Process for sulfur-containing derivatives of hydroxyphenylbenzotriazoles
    1.
    发明授权
    Process for sulfur-containing derivatives of hydroxyphenylbenzotriazoles 失效
    羟苯基苯并三唑的含硫衍生物的方法

    公开(公告)号:US5410071A

    公开(公告)日:1995-04-25

    申请号:US197905

    申请日:1994-02-17

    摘要: A composition that, when present in a polymer matrix, reduces the deleterious effect of UV light absorption by the polymer is provided, which comprises a sulfur-containing derivative of hydroxyphenylbenzotriazole having the formula of: ##STR1## wherein each X is selected from the group consisting of hydrogen, halogens, cyano, alkyl, phenyl group, biphenyl group, arylthio, amine, ketone, aldehyde, alkoxy, hydroxy, carboxylic acid group, oligomer and combinations thereof and can have carbon atoms up to about 20; n is a whole number from 1 to 5; n' is a whole number from 0 to 4; n" is a whole number from 1 to 2 and each n" can be the same or different; q is an integer from 1 to 10; each Y is selected from the group consisting of --S(O)(O)--, --S(O)--, and --S--; each R can be selected from the group consisting of hydrogen, alkyl group, alkenyl group, aralkyl group, alkaryl group, and combinations thereof and can have 0 to about 10 carbon atoms; each OH group can be at either the 2'- or the 6'-position, or both. Also provided are a composition comprising the sulfur-containing derivative, a process for preparing the derivative, a composition comprising a polymer chemically bonded to the derivative, and a process for preparing the composition which comprises a polymer chemically bonded to the derivative.

    摘要翻译: 当存在于聚合物基质中时,提供降低由聚合物引起的UV光吸收的有害影响的组合物,其包含具有下式的羟基苯基苯并三唑的含硫衍生物:其中每个X选自 由氢,卤素,氰基,烷基,苯基,联苯基,芳硫基,胺,酮,醛,烷氧基,羟基,羧酸基,低聚物及其组合组成,可以具有高达约20的碳原子; n为1〜5的整数; n'是从0到4的整数; n“是从1到2的整数,并且每个n”可以相同或不同; q是1至10的整数; 每个Y选自-S(O)(O) - , - S(O) - 和-S-; 每个R可以选自氢,烷基,烯基,芳烷基,烷芳基及其组合,并且可以具有0至约10个碳原子; 每个OH基团可以在2'-或6'-位,或两者。 还提供了包含含硫衍生物的组合物,制备衍生物的方法,包含与衍生物化学键合的聚合物的组合物,以及包含与衍生物化学键合的聚合物的组合物的方法。

    Compositions comprising sulfur-containing derivatives of
hydroxyphenylbenzotriazole and process therefor
    2.
    发明授权
    Compositions comprising sulfur-containing derivatives of hydroxyphenylbenzotriazole and process therefor 失效
    包含羟苯基苯并三唑的含硫衍生物的组合物及其制备方法

    公开(公告)号:US5268450A

    公开(公告)日:1993-12-07

    申请号:US980881

    申请日:1992-11-24

    摘要: A composition comprising a stabilizer chemically bonded to a polymer matrix, and which reduces the deleterious effect of UV light absorption by the polymer is provided. The stabilizer comprises a sulfur-containing derivative of hydroxyphenylbenzotriazole having the formula of: ##STR1## wherein each X is selected from the group consisting of hydrogen, halogens, cyano, alkyl, phenyl group, biphenyl group, arylthio, amine, ketone, aldehyde, alkoxy, hydroxy, carboxylic acid group, oligomer and combinations thereof and can have carbon atoms up to about 20; n is a whole number from 1 to 5; n' is a whole number from 0 to 4; n" is a wbole number from 1 to 2 and each n" can be the same or different; Y is selected from the group consisting of --S(O)(O)--, --S(O)--, and --S--; each R can be selected from the group consisting of hydrogen, alkyl group, alkenyl group, aralkyl group, alkaryl group, and combinations thereof and can have 0 to about 10 carbon atoms; each OH group can be at either the 2'- or the 6'-position, or both.

    摘要翻译: 提供一种组合物,其包含与聚合物基质化学键合的稳定剂,并且降低聚合物对UV光吸收的有害影响。 稳定剂包括具有下式的羟基苯基苯并三唑的含硫衍生物:其中每个X选自氢,卤素,氰基,烷基,苯基,联苯基,芳硫基,胺,酮,醛, 烷氧基,羟基,羧酸基,低聚物及其组合,并且可以具有高达约20的碳原子; n为1〜5的整数; n'是从0到4的整数; n“是从1到2的wbole数,每个n”可以相同或不同; Y选自-S(O)(O) - , - S(O) - 和-S-; 每个R可以选自氢,烷基,烯基,芳烷基,烷芳基及其组合,并且可以具有0至约10个碳原子; 每个OH基团可以在2'-或6'-位,或两者。

    Process for sulfur containing derivatives of hydroxyphenyl/benzotriazoles
    3.
    发明授权
    Process for sulfur containing derivatives of hydroxyphenyl/benzotriazoles 失效
    羟基苯基/苯并三唑的含硫衍生物的方法

    公开(公告)号:US5319091A

    公开(公告)日:1994-06-07

    申请号:US981024

    申请日:1992-11-24

    摘要: A composition that, when present in a polymer matrix, reduces the deleterious effect of UV light absorption by the polymer is provided, which comprises a sulfur-containing derivative of hydroxyphenylbenzotriazole having the formula of: ##STR1## wherein each X is selected from the group consisting of hydrogen, halogens, cyano, alkyl, phenyl group, biphenyl group, arylthio, amine, ketone, aldehyde, alkoxy, hydroxy, carboxylic acid group, oligomer and combinations thereof and can have carbon atoms up to about 20; n is a whole number from 1 to 5; n' is a whole number from 0 to 4; n" is a whole number from 1 to 2 and each n" can be the same or different; q is an integer from 1 to 10; each Y is selected from the group consisting of --S(O) (O)--, --S(O)--, and --S--; each R can be selected from the group consisting of hydrogen, alkyl group, alkenyl group, aralkyl group, alkaryl group, and combinations thereof and can have 0 to about 10 carbon atoms; each OH group can be at either the 2'- or the 6'-position, or both. Also provided are a composition comprising the sulfur-containing derivative, a process for preparing the derivative, a composition comprising a polymer chemically bonded to the derivative, and a process for preparing the composition which comprises a polymer chemically bonded to the derivative.

    摘要翻译: 当存在于聚合物基质中时,提供降低由聚合物引起的UV光吸收的有害影响的组合物,其包含具有下式的羟基苯基苯并三唑的含硫衍生物:其中每个X选自 由氢,卤素,氰基,烷基,苯基,联苯基,芳硫基,胺,酮,醛,烷氧基,羟基,羧酸基,低聚物及其组合组成,可以具有高达约20的碳原子; n为1〜5的整数; n'是从0到4的整数; n“是从1到2的整数,并且每个n”可以相同或不同; q是1至10的整数; 每个Y选自-S(O)(O) - , - S(O) - 和-S-; 每个R可以选自氢,烷基,烯基,芳烷基,烷芳基及其组合,并且可以具有0至约10个碳原子; 每个OH基团可以在2'-或6'-位,或两者。 还提供了包含含硫衍生物的组合物,制备衍生物的方法,包含与衍生物化学键合的聚合物的组合物,以及包含与衍生物化学键合的聚合物的组合物的方法。

    Ultra high molecular weight polyethylene fractions having narrow molecular weight distributions and methods of making and using the same
    7.
    发明授权
    Ultra high molecular weight polyethylene fractions having narrow molecular weight distributions and methods of making and using the same 有权
    具有窄分子量分布的超高分子量聚乙烯级分及其制备和使用方法

    公开(公告)号:US07241620B2

    公开(公告)日:2007-07-10

    申请号:US10754373

    申请日:2004-01-09

    IPC分类号: G01N30/02 C08F6/12

    摘要: Polymer fractions such as polyethylene fractions can be produced that have a PDI less than about 2.3 and a Mw greater than about 1,000,000 g/mol, 3,000,000 g/mol, or 6,000,000 g/mol. Such polyethylene fractions are separated from a UHMWPE parent polymer by first dissolving the parent polymer in a relatively good solvent. The conditions employed for such dissolution are selected to reduce the degradation of the parent polymer. The resulting parent solution is transported into a fractionation column in which a support is disposed. The fractionation column is thereafter operated at conditions effective to form a precipitate on the support comprising the desired polyethylene fraction. The polyethylene fraction may then be recovered from the fractionation column by repeatedly displacing a solvent/non-solvent mixture into the column to dissolve the polyethylene fraction. The relative concentrations of the solvent and the non-solvent are based on a solvent gradient profile of the polyethylene parent polymer.

    摘要翻译: 可以制备聚合物级分例如聚乙烯级分,其具有小于约2.3的PDI和大于约1,000,000g / mol,3,000,000g / mol或6,000,000g / mol的M max。 通过首先将母体聚合物溶解在相对良好的溶剂中,将这样的聚乙烯部分与UHMWPE母体聚合物分离。 选择用于这种溶解的条件以降低母体聚合物的降解。 将所得的母体溶液输送到其中设置有支持物的分馏塔。 然后分馏塔在有效地在包含所需聚乙烯部分的载体上形成沉淀物的条件下操作。 然后可以通过将溶剂/非溶剂混合物重复置换到柱中以溶解聚乙烯部分,从分馏塔中回收聚乙烯部分。 溶剂和非溶剂的相对浓度基于聚乙烯母体聚合物的溶剂梯度分布。