RESIN COMPOSITION
    8.
    发明申请

    公开(公告)号:US20250066552A1

    公开(公告)日:2025-02-27

    申请号:US18467735

    申请日:2023-09-15

    Abstract: The disclosure provides a resin composition, which includes 30 wt % to 50 wt % of a bismaleimide resin; 1 wt % to 10 wt % of an epoxy resin; 1 wt % to 10 wt % of a benzoxazine resin; 1 wt % to 5 wt % of a hardener; 10 wt % to 40 wt % of a filler; and 0.1 wt % to 3 wt % of a coupling agent, based on a total weight of the resin composition.

    MODIFIED NAPHTHOL RESIN AND PREPARATION METHOD THEREOF

    公开(公告)号:US20250011527A1

    公开(公告)日:2025-01-09

    申请号:US18459456

    申请日:2023-09-01

    Abstract: A preparation method of a modified naphthol resin includes the following. A nitration reaction and a hydrogenation reaction are sequentially performed on a naphthol resin to form a modified naphthol resin with an amino group in a structure. A solvent used in the hydrogenation reaction includes tetrahydrofuran, toluene, isopropanol, an amide solvent, or an above-mentioned co-solvent.

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