Device for implementing chemical reactions and processes in high frequency fields
    2.
    发明授权
    Device for implementing chemical reactions and processes in high frequency fields 失效
    用于实现高频场化学反应和工艺的装置

    公开(公告)号:US06949227B2

    公开(公告)日:2005-09-27

    申请号:US09980026

    申请日:2001-03-27

    IPC分类号: B01J19/12 H05B6/64 B01J19/08

    摘要: A devise for carrying out chemical reactions and processes in high-frequency fields, comprises a high-frequency chamber 2 for irradiating a solid, liquid or gaseous substance while under pressure with at least one radiation source and a reactor for exposing to a high-frequency field. The reactor being connectively coupled to the upper wall 4 of the high-frequency chamber 2 through a sealable connection 3. Rail elements 5 are provided around the reactor, and configured to form a pressure-resistant cage. The rail elements 5 each have a guide 11 for holding a crown-shaped holder 12. The holder 12 is fixed in its position by the guides 11 of the rail elements 5. Multiple reaction chambers can be incorporated as a batch reactor system.

    摘要翻译: 用于在高频场中进行化学反应和过程的设备包括用于在至少一个辐射源和用于暴露于高频的反应器的压力下照射固体,液体或气体物质的高频室2 领域。 反应器通过可密封的连接3连接到高频室2的上壁4。 轨道元件5设置在反应器周围,并构造成形成耐压保持架。 轨道元件5各自具有用于保持冠状保持器12的引导件11。 保持器12通过轨道元件5的引导件11固定在其位置。 可以将多个反应室作为间歇反应器系统并入。