Inspecting method, inspecting system, and method for manufacturing electronic devices
    2.
    发明授权
    Inspecting method, inspecting system, and method for manufacturing electronic devices 有权
    检查方法,检查系统和电子设备制造方法

    公开(公告)号:US08428336B2

    公开(公告)日:2013-04-23

    申请号:US11431709

    申请日:2006-05-11

    IPC分类号: G06K9/00

    摘要: A method for classifying defects, including: calculating feature quantifies of defect image which is obtained by imaging a defect on a sample; classifying the defect image into a classified category by using information on the calculated feature quantities; displaying the classified defect image in a region on a display screen which is defined to the classified category; adding information on the classified category to the displayed defect image; transferring the displayed defect image which is added the information on the classified category to one of the other categories and displaying the transferred defect image in a region on the display screen which is defined to the one of the other categories; and changing information on the category.

    摘要翻译: 一种用于对缺陷进行分类的方法,包括:通过对样品上的缺陷进行成像而获得的缺陷图像的特征量化计算; 通过使用关于计算的特征量的信息将缺陷图像分类成分类的类别; 在分类的类别的显示屏幕上的区域中显示分类的缺陷图像; 将分类类别的信息添加到所显示的缺陷图像; 将所述分类类别中的信息添加到所述其他类别中的所显示的缺陷图像,并且将所传送的缺陷图像显示在所述显示屏幕上定义为所述其他类别之一的区域中; 并更改关于该类别的信息。

    ANALYZING APPARATUS, PROGRAM, DEFECT INSPECTION APPARATUS, DEFECT REVIEW APPARATUS, ANALYSIS SYSTEM, AND ANALYSIS METHOD
    5.
    发明申请
    ANALYZING APPARATUS, PROGRAM, DEFECT INSPECTION APPARATUS, DEFECT REVIEW APPARATUS, ANALYSIS SYSTEM, AND ANALYSIS METHOD 有权
    分析装置,程序,缺陷检查装置,缺陷检查装置,分析系统和分析方法

    公开(公告)号:US20080226153A1

    公开(公告)日:2008-09-18

    申请号:US12039255

    申请日:2008-02-28

    IPC分类号: G06K9/00

    摘要: In order to allow to easily specify inspection recipe with which defects desired to be detected can be detected efficiently, a defect inspection apparatus performs defect inspection of a substrate in accordance with a plurality of inspection recipes and produces defect information associated with position of defect in the substrate and attribute data of the defect for each of the inspection recipes and a defect review apparatus produces review result information specifying a kind of defect selected from defects contained in the defect information. An analyzing apparatus obtains defect information and review result information and totalizes the number of defects having attribute data similar to attribute data possessed in defects corresponding to kind of defects to be analyzed for each inspection recipe.

    摘要翻译: 为了能够容易地指定能够有效地检测出希望的缺陷的检查配方,缺陷检查装置根据多个检查配方进行基板的缺陷检查,并且生成与缺陷的位置有关的缺陷信息 每个检查配方的缺陷的基板和属性数据以及缺陷检查装置产生指定从缺陷信息中包含的缺陷中选择的缺陷的种类的检查结果信息。 分析装置获取缺陷信息并查看结果信息,并且将具有属性数据的缺陷的数量的总和与每个检查配方的要分析的缺陷的种类相对应的缺陷中具有的属性数据相似。

    Test data analyzing system and test data analyzing program
    6.
    发明申请
    Test data analyzing system and test data analyzing program 失效
    测试数据分析系统和测试数据分析程序

    公开(公告)号:US20070021855A1

    公开(公告)日:2007-01-25

    申请号:US11483740

    申请日:2006-07-11

    IPC分类号: G06F19/00

    摘要: Disclosed is a test data analyzing method and system for use in estimation of a defect cause of a product, such as, an integrated circuit, a liquid crystal display, an optical transceiver, a thin film magnetic head, etc., which is fabricated through plural processes. The estimation of a defect cause is achieved by selecting a wafer number to be analyzed, reading test data, reading fabrication line data, counting frequency of machine codes by wafers, grouping test data by machine codes or frequencies, comparing test data distributions between groups by machine codes, and comparing results between machine codes.

    摘要翻译: 公开了一种用于估计产品的缺陷原因的测试数据分析方法和系统,例如集成电路,液晶显示器,光收发器,薄膜磁头等,其通过 多个过程。 缺陷原因的估计是通过选择要分析的晶片数量,读取测试数据,读取制造线数据,通过晶片对机器代码的计数频率,通过机器代码或频率分组测试数据来实现的,比较组之间的测试数据分布,通过 机器代码,并比较机器代码之间的结果。

    Device for classifying defects and method for adjusting classification
    7.
    发明授权
    Device for classifying defects and method for adjusting classification 有权
    分类缺陷的设备和分类调整方法

    公开(公告)号:US08892494B2

    公开(公告)日:2014-11-18

    申请号:US13376390

    申请日:2010-07-08

    IPC分类号: G06F15/18 G06T7/00

    摘要: Disclosed is a technique wherein an object that requires adjustment in order to increase the reliability of automatic classification can be easily identified. A device (140) for adjusting classification classifies defects into a first class group according to the feature amount of the defects that are obtained from image data obtained from an electron microscope (110), and classifies the defects into a second class group according to the feature amount of the defects classified into the first class group. And, the device (140) for adjusting the classification calculates classification performance by comparing the defects that have been classified into the second class group, and outputs the calculated classification performance in a predetermined display format to an output unit (180).

    摘要翻译: 公开了一种技术,其中可以容易地识别为了增加自动分类的可靠性而需要调整的对象。 用于调整分类的装置(140)根据从电子显微镜(110)获得的图像数据获得的缺陷的特征量,将缺陷分类为第一类别组,并根据 分类为第一类组的缺陷的特征量。 并且,用于调整分类的装置(140)通过比较已分类为第二类组的缺陷,并将计算出的分类性能以预定显示格式输出到输出单元(180)来计算分类性能。

    Test data analyzing system and test data analyzing program
    8.
    发明授权
    Test data analyzing system and test data analyzing program 失效
    测试数据分析系统和测试数据分析程序

    公开(公告)号:US07424336B2

    公开(公告)日:2008-09-09

    申请号:US11483740

    申请日:2006-07-11

    IPC分类号: G06F19/00

    摘要: Disclosed is a test data analyzing method and system for use in estimation of a defect cause of a product, such as, an integrated circuit, a liquid crystal display, an optical transceiver, a thin film magnetic head, etc., which is fabricated through plural processes. The estimation of a defect cause is achieved by selecting a wafer number to be analyzed, reading test data, reading fabrication line data, counting frequency of machine codes by wafers, grouping test data by machine codes or frequencies, comparing test data distributions between groups by machine codes, and comparing results between machine codes.

    摘要翻译: 公开了一种用于估计产品的缺陷原因的测试数据分析方法和系统,例如集成电路,液晶显示器,光收发器,薄膜磁头等,其通过 多个过程。 缺陷原因的估计是通过选择要分析的晶片数量,读取测试数据,读取制造线数据,通过晶片对机器代码的计数频率,通过机器代码或频率分组测试数据来实现的,比较组之间的测试数据分布,通过 机器代码,并比较机器代码之间的结果。

    Analyzing apparatus, program, defect inspection apparatus, defect review apparatus, analysis system, and analysis method
    9.
    发明授权
    Analyzing apparatus, program, defect inspection apparatus, defect review apparatus, analysis system, and analysis method 有权
    分析仪器,程序,缺陷检查装置,缺陷检查装置,分析系统和分析方法

    公开(公告)号:US08290241B2

    公开(公告)日:2012-10-16

    申请号:US12039255

    申请日:2008-02-28

    IPC分类号: G06K9/00

    摘要: In order to allow to easily specify inspection recipe with which defects desired to be detected can be detected efficiently, a defect inspection apparatus performs defect inspection of a substrate in accordance with a plurality of inspection recipes and produces defect information associated with position of defect in the substrate and attribute data of the defect for each of the inspection recipes and a defect review apparatus produces review result information specifying a kind of defect selected from defects contained in the defect information. An analyzing apparatus obtains defect information and review result information and totalizes the number of defects having attribute data similar to attribute data possessed in defects corresponding to kind of defects to be analyzed for each inspection recipe.

    摘要翻译: 为了能够容易地指定能够有效地检测出希望的缺陷的检查配方,缺陷检查装置根据多个检查配方进行基板的缺陷检查,并且生成与缺陷的位置有关的缺陷信息 每个检查配方的缺陷的基板和属性数据以及缺陷检查装置产生指定从缺陷信息中包含的缺陷中选择的缺陷的种类的检查结果信息。 分析装置获取缺陷信息并查看结果信息,并且将具有属性数据的缺陷的数量的总和与每个检查配方的要分析的缺陷的种类相对应的缺陷中具有的属性数据相似。

    DEVICE FOR CLASSIFYING DEFECTS AND METHOD FOR ADJUSTING CLASSIFICATION
    10.
    发明申请
    DEVICE FOR CLASSIFYING DEFECTS AND METHOD FOR ADJUSTING CLASSIFICATION 有权
    用于分类缺陷的装置和调整分类的方法

    公开(公告)号:US20120117010A1

    公开(公告)日:2012-05-10

    申请号:US13376390

    申请日:2010-07-08

    IPC分类号: G06F15/18

    摘要: Disclosed is a technique wherein an object that requires adjustment in order to increase the reliability of automatic classification can be easily identified. A device (140) for adjusting classification classifies defects into a first class group according to the feature amount of the defects that are obtained from image data obtained from an electron microscope (110), and classifies the defects into a second class group according to the feature amount of the defects classified into the first class group. And, the device (140) for adjusting the classification calculates classification performance by comparing the defects that have been classified into the second class group, and outputs the calculated classification performance in a predetermined display format to an output unit (180).

    摘要翻译: 公开了一种技术,其中可以容易地识别为了增加自动分类的可靠性而需要调整的对象。 用于调整分类的装置(140)根据从电子显微镜(110)获得的图像数据获得的缺陷的特征量,将缺陷分类为第一类别组,并根据 分类为第一类组的缺陷的特征量。 并且,用于调整分类的装置(140)通过比较已分类为第二类组的缺陷,并将计算出的分类性能以预定显示格式输出到输出单元(180)来计算分类性能。