a content of the polymer compound B is 0.01 to 0.50 mass % with respect to the total mass of the polishing liquid, and pH is in the range of 4.0 to 7.0.
摘要翻译:本发明提供一种包括氧化铈颗粒,有机酸A,具有羧酸基或羧酸酯基的高分子化合物B和水的抛光液,其中有机酸A具有至少一个选自-COOM 基团-Ph-OM基团,-SO 3 M基团和-PO 3 M 2基团,有机酸A的pKa小于9,有机酸A的含量相对于研磨液的总质量为0.001〜1质量% ,相对于研磨液的总质量,高分子化合物B的含量为0.01〜0.50质量%,pH为4.0〜7.0。
摘要:
The polishing solution for CMP of the invention comprises abrasive grains, a first additive and water, wherein the first additive is at least 1,2-benzoisothiazole-3(2H)-one or 2-aminothiazole. The polishing method of the invention is a polishing method for a substrate having a silicon oxide film on the surface, and the polishing method comprises a step of polishing the silicon oxide film with a polishing pad while supplying the polishing solution for CMP between the silicon oxide film and the polishing pad.
摘要:
The polishing solution for CMP of the invention comprises abrasive grains, a first additive and water, wherein the first additive is at least 1,2-benzoisothiazole-3(2H)-one or 2-aminothiazole. The polishing method of the invention is a polishing method for a substrate having a silicon oxide film on the surface, and the polishing method comprises a step of polishing the silicon oxide film with a polishing pad while supplying the polishing solution for CMP between the silicon oxide film and the polishing pad.
摘要:
The present invention provides a cerium oxide slurry, a cerium oxide polishing slurry, and a method of polishing a substrate by using the same, wherein decrease of scratches and polish at high speed can be realized by reducing the content of coarse grains by improving in the disperse state of cerium oxide particles. The invention relates to a cerium oxide slurry containing cerium oxide particles, dispersant and water, in which the ratio of weight of cerium oxide/weight of dispersant is in a range of 20 to 80 and relates a cerium oxide polishing slurry comprising the cerium oxide slurry and additives such as a water-soluble polymer.
摘要:
A mail sorter, which can reliably sort mail while avoiding the breakage and the recovery mistake of mail released from conveyor baskets, which move on the mail sorting line in circulation. The mail sorter has a conveyor line with a conveying forward run and a conveying return run closely arranged back to back with each, and layered mail recovery box groups are disposed along a lower region of the conveying return run in parallel to each other. The mail recovery box groups comprise lowest stage boxes for recovering mail M released from conveyor baskets on the conveying forward run through a transverse deflection chute, middle stage boxes for recovering mail M released from the conveyor baskets on the conveying forward run through a discharge chute, and uppermost stage boxes for recovering mail M released from the conveying baskets on the conveying return run through a buffer chute.
摘要:
The first embodiment of the CMP polishing liquid of the invention comprises cerium oxide particles, an organic compound with an acetylene bond, and water, the content of the organic compound with an acetylene bond being at least 0.00001 mass % and not greater than 0.01 mass % based on the total mass of the CMP polishing liquid. The second embodiment of the CMP polishing liquid of the invention comprises cerium oxide particles, an organic compound with an acetylene bond, an anionic polymer compound or salt thereof, and water, the anionic polymer compound being obtained by polymerizing a composition comprising a vinyl compound with an anionic substituent as a monomer component, the content of the organic compound with an acetylene bond being at least 0.000001 mass % and less than 0.05 mass % based on the total mass of the CMP polishing liquid.
摘要:
To provide a mail sorting and distributing transfer system, which extends transformable time of mail fed from a mail charging line so that the mail can be timely, reliably transferred to conveyor baskets on a mail sorting line, there is a mail sorting and distributing transfer system in which transfer timing levers maintain the receipt ports of transfer baskets provided on an outer circumferential edge of a sorting and distributing turntable in a state where the receipt ports of the transfer baskets are in registry with a mail charging line during the receipt of mail and where the lever pivots so it moves the associated transfer basket. Underlying conveyor baskets on a mail sorting line are moved parallel to and in synchronization with the transfer baskets during the transfer of the mail. The lever is pivoted about an axis parallel to the axis of the mail sorting and distributing turntable.
摘要:
An article storage rack apparatus for storing and dispensing articles in first-in, first-out order comprises side-by-side columns of slant racks, in which alternate slant racks in each column are inclined downwardly in opposite direction. Articles are introduced onto the topmost slant rack and slide downward by gravity to successively lower slant racks. The articles are transferred from a slant rack to the next lower slant rack by a transfer mechanism comprising tables which are movable vertically and tiltable. The articles are maintained in the same orientation as they slide down the array of slant racks. At the lower end of the bottom slant rack, the articles are dispensed, by a tilting table dispenser, in the same order in which they were introduced onto the top slant rack.
摘要:
A mount for supporting a cathode-ray tube is employed in a frit sealing furnace. The frit seal furnace (1) comprises a furnace body (3) and conveyor belts (5) disposed in the furnace body (3) for feeding mounts (21) which each support a panel (31) and a funnel (32) that are superposed one on the other with a frit glass (33) interposed therebetween. Each of the conveyor belts (5) is composed of a pair of chain belts (4a, 4b). The mount (21) is placed on the conveyor belts (5) in the frit seal furnace (1) through a space which comprises a mesh screen (26), so that the mount (21) is suitable for use in the frit seal furnace (1). When the tube body of a cathode-ray tube is broken, glass pieces are prevented from falling onto the furnace floor by the mesh screen. The mesh screen does not obstruct air flows in the furnace.