公开(公告)号：US20060097084A1

公开(公告)日：2006-05-11

申请号：US10531484

申请日：2003-10-15

申请人： Oswald Gromer ,  Andreas Kramp ,  Michael Sauer ,  Michael Stolper ,  Norbert Schaefer ,  Karl Herzog

发明人： Oswald Gromer ,  Andreas Kramp ,  Michael Sauer ,  Michael Stolper ,  Norbert Schaefer ,  Karl Herzog

IPC分类号： B05B9/01 ,  A62C31/02 ,  B05B7/02 ,  B05B1/00

CPC分类号： F04B49/126 ,  A61C1/0092 ,  A61C17/0202 ,  B05B1/00 ,  B05B1/3421 ,  B05B1/3436

摘要： A dental cleaning system for providing a liquid jet for a mouth rinse includes a nozzle member, a nozzle attachment coupled to the nozzle member to define an axially extending chamber, a liquid duct configured to supply pressurized liquid to the chamber, a pressure piece disposed within the chamber, and a nozzle outlet extending out of the chamber and configured to discharge a cleaning jet.

摘要翻译： 用于提供用于漱口液的液体射流的牙科清洁系统包括喷嘴构件，联接到喷嘴构件以限定轴向延伸腔室的喷嘴附件，构造成将加压液体供应到腔室的液体管道，设置在腔室内的压力片 所述室以及从所述室延伸出并构造成排出清洁喷嘴的喷嘴出口。

公开(公告)号：US08052627B2

公开(公告)日：2011-11-08

申请号：US10531484

申请日：2003-10-15

申请人： Oswald Gromer ,  Andreas Kramp ,  Michael Sauer ,  Michael Stolper ,  Norbert Schaefer ,  Karl Herzog

发明人： Oswald Gromer ,  Andreas Kramp ,  Michael Sauer ,  Michael Stolper ,  Norbert Schaefer ,  Karl Herzog

IPC分类号： A61H9/00 ,  A61H13/00

CPC分类号： F04B49/126 ,  A61C1/0092 ,  A61C17/0202 ,  B05B1/00 ,  B05B1/3421 ,  B05B1/3436

摘要： A dental cleaning system for providing a liquid jet for a mouth rinse includes a nozzle member, a nozzle attachment coupled to the nozzle member to define an axially extending chamber, a liquid duct configured to supply pressurized liquid to the chamber, a pressure piece disposed within the chamber, and a nozzle outlet extending out of the chamber and configured to discharge a cleaning jet.

摘要翻译： 用于提供用于漱口液的液体射流的牙科清洁系统包括喷嘴构件，联接到喷嘴构件以限定轴向延伸腔室的喷嘴附件，构造成将加压液体供应到腔室的液体管道，设置在腔室内的压力片 所述室以及从所述室延伸出并构造成排出清洁喷嘴的喷嘴出口。

公开(公告)号：US20120021371A1

公开(公告)日：2012-01-26

申请号：US13250447

申请日：2011-09-30

申请人： Oswald Gromer ,  Andreas Kramp ,  Michael Sauer ,  Michael Stolper ,  Norbert Schaefer ,  Karl Herzog

发明人： Oswald Gromer ,  Andreas Kramp ,  Michael Sauer ,  Michael Stolper ,  Norbert Schaefer ,  Karl Herzog

IPC分类号： A61C17/02

CPC分类号： F04B49/126 ,  A61C1/0092 ,  A61C17/0202 ,  B05B1/00 ,  B05B1/3421 ,  B05B1/3436

摘要： A dental cleaning system for providing a liquid jet for a mouth rinse includes a nozzle member, a nozzle attachment coupled to the nozzle member to define an axially extending chamber, a liquid duct configured to supply pressurized liquid to the chamber, a pressure piece disposed within the chamber, and a nozzle outlet extending out of the chamber and configured to discharge a cleaning jet.

摘要翻译： 用于提供用于漱口液的液体射流的牙科清洁系统包括喷嘴构件，联接到喷嘴构件以限定轴向延伸腔室的喷嘴附件，构造成将加压液体供应到腔室的液体管道，设置在腔室内的压力片 所述室以及从所述室延伸出并构造成排出清洁喷嘴的喷嘴出口。

公开(公告)号：US20130038850A1

公开(公告)日：2013-02-14

申请号：US13587077

申请日：2012-08-16

申请人： Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

发明人： Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

IPC分类号： G03B27/54

CPC分类号： G03F7/70091 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.

摘要翻译： 提供了一种面罩检查装置的照明系统和投影物镜。 在掩模检查装置的操作期间，照明系统用具有取决于掩模上的照射光束的入射位置的方向的质心射线的照射束照射掩模。

公开(公告)号：US20110013171A1

公开(公告)日：2011-01-20

申请号：US12838393

申请日：2010-07-16

申请人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

发明人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

IPC分类号： G03B27/58

CPC分类号： G03F7/70775 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/70891

摘要： A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26. An evaluation device (54) is configured to establish a lateral position of the image of the measurement structure (48) in the area of the detector (52) during the exposure process.

摘要翻译： 一种用于微光刻的投影曝光系统（10），包括：保持掩模（18）的掩模保持装置（14），掩模结构（20）设置在掩模上;保持基板（30）的基板保持装置（36） 投影光学器件（26）在曝光过程期间将掩模结构（20）成像到衬底（30）上;以及测量结构（48），其相对于投影曝光系统的参考元件（16）设置在限定位置 10），所述限定位置与所述掩模保持装置（14）的位置机械地脱离。 投影曝光系统（10）还包括检测器（52），其被布置成记录由投影光学器件（26）成像的测量结构（48）的图像。 投影曝光系统（10）被配置为使得在投影曝光系统（10）的操作期间，掩模结构（20）的成像和测量结构（48）的成像同时由投影光学器件 （26）评估装置（54）被配置为在曝光处理期间在检测器（52）的区域中建立测量结构（48）的图像的横向位置。

公开(公告)号：US20080285018A1

公开(公告)日：2008-11-20

申请号：US12181774

申请日：2008-07-29

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G01J1/00

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.

摘要翻译： 一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域， 提供相关联的图像场掩模和相应的设备。 还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。 照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处 外部暗场区域，其定义了最大散射范围。 该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。 应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

公开(公告)号：US07408631B2

公开(公告)日：2008-08-05

申请号：US10960082

申请日：2004-10-08

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G01B9/00 ,  G01J1/00 ,  G03B27/42

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.

摘要翻译： 一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域， 提供相关联的图像场掩模和相应的设备。 还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。 照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处 外部暗场区域，其定义了最大散射范围。 该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。 应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

公开(公告)号：US10114293B2

公开(公告)日：2018-10-30

申请号：US13587077

申请日：2012-08-16

申请人： Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

发明人： Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

IPC分类号： G03F7/20 ,  G01N21/956 ,  G03F1/84

摘要： An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.

公开(公告)号：US09001304B2

公开(公告)日：2015-04-07

申请号：US12838393

申请日：2010-07-16

申请人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

发明人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/70891

摘要： A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26. An evaluation device (54) is configured to establish a lateral position of the image of the measurement structure (48) in the area of the detector (52) during the exposure process.

摘要翻译： 一种用于微光刻的投影曝光系统（10），包括：保持掩模（18）的掩模保持装置（14），掩模结构（20）设置在掩模上;保持基板（30）的基板保持装置（36） 投影光学器件（26）在曝光过程期间将掩模结构（20）成像到衬底（30）上;以及测量结构（48），其相对于投影曝光系统的参考元件（16）设置在限定位置 10），所述限定位置与所述掩模保持装置（14）的位置机械地脱离。 投影曝光系统（10）还包括检测器（52），其被布置成记录由投影光学器件（26）成像的测量结构（48）的图像。 投影曝光系统（10）被配置为使得在投影曝光系统（10）的操作期间，掩模结构（20）的成像和测量结构（48）的成像同时由投影光学器件 （26）评估装置（54）被配置为在曝光处理期间在检测器（52）的区域中建立测量结构（48）的图像的横向位置。

公开(公告)号：US20050264819A1

公开(公告)日：2005-12-01

申请号：US10960082

申请日：2004-10-08

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G03F7/20 ,  G01N21/47

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.

摘要翻译： 一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域， 提供相关联的图像场掩模和相应的设备。 还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。 照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处 外部暗场区域，其定义了最大散射范围。 该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。 应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。