公开(公告)号：US06334938B2

公开(公告)日：2002-01-01

申请号：US09729102

申请日：2000-12-05

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi ,  Takuji Oyama ,  Kenichi Sasaki

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi ,  Takuji Oyama ,  Kenichi Sasaki

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

公开(公告)号：US06193856B1

公开(公告)日：2001-02-27

申请号：US09011749

申请日：1998-03-12

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

摘要翻译： 1.一种溅射靶，包括在所述基板上形成的基板和靶材，其中所述靶材包含化学式MO x的金属氧化物为主要成分，其中MOx为与所述化学计量组成相比缺氧的金属氧化物 M是选自Ti，Nb，Ta，Mo，W，Zr和Hf中的至少一种金属，其制造方法以及具有高折射率的膜的形成方法。

公开(公告)号：US06440278B1

公开(公告)日：2002-08-27

申请号：US09964625

申请日：2001-09-28

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

摘要翻译： 1.一种溅射靶，包括在所述基板上形成的基板和靶材，其中所述靶材包含化学式MO x的金属氧化物为主要成分，其中MOx为与所述化学计量组成相比缺氧的金属氧化物 M是选自Ti，Nb，Ta，Mo，W，Zr和Hf中的至少一种金属，其制造方法以及具有高折射率的膜的形成方法。

公开(公告)号：US06743343B2

公开(公告)日：2004-06-01

申请号：US10191321

申请日：2002-07-10

申请人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

发明人： Otojiro Kida ,  Akira Mitsui ,  Eri Suzuki ,  Hisashi Osaki ,  Atsushi Hayashi

IPC分类号： C23C1434

CPC分类号： C23C14/083 ,  C23C4/02 ,  C23C4/11 ,  C23C14/3414

摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

摘要翻译： 1.一种溅射靶，包括在所述基板上形成的基板和靶材，其中所述靶材包含化学式MO x的金属氧化物为主要成分，其中MOx为与所述化学计量组成相比缺氧的金属氧化物 M是选自Ti，Nb，Ta，Mo，W，Zr和Hf中的至少一种金属，其制造方法以及具有高折射率的膜的形成方法。

公开(公告)号：US5354446A

公开(公告)日：1994-10-11

申请号：US936281

申请日：1992-08-28

申请人： Otojiro Kida ,  Akira Mitsui ,  Atsushi Hayashi

发明人： Otojiro Kida ,  Akira Mitsui ,  Atsushi Hayashi

IPC分类号： C03C17/245 ,  C03C17/34 ,  C23C14/08 ,  C23C14/34 ,  G02B1/10 ,  G02F1/1333 ,  G02F1/1335 ,  H01J37/34

CPC分类号： H01J37/3435 ,  C03C17/245 ,  C03C17/3417 ,  C23C14/08 ,  C23C14/3407 ,  C23C14/3414 ,  G02B1/105 ,  H01J37/3426 ,  H01J37/3491 ,  C03C2217/213 ,  C03C2217/23 ,  C03C2217/242 ,  C03C2218/154 ,  G02F1/133502 ,  G02F2001/133337 ,  Y02T10/88

摘要： A ceramics rotatable magnetron sputtering cathode target comprising a cylindrical target holder and a ceramics layer as a target to be sputtered, formed on the outer surface of the target holder, wherein at least one layer selected from the group consisting of a layer of a metal or alloy having a thermal expansion coefficient of an intermediate level between the thermal expansion coefficients of the ceramics layer and the target holder, and a layer of a metal or alloy having a thermal expansion coefficient approximating to the thermal expansion coefficient of the ceramics layer, is formed as an undercoat between the ceramics layer and the target holder.

摘要翻译： 一种陶瓷可旋转磁控溅射阴极靶，其包括圆柱形靶保持器和作为溅射靶的陶瓷层，形成在靶保持器的外表面上，其中至少一层选自金属层或 形成具有陶瓷层和靶保持体的热膨胀系数之间的中间水平的热膨胀系数的合金，以及具有接近于陶瓷层的热膨胀系数的热膨胀系数的金属或合金层 作为陶瓷层和靶保持体之间的底涂层。

公开(公告)号：US06639318B1

公开(公告)日：2003-10-28

申请号：US09647917

申请日：2000-10-13

申请人： Akira Mitsui ,  Atsushi Hayashi ,  Kiyoshi Matsumoto ,  Hiromichi Nishimura ,  Yasuhiro Sanada ,  Makoto Noshiro ,  Kazuo Sunahara

发明人： Akira Mitsui ,  Atsushi Hayashi ,  Kiyoshi Matsumoto ,  Hiromichi Nishimura ,  Yasuhiro Sanada ,  Makoto Noshiro ,  Kazuo Sunahara

IPC分类号： H01L2940

CPC分类号： H01L21/76843 ,  H01L23/53228 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention has an object to provide an integrated circuit device having a Cu wiring, using a barrier layer which facilitates planarization. The present invention relates to an integrated circuit device having a Cu wiring layer, a barrier layer therefor and a dielectric layer, wherein the barrier layer is represented by a compositional formula of TaOxNy (the range of x being 0

摘要翻译： 本发明的目的是提供一种使用有助于平坦化的阻挡层的具有Cu布线的集成电路器件。 本发明涉及一种具有Cu布线层及其阻挡层和介电层的集成电路器件，其中阻挡层由组成式TaOxNy（x的范围为0

公开(公告)号：US5736267A

公开(公告)日：1998-04-07

申请号：US515805

申请日：1995-08-16

申请人： Akira Mitsui ,  Kazuo Sato ,  Masami Miyazaki ,  Junichi Ebisawa ,  Yasuo Hayashi ,  Masao Higeta ,  Katsuaki Aikawa ,  Atsushi Hayashi

发明人： Akira Mitsui ,  Kazuo Sato ,  Masami Miyazaki ,  Junichi Ebisawa ,  Yasuo Hayashi ,  Masao Higeta ,  Katsuaki Aikawa ,  Atsushi Hayashi

IPC分类号： C23C14/06 ,  C23C14/08 ,  C23C14/34 ,  B32B9/00

CPC分类号： C23C14/08 ,  C23C14/0641 ,  C23C14/0676 ,  C23C14/086 ,  C23C14/3414 ,  Y10S428/91 ,  Y10T428/31667

摘要： A transparent conductive film of a zinc oxide type containing gallium and silicon, which contains silicon in an amount of from 0.01 to 1.5 mol % in terms of SiO.sub.2.

公开(公告)号：US6146765A

公开(公告)日：2000-11-14

申请号：US912361

申请日：1997-08-18

申请人： Akira Mitsui ,  Kazuo Sato ,  Masami Miyazaki ,  Junichi Ebisawa ,  Yasuo Hayashi ,  Masao Higeta ,  Katsuaki Aikawa ,  Atsushi Hayashi

发明人： Akira Mitsui ,  Kazuo Sato ,  Masami Miyazaki ,  Junichi Ebisawa ,  Yasuo Hayashi ,  Masao Higeta ,  Katsuaki Aikawa ,  Atsushi Hayashi

IPC分类号： C23C14/06 ,  C23C14/08 ,  C23C14/34 ,  B32B15/04 ,  B32B17/06

CPC分类号： C23C14/08 ,  C23C14/0641 ,  C23C14/0676 ,  C23C14/086 ,  C23C14/3414 ,  Y10S428/91

摘要： A transparent conductive film of a zinc oxide type containing gallium and silicon, which contains silicon in an amount of from 0.01 to 1.5 mol % in terms of SiO.sub.2.

摘要翻译： 含有硅和硅的氧化锌类的透明导电膜，其含有SiO 2换算为0.01〜1.5摩尔％的硅。

公开(公告)号：US07213479B2

公开(公告)日：2007-05-08

申请号：US10785130

申请日：2004-02-24

申请人： Akira Mitsui

发明人： Akira Mitsui

IPC分类号： F16H33/10

CPC分类号： E02D3/026 ,  E01C19/286 ,  Y10T74/18344 ,  Y10T74/18544 ,  Y10T74/18552

摘要： A vibratory mechanism includes vibratory shafts, which are stored within a roll and are arranged symmetrically across a rotation axis of the roll, fixed eccentric weights fixed to respective vibratory shafts, rotatable eccentric weights rotatably attached to respective vibratory shafts, a rotation controller controlling a range of movement of the rotatable eccentric weights, and an eccentric moment controller which changes an eccentric moment around the vibratory shaft depending on the rotation direction of the vibratory shafts, whereby the vibration state of the roll is switchable between standard vibration and horizontal vibration.

摘要翻译： 振动机构包括振动轴，其存储在辊内并且对称地跨过辊的旋转轴线布置，固定到各个振动轴的固定偏心重块，可旋转地附接到各个振动轴的旋转偏心轮，控制范围的旋转控制器 以及偏心力矩控制器，该偏心力矩控制器根据振动轴的旋转方向改变围绕振动轴的偏心力矩，从而可以在标准振动和水平振动之间切换辊的振动状态。

公开(公告)号：US20060270209A1

公开(公告)日：2006-11-30

申请号：US11500896

申请日：2006-08-09

申请人： Akira Mitsui ,  Hidefumi Odaka ,  Shigeaki Yonemori ,  Yasuhiko Akao

发明人： Akira Mitsui ,  Hidefumi Odaka ,  Shigeaki Yonemori ,  Yasuhiko Akao

IPC分类号： H01L21/44

CPC分类号： C03C17/245 ,  C03C2217/231 ,  C03C2218/154 ,  C03C2218/328 ,  C03C2218/33 ,  G02F1/13439 ,  H01J9/02 ,  H01J2217/04 ,  H01L31/1884 ,  Y02E10/50

摘要： To provide a process for producing a transparent electrode comprising a tin oxide film which can readily be patterned, which can be realized at a low cost, and which has low resistivity and is excellent in transparency. A process for producing a transparent electrode having a patterned tin oxide film formed on a substrate, which comprises a step of forming a tin oxide film having light absorption characteristics on a substrate, a patterning step of removing part of the tin oxide film having light absorption characteristics, and a step of subjecting the patterned tin oxide film having light absorption characteristics to heat treatment to obtain a tin oxide film.

摘要翻译： 提供一种制造透明电极的方法，该透明电极包括可以容易地被图案化的氧化锡膜，其可以以低成本实现，并且具有低电阻率并且透明度优异。 一种用于制造在基板上形成有图案化氧化锡膜的透明电极的方法，其包括在基板上形成具有吸光特性的氧化锡膜的步骤，除去部分具有吸光性的氧化锡膜的图案化步骤 特性，以及对具有光吸收特性的图案化氧化锡膜进行热处理以获得氧化锡膜的步骤。