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公开(公告)号：US07724003B1
公开(公告)日：2010-05-25
申请号：US11938355
申请日：2007-11-12
申请人： NanChang Zhu , Jainou Shi , Min Xiang , ZiangHua Liu , Goujun Zhang , Xiafang Zhang , Shiyou Pei , Liang-Guo Wang , Joseph R. Laia, Jr.
发明人： NanChang Zhu , Jainou Shi , Min Xiang , ZiangHua Liu , Goujun Zhang , Xiafang Zhang , Shiyou Pei , Liang-Guo Wang , Joseph R. Laia, Jr.
IPC分类号： G01R31/26
CPC分类号： H01L22/14
摘要： A measurement system for taking a reading in a test zone on a surface of a substrate. A chamber forms an environment, a surface treatment station dispenses a stabilizing chemical in the test zone, a charge deposition station deposits a charge in the test zone, and a QV measurement station takes a QV based measurement in the test zone. Where the surface treatment station, the charge deposition station, and the QV measurement station all interact with the substrate within the chamber. In this manner, reliable QV measurements are taken on the substrate by controlling charge spreading with the stabilizing chemical. QV measurement stability is also improved by reducing the influence of the time trending on substrates with reactive dielectrics, such as on silicon oxynitride and high-k surfaces.
摘要翻译： 用于在基板表面上的测试区域读取的测量系统。 室形成环境，表面处理站在测试区域中分配稳定化学品，电荷沉积站在测试区域中沉积电荷，QV测量站在测试区域进行基于QV的测量。 表面处理站，电荷沉积站和QV测量站都与室内的基板相互作用。 以这种方式，通过用稳定化学品控制电荷扩散，在衬底上进行可靠的QV测量。 通过减少时间趋势对具有反应性电介质的衬底（例如氮氧化硅和高k表面）的影响也可改善QV测量稳定性。
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公开(公告)号：US5783335A
公开(公告)日：1998-07-21
申请号：US864725
申请日：1992-04-07
申请人： Joseph R. Laia, Jr. , David W. Carroll , Mitchell Trkula , Wallace E. Anderson , Steven M. Valone
发明人： Joseph R. Laia, Jr. , David W. Carroll , Mitchell Trkula , Wallace E. Anderson , Steven M. Valone
CPC分类号： C23C16/442 , B01J8/1836 , B01J8/24 , B01J8/42 , C23C16/27 , C30B25/02 , C30B29/04
摘要： A process for coating a substrate with diamond or diamond-like material including maintaining a substrate within a bed of particles capable of being fluidized, the particles having substantially uniform dimensions and the substrate characterized as having different dimensions than the bed particles, fluidizing the bed of particles, and depositing a coating of diamond or diamond-like material upon the substrate by chemical vapor deposition of a carbon-containing precursor gas mixture, the precursor gas mixture introduced into the fluidized bed under conditions resulting in excitation mechanisms sufficient to form the diamond coating.
摘要翻译： 一种用金刚石或类金刚石材料涂覆基材的方法，包括将基材保持在能够流化的颗粒床内，所述颗粒具有基本上均匀的尺寸，并且所述基材的特征在于具有与所述床颗粒不同的尺寸， 颗粒，以及通过化学气相沉积含碳前体气体混合物将金刚石或类金刚石材料涂层沉积在基材上，将前体气体混合物引入流化床中，产生足以形成金刚石涂层的激发机制 。
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公开(公告)号：US5254374A
公开(公告)日：1993-10-19
申请号：US866025
申请日：1992-04-08
CPC分类号： C04B41/009 , C04B35/64 , C04B35/80 , C04B41/4529 , C04B41/81 , C23C16/045 , C23C16/481
摘要： A method for producing reinforced ceramic composite articles by means of chemical vapor infiltration and deposition in which an inverted temperature gradient is utilized. Microwave energy is the source of heat for the process.
摘要翻译： 一种通过化学气相渗透和沉积制造增强陶瓷复合制品的方法，其中使用反向温度梯度。 微波能量是过程的热源。
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公开(公告)号：US5149596A
公开(公告)日：1992-09-22
申请号：US593839
申请日：1990-10-05
IPC分类号： C23C16/18 , C23C16/448 , C23C16/513
CPC分类号： C23C16/513 , C23C16/18 , C23C16/4481 , Y10S428/938 , Y10T428/12778 , Y10T428/31678
摘要： A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub.3, iridium(allyl).sub.3, molybdenum(allyl).sub.4, tungsten(allyl).sub.4, rhenium(allyl).sub.4, platinum(allyl).sub.2, or palladium(allyl).sub.2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.
摘要翻译： 具有纳米晶体结构的高纯度金属薄膜和通过例如铑等离子体辅助化学气相沉积制备例如铑，铱，钼，钨，铼，铂或钯的高纯度薄金属薄膜的方法 （烯丙基）3，铱（烯丙基）3，钼（烯丙基）4，钨（烯丙基）4，铼（烯丙基）4，铂（烯丙基）2或钯（烯丙基）2）。 另外，公开了通过等离子体辅助化学气相沉积来降低由一种或多种有机金属前体化合物制备的金属膜的碳含量的一般方法。
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