摘要:
Disclosed are a conductive pyrrole derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a monomer used for forming the conductive pyrrole derivative monomolecular film and method of manufacturing the same. The invention relates to a monomolecular ultrathin film comprising 1-pyrrolyl groups and silicon groups. The monomer used for forming the film is provided by reacting .omega.-(1-pyrrolyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted monomer, thus chemically bonding a monomolecular film to a substrate surface. Furthermore, a polypyrrole derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
摘要:
A recording and reproducing device is provided. The device comprises a recording medium, a head giving and receiving recording signals to or from the recording medium, and a mechanism section and a circuit section giving and receiving the recording signals, wherein at least one protective film, and at least one fluorine-containing monomolecular film are formed in this order on the recording layer of the recording medium or on the surface of the head which comes into contact with said recording layer, wherein said protective film is a metal film, oxidized metal film, semi-conductor film, oxidized semi-conductor film, or organic monomolecular film, and wherein said fluorine-containing monomolecular film is formed by the chemical adsorption of a specific-type of silane compound that contains a perfluoroalkyl group at the molecular end on the surface of the protective film.
摘要:
Disclosed are a conductive thienyl derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a silicon compound comprising 3-thienyl groups (thiophene derivative) used for forming the conductive monomolecular film and a method of manufacturing the same. A monomolecular ultrathin film comprising 3-thienyl groups and silicon groups is formed in the invention. The silicon compound used for forming the film is provided by reacting .omega.-(3-thienyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted compound, thus chemically bonding the monomolecular film to the substrate surface. Furthermore, a thienyl derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
摘要:
A silane compound represented by the following general Formula (I) is described: ##STR1## wherein R.sup.1 is an alkyl group with 1 to 4 carbon atoms;A is oxygen atom (--O--), carboxyl group ##STR2## or an alkylsilylene group ##STR3## wherein each R.sup.2 and R.sup.3 is an alkyl group with 1 to 4 carbon atoms;x is a halogen atom, or an alkoxyl group;m is an integer from 1 to 8;n is an integer from 0 to 2;p is an integer from 5 to 25; andq is an integer from 0 to 2.The silane compound is useful as a coating agent for various base materials, to provide lubricity, in addition to stain-proofing property.
摘要:
There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.
摘要:
A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system.
摘要:
A silane compound having the following formula, wherein R.sup.1 and R.sup.2 are each monovalent hydrocarbon radicals having 1 to 4 carbon atoms and n is an integer of 0, 1 or 2: ##STR1## which is manufactured by reacting 1-allyl-.epsilon.-caprolactam of the following formula: ##STR2## with a hydrogen silane of the following formula:HSiR.sup.1.sub.n (OR.sup.2).sub.3-nin the presence of a platinum-containing catalyst. The silane compound is useful as a surface treatment agent for imparting a moisture-repelling property to the surface of various materials.
摘要:
A novel organosilane compound having polymerizability is disclosed which is a vinyl .omega.-triorganosilyl n-undecanoate of the formula CH.sub.2 .dbd.CH--O--CO--(--CH.sub.2 --).sub.10 --SiR.sub.3, in which R is an alkyl group having 1 to 4 carbon atoms, alkoxy group having 1 to 4 carbon atoms or trialkyl siloxy group of which the alkyl group has 1 to 4 carbon atoms. This compound can be prepared by the hydrosilylation reaction between a triorganosilane of the formula HSiR.sub.3 and vinyl 10-undecenoate of the formulaCH.sub.2 .dbd.CH--O--CO--(--CH.sub.2 --).sub.8 --CH.dbd.CH.sub.2in the presence of a platinum catalyst. The compound is polymerizable to give not only a homopolymer of the compound alone but also a copolymer with other comonomers such as vinyl chloride, chloro trifluoroethylene, methyl methacrylate and the like.
摘要:
Cycloalkyl silane compounds such as cyclohexyl methyl dichlorosilane can be efficiently prepared by the photochemically induced hydrosilylation reaction. For example, an equimolar mixture of cyclohexene and methyl dichlorosilane with admixture of a catalytic amount of a platinum catalyst, which is an alcohol complex of chloroplatinic acid, is irradiated at a temperature of 70.degree. C. with ultraviolet light so that the hydrosilylation reaction takes place and proceeds almost to completeness without deactivation of the platinum catalyst to give the desired product in a yield of 90% or even higher. Unexpectedly, the efficiency of the reaction can be greatly increased when the platinum catalyst is prepared by heating a solution of chloroplatinic acid in 2-ethylhexyl alcohol at 50.degree. to 80.degree. C. for at least 4 hours.
摘要:
3-(Vinylbenzyloxy)propylsilane compounds represented by the general formula, CH.sub.2 CH.PHI. CH.sub.2 OCH.sub. CH.sub.2 CH.sub.2 SiR.sup.1.sub.n (OR.sup.2).sub.3-n (wherein R.sup.1 and R.sup.2 each represent a hydrocarbon residue containing 1 to 4 carbon atoms, and n represents an integer from 0 to 2) are provided as novel styrene skeleton-containing alkoxysilane compounds which are highly useful as silane coupling agent or polymerizing monomer.