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1.发明授权Integrated circuit manufacturing methods with patterning device position determination 有权具有图案形成装置位置确定的集成电路制造方法公开(公告)号：US07804584B2
公开(公告)日：2010-09-28
申请号：US12262647
申请日：2008-10-31
申请人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
发明人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
CPC分类号： G03F7/70716 , G03F7/70775
摘要： Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.
摘要翻译： 公开了通过光刻设备制造集成电路的方法。 所述方法包括用图案形成装置图案化辐射束，使用投影系统将图案化的光束投射到衬底上，并且确定图案形成装置的位置。 在一个示例中，图案形成装置相对于投影系统的位置通过测量图案形成装置的支撑结构的位置来确定。 在另一示例中，位置可以通过测量图案形成装置相对于其支撑件的位置并通过测量支撑件的位置来确定。 在另一示例中，通过将至少一束辐射引导到位于图案区域外的图案形成装置的一部分来确定图案形成装置的Z位置。 这可以通过将一对激光束从投影系统上的传感器引导到图案形成装置上的反射条来实现。
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2.发明申请Integrated Circuit Manufacturing Methods with Patterning Device Position Determination 有权具有图案化设备位置确定的集成电路制造方法公开(公告)号：US20090061361A1
公开(公告)日：2009-03-05
申请号：US12262647
申请日：2008-10-31
申请人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
发明人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70775
摘要： Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.
摘要翻译： 公开了通过光刻设备制造集成电路的方法。 所述方法包括用图案形成装置图案化辐射束，使用投影系统将图案化的光束投射到衬底上，并且确定图案形成装置的位置。 在一个示例中，图案形成装置相对于投影系统的位置通过测量图案形成装置的支撑结构的位置来确定。 在另一示例中，位置可以通过测量图案形成装置相对于其支撑件的位置并通过测量支撑件的位置来确定。 在另一示例中，通过将至少一束辐射引导到位于图案区域外的图案形成装置的一部分来确定图案形成装置的Z位置。 这可以通过将一对激光束从投影系统上的传感器引导到图案形成装置上的反射条来实现。
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公开(公告)号：US07471373B2
公开(公告)日：2008-12-30
申请号：US10876786
申请日：2004-06-25
申请人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
发明人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
CPC分类号： G03F7/70716 , G03F7/70775
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.
摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。
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公开(公告)号：US06977713B2
公开(公告)日：2005-12-20
申请号：US10729376
申请日：2003-12-08
申请人： Bernardus Antonius Johannes Luttikhuis , Pertrus Rutgerus Bartray , Wilhelmus Josephus Box , Martinus Hendrikus Antonius Leenders , Marc Wilhelmus Maria Van Der Wijst
发明人： Bernardus Antonius Johannes Luttikhuis , Pertrus Rutgerus Bartray , Wilhelmus Josephus Box , Martinus Hendrikus Antonius Leenders , Marc Wilhelmus Maria Van Der Wijst
CPC分类号： G03F7/70858
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.
摘要翻译： 光刻设备包括用于提供辐射束的照明系统，构造成支撑图案形成装置的支撑结构，其用于使投影光束在其横截面上具有图案，用于保持衬底的衬底台，用于保持衬底的突起 将图案化光束投影到基板的目标部分上的系统，以及具有位置传感器并且基板位于其上的参考框架。 该装置还包括具有加热元件的热传输系统，其与投影系统和参考框架中的至少一个进行热相互作用，用于传输到投影系统和参考框架中的至少一个的热传递，其中热量 传输系统耦合到与参考系机械隔离的另一帧。
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公开(公告)号：US07130019B2
公开(公告)日：2006-10-31
申请号：US10986182
申请日：2004-11-12
申请人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Carlo Cornelis Maria Luijten , Bernardus Antonius Johannes Luttikhuis , Michael Ten Bhomer , Ferdy Migchelbrink , Jan Jaap Kuit
发明人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Carlo Cornelis Maria Luijten , Bernardus Antonius Johannes Luttikhuis , Michael Ten Bhomer , Ferdy Migchelbrink , Jan Jaap Kuit
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10−6/K.
摘要翻译： 提供了一种光刻设备，其包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。 图案形成装置用于使辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于提供参考表面的隔离参考框架，以及用于测量基板相对于基板的测量系统 参考面。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。
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6.发明授权Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination 有权利用清洁空气的移动来减少污染的平版印刷设备和设备制造方法公开(公告)号：US07522258B2
公开(公告)日：2009-04-21
申请号：US11169305
申请日：2005-06-29
申请人： Bernardus Antonius Johannes Luttikhuis , Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Marco Koert Stavenga , Thijs Harink
发明人： Bernardus Antonius Johannes Luttikhuis , Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Marco Koert Stavenga , Thijs Harink
CPC分类号： G03F7/70916 , G03F7/7075 , G03F7/70791
摘要： A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.
摘要翻译： 光刻设备包括支撑衬底的衬底台和相对于衬底台移动衬底的衬底处理器。 衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。 此外，清洁气体供应系统将清洁气体提供到至少一个位置，在该位置处衬底被定位。 清洁气体供应系统可移动安装。 利用光刻设备的器件制造方法可用于制造平板显示器和集成电路器件中的至少一个。
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公开(公告)号：US20100002207A1
公开(公告)日：2010-01-07
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译： 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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公开(公告)号：US08289498B2
公开(公告)日：2012-10-16
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译： 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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公开(公告)号：US07126664B2
公开(公告)日：2006-10-24
申请号：US10888513
申请日：2004-07-12
申请人： Bernardus Antonius Johannes Luttikhuis , Petrus Rutgerus Bartray , Johannes Henricus Wilhelmus Jacobs , Thijs Harink , Paulus Martinus Maria Liebregts
发明人： Bernardus Antonius Johannes Luttikhuis , Petrus Rutgerus Bartray , Johannes Henricus Wilhelmus Jacobs , Thijs Harink , Paulus Martinus Maria Liebregts
CPC分类号： G03F7/70841
摘要： A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.
摘要翻译： 公开了一种光刻设备。 该装置包括构造成支撑图案形成装置的支撑件，该图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 第一真空环境包含投影系统，第二真空环境包含图案形成装置支撑件，分离器分离第一和第二真空环境。 分离器包括用于使投影束从第一真空环境朝向图案形成装置传递的孔，和/或反之亦然。 图案形成装置形成用于基本上密封隔膜的孔的密封件的至少一部分。
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10.发明授权公开(公告)号：US07545478B2
公开(公告)日：2009-06-09
申请号：US10838525
申请日：2004-05-05
申请人： Wilhelmus Josephus Box , Bernardus Antonius Johannes Luttikhuis , Thomas Henricus Jacobus Verhagen
发明人： Wilhelmus Josephus Box , Bernardus Antonius Johannes Luttikhuis , Thomas Henricus Jacobus Verhagen
CPC分类号： G03F7/70833 , G03F7/70891
摘要： A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.
摘要翻译： 一种具有被配置为提供辐射束的照明系统的光刻设备; 构造成支撑图案形成装置的支撑结构，所述图案形成装置能够在其横截面中赋予所述辐射束图案，从而提供图案化的辐射束; 被配置为保持基板的基板台; 投影系统，布置成将图案化的辐射束投影到基板的目标部分上;以及投影系统支撑件，被配置为将投影系统支撑在参考系上。 光刻设备还包括被配置为热调节投影系统支撑件的热调节系统。 本发明还涉及一种构造和布置成对投影系统支撑件进行热调节的热调节系统。 本发明还涉及一种用于制造器件的器件制造方法和方法。
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