摘要:
A semiconductor device of the present invention includes an n-channel first thin film transistor and a p-channel second thin film transistor on one and the same substrate. The first thin film transistor has a first semiconductor layer (27), and the second thin film transistor has a second semiconductor layer (22). The first semiconductor layer (27) and the second semiconductor layer (22) are formed from one and the same film. Each of the first semiconductor layer (27) and the second semiconductor layer (22) has a slope portion (27e, 22e) positioned in the periphery and a main portion (27m, 22m) which is a portion excluding the slope portion. A p-type impurity is introduced into only a part of the slope portion (27e) of the first semiconductor layer with higher density than the main portion (27m) of the first semiconductor layer, the main portion (22m) of the second semiconductor layer, and the slope portion (22e) of the second semiconductor layer. Accordingly, a driving voltage of the semiconductor device provided with the n-type TFT and the p-type TFT can be reduced.
摘要:
A semiconductor device of the present invention includes an n-channel first thin film transistor and a p-channel second thin film transistor on one and the same substrate. The first thin film transistor has a first semiconductor layer (27), and the second thin film transistor has a second semiconductor layer (22). The first semiconductor layer (27) and the second semiconductor layer (22) are formed from one and the same film. Each of the first semiconductor layer (27) and the second semiconductor layer (22) has a slope portion (27e, 22e) positioned in the periphery and a main portion (27m, 22m) which is a portion excluding the slope portion. A p-type impurity is introduced into only a part of the slope portion (27e) of the first semiconductor layer with higher density than the main portion (27m) of the first semiconductor layer, the main portion (22m) of the second semiconductor layer, and the slope portion (22e) of the second semiconductor layer. Accordingly, a driving voltage of the semiconductor device provided with the n-type TFT and the p-type TFT can be reduced.
摘要:
Disclosed is a method of manufacturing a thin film transistor device that includes the following steps: forming slanted portions 51 in edges of crystalline semiconductor films 13 (13a and 13b); forming a resist film 15 on the crystalline semiconductor film 13a so as to expose the slanted portions 51 and so as to cover the entire crystalline semiconductor film 13b; performing half exposure of the resist film 15 that is formed on the crystalline semiconductor film 13a; injecting a p-type impurity only into the slanted portions 51 of the crystalline semiconductor film 13a; removing the resist film 15 that is formed on the crystalline semiconductor film 13a by ashing; and injecting the p-type impurity into the entire crystalline semiconductor film 13a.
摘要:
Disclosed is a method of manufacturing a thin film transistor device that includes the following steps: forming slanted portions 51 in edges of crystalline semiconductor films 13 (13a and 13b); forming a resist film 15 on the crystalline semiconductor film 13a so as to expose the slanted portions 51 and so as to cover the entire crystalline semiconductor film 13b; performing half exposure of the resist film 15 that is formed on the crystalline semiconductor film 13a; injecting a p-type impurity only into the slanted portions 51 of the crystalline semiconductor film 13a; removing the resist film 15 that is formed on the crystalline semiconductor film 13a by ashing; and injecting the p-type impurity into the entire crystalline semiconductor film 13a.
摘要:
An image pickup device includes a light-receiving device unit, a processing portion, a first connection body, and a second connection body. The first connection body electrically connects a first electrode of the light-receiving device unit to a corresponding second electrode of the processing portion. The first connection body includes an indium-containing solder portion disposed between the first electrode and the second electrode, and a barrier layer for suppressing alloying of the solder portion with the first electrode and the second electrode. The second connection body includes an alloy portion formed by alloying with a solder containing a material having a melting point equal to or higher than a melting point of the first connection body and a hardness higher than that of the first connection body.
摘要:
A process unit includes a drum frame supporting a photoconductor drum and a development frame supporting a development roller. The development cartridge is swingably supported by the drum frame at a coupling joint provided at a first side of the development frame and a support portion provided at a second side of the development frame. A center of rotation of the development roller is located in a position shifted from a line segment connecting a center of rotation of the coupling joint and a center of rotation of the photoconductor drum to an upstream side with respect to a direction of rotation of the coupling joint as viewed in an axial direction of the development roller, such that the development roller is pressed against the photoconductor drum by the action of the rotatory force received by the coupling joint.
摘要:
A sheet roll comprises two glass films and a coupling portion, wherein end portions of the glass films are coupled together via the coupling portion and the coupled glass films are rolled into a roll shape. The coupling portion is a sheet-like coupling member formed of a resin film and placed on the end portions of the two glass films in a rolling direction so as to span therebetween. The sheet-like coupling member includes wide joint portions joined respectively to the end portions of the two glass films, and a necked portion which is narrower than the wide joint portions and is formed at a middle portion of the sheet-like coupling member in the rolling direction.
摘要:
Provided is a laminate (1) obtained by integrally laminating glass sheets (4) on both surfaces of a resin sheet (2). The glass sheets (4) have a thickness of 300 μm or less and end surfaces (4a) of the glass sheets (4) are chamfered.
摘要:
A photosensitive cartridge includes: a photosensitive member mounted to the photosensitive cartridge such that a surface thereof is movable in a first direction; an electric discharge electrode that extends in a second direction at an interval with the surface of the photosensitive member, the second direction being orthogonal to the first direction and parallel with the surface of the photosensitive member; a frame holding the photosensitive member and the electric discharge electrode and including an opening at an opposite side of the photosensitive member across the electric discharge electrode, the opening extending in the second direction; a cleaner movable along the opening so as to clean the electric discharge electrode; and a reinforcement member, which is a separate member from the cleaner, and which is contactable with the frame to reinforce a surrounding part of the opening.
摘要:
A cleaving apparatus holds at least one surface (effective surface) of a band-like glass film in a non-contact state to suppress a situation that wavy portions reach a region in which the band-like glass film is to be cleaved. The cleaving apparatus cleaves the band-like glass film, which is being conveyed in a longitudinal direction thereof, along a conveyance direction thereof using a thermal stress generated through localized heating and cooling of a heated region. The localized heating and the cooling is performed on a preset cleaving line extending along the conveyance direction of the band-like glass film. The cleaving apparatus includes an air knife for supplying air to a front surface of the band-like glass film to retain the film on a conveyor at a position on an upstream side of a cleaving region in the conveyance direction.