公开(公告)号：US5322567A

公开(公告)日：1994-06-21

申请号：US782147

申请日：1991-10-24

申请人： Paul L. Deaton ,  Norma Riley ,  James V. Rinnovatore

发明人： Paul L. Deaton ,  Norma Riley ,  James V. Rinnovatore

IPC分类号： H01L21/205 ,  C23C16/44 ,  C30B25/14 ,  H01L21/285 ,  H01L21/31 ,  C23C16/00

CPC分类号： C23C16/4412 ,  C30B25/14

摘要： In an epitaxial reactor system using a vacuum pump which is connected to the reaction chamber by an exhaust line, particulate contaminants normally deposit in the exhaust line near its juncture with the reaction chamber. When the vacuum pump is isolated from the reaction chamber during a back-filling operation, these contaminants can be entrained in the currents of gas normally produced in the back-filling operation. A removable baffle device having the shape of a truncated cone and including a wafer catching device that holds a disk shaped particulate baffle member is placed in the exhaust line at its juncture with the reaction chamber to prevent these particles from re-entering the reaction chamber.

摘要翻译： 在使用通过排气管连接到反应室的真空泵的外延反应器系统中，微粒污染物通常在与反应室接合处的排气管中沉积。 当在后填充操作期间真空泵与反应室隔离时，这些污染物可能被夹带在通常在回填操作中产生的气体的电流中。 具有截头圆锥形状并且包括保持盘形颗粒挡板构件的晶片捕获装置的可移除挡板装置在其与反应室的接合处放置在排气管线中，以防止这些颗粒再次进入反应室。

公开(公告)号：US5178681A

公开(公告)日：1993-01-12

申请号：US647386

申请日：1991-01-29

申请人： Joseph C. Moore ,  Paul L. Deaton

发明人： Joseph C. Moore ,  Paul L. Deaton

IPC分类号： C23C14/50 ,  C30B25/12 ,  H01L21/205 ,  H01L21/285 ,  H01L21/31 ,  H01L21/687

CPC分类号： H01L21/68785 ,  Y10T403/51

摘要： A suspension system for hanging a susceptor inside a reactor for processing semiconductor wafers. A hanger is provided with a flange at its lower end for supporting the susceptor. A collar has an internal flange which engages with another flange at the upper end of the hanger. The collar flange and the hanger flange each have a trucated, conical contact surface which are in substanitally continuous contact with each other. The mating flanges permit the susceptor to self-center and provide for different rates of thermal expansion of the collar and hanger.