OPTOELECTRONIC SEMICONDUCTOR CHIP AND METHOD FOR PRODUCTING AN OPTOELECTRONIC SEMICONDUCTOR CHIP

    公开(公告)号:US20210005784A1

    公开(公告)日:2021-01-07

    申请号:US16980910

    申请日:2019-03-14

    Abstract: In one embodiment, the optoelectronic semiconductor chip (1) comprises a semiconductor layer sequence (2) with an active zone (23) for generating a radiation. The semiconductor layer sequence (2) is based on AlInGaP and/or on AlInGaAs. A metal mirror (3) for the radiation is located on a rear side (12) of the semiconductor layer sequence (2) opposite a light extraction side (10). A protective metallization (6) is applied directly to a side of the metal mirror (3) facing away from the semiconductor layer sequence (2). An adhesion promoting layer (7) is located directly on a side of the metal mirror (3) facing the semiconductor layer sequence (2). The adhesion promoting layer (7) is an encapsulation layer for the metal mirror (3), so that the metal mirror (3) is encapsulated at least at one outer edge by the adhesion promoting layer (7) together with the protective metallization (6).

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