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公开(公告)号:US5322765A
公开(公告)日:1994-06-21
申请号:US796527
申请日:1991-11-22
申请人: Nicholas J. Clecak , Willard E. Conley , Ranee W.-L. Kwong , Leo L. Linehan , Scott A. MacDonald , Harbans S. Sachdev , Hubert Schlosser , Carlton G. Willson
发明人: Nicholas J. Clecak , Willard E. Conley , Ranee W.-L. Kwong , Leo L. Linehan , Scott A. MacDonald , Harbans S. Sachdev , Hubert Schlosser , Carlton G. Willson
IPC分类号: G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , G03F7/26 , G03F7/36 , G03F7/38 , H01L21/027 , H01L21/30 , G03C1/72 , G03F7/00
摘要: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of being inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.
摘要翻译: 干可显影的顶表面可成像光致抗蚀剂组合物,其包含活化成亲电取代的成膜芳族聚合物树脂,能够插入到芳族聚合物树脂中的酸催化剂,以及可辐射降解酸生成化合物和产生 正色调抵消了基板上的图像。