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1.发明授权公开(公告)号：US08449950B2
公开(公告)日：2013-05-28
申请号：US12862244
申请日：2010-08-24
申请人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J. K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
发明人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J. K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
CPC分类号： H01M4/0419 , H01M4/1391
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising precursor particles dispersed in a carrying medium is activated in an activation chamber by application of an electric field to ionize at least a portion of the precursor mixture. The activated precursor mixture is then mixed with a combustible gas mixture to add thermal energy to the precursor particles, converting them to nanocrystals, which deposit on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译： 提供一种用于形成薄膜电池的电化学层的方法和装置。 包含分散在携带介质中的前体颗粒的前体混合物通过施加电场在活化室中活化，以电离至少一部分前体混合物。 然后将活化的前体混合物与可燃气体混合物混合，以向前体颗粒添加热能，将其转化成沉积在基材上的纳米晶体。 当第二前体沉积在表面上以增强粘附性和导电性时，可与纳米晶体共混。
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2.发明授权公开(公告)号：US08399065B2
公开(公告)日：2013-03-19
申请号：US12862265
申请日：2010-08-24
申请人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J. K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
发明人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J. K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
CPC分类号： H01M4/0419 , H01M4/1391
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising electrochemically active precursor particles dispersed in a carrying medium is provided to a processing chamber and thermally treated using a combustible gas mixture also provided to the chamber. The precursor is converted to nanocrystals by the thermal energy, and the nanocrystals are deposited on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译： 提供一种用于形成薄膜电池的电化学层的方法和装置。 将包含分散在载运介质中的电化学活性前体颗粒的前体混合物提供到处理室，并使用也提供给室的可燃气体混合物进行热处理。 通过热能将前体转化成纳米晶体，并将纳米晶体沉积在基底上。 当第二前体沉积在表面上以增强粘附性和导电性时，可与纳米晶体共混。
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公开(公告)号：US07137868B2
公开(公告)日：2006-11-21
申请号：US11369065
申请日：2006-03-06
申请人： Shou-Sung Chang , Stan D. Tsai , Donald J. K. Olgado , Liang-Yuh Chen , Alain Duboust , Ralph M. Wadensweiler
发明人： Shou-Sung Chang , Stan D. Tsai , Donald J. K. Olgado , Liang-Yuh Chen , Alain Duboust , Ralph M. Wadensweiler
CPC分类号： B24B37/22 , B23H5/06 , B23H5/08 , B23H5/10 , B24B37/046 , B24B37/11 , B24B37/24 , B24B37/26 , B24B49/16 , B24B53/017 , C25D17/10 , H01L21/32125
摘要： Embodiments of a pad assembly for processing a substrate are provided. The pad assembly includes a processing layer having a working surface adapted to process a substrate, a lower layer coupled to and disposed below the processing layer, and an electrode having an upper surface disposed above the lower layer and below the working surface of the processing layer. The upper surface of the electrode is at least partially exposed to the working surface to provide an electrolyte pathway between the upper surface of the electrode and the working surface.
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公开(公告)号：US07029365B2
公开(公告)日：2006-04-18
申请号：US10744904
申请日：2003-12-23
申请人： Shou-Sung Chang , Stan D Tsai , Donald J. K. Olgado , Liang-Yuh Chen , Alain Duboust , Ralph M. Wadensweiler
发明人： Shou-Sung Chang , Stan D Tsai , Donald J. K. Olgado , Liang-Yuh Chen , Alain Duboust , Ralph M. Wadensweiler
CPC分类号： B24B37/22 , B23H5/06 , B23H5/08 , B23H5/10 , B24B37/046 , B24B37/11 , B24B37/24 , B24B37/26 , B24B49/16 , B24B53/017 , C25D17/10 , H01L21/32125
摘要： Embodiments of a pad assembly for processing a substrate are provided. The pad assembly includes a processing layer having a working surface adapted to process a substrate, a lower layer coupled to and disposed below the processing layer, and an electrode having an upper surface disposed above the lower layer and below the working surface of the processing layer. The upper surface of the electrode is at least partially exposed to the working surface to provide an electrolyte pathway between the upper surface of the electrode and the working surface.
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公开(公告)号：US07709382B2
公开(公告)日：2010-05-04
申请号：US11877233
申请日：2007-10-23
申请人： Antoine P. Manens , Vladimir Galburt , Yan Wang , Alain Duboust , Donald J. K. Olgado , Liang-Yuh Chen
发明人： Antoine P. Manens , Vladimir Galburt , Yan Wang , Alain Duboust , Donald J. K. Olgado , Liang-Yuh Chen
IPC分类号： H01L21/44 , H01L21/302 , H01L21/461
CPC分类号： B23H5/08 , B24B37/042 , C25D17/10 , C25F7/00
摘要： Embodiments of the present invention provide methods of electroprocessing a substrate. One embodiment of the present invention provides a method comprises pressing a substrate against a polishing pad with a force less than about two pounds per square inch, the substrate contacting a first electrode of the polishing pad, applying an electrical bias to the substrate with the first electrode relative to a second electrode of the polishing pad, wherein the second electrode is disposed below the second electrode, and biasing a third electrode disposed in the polishing pad radially outward of the second electrode.
摘要翻译： 本发明的实施方案提供了对基底进行电处理的方法。 本发明的一个实施方案提供了一种方法，包括以小于约2磅/平方英寸的力将衬底压靠抛光垫，衬底与抛光垫的第一电极接触，将第一电极施加电偏压至衬底 电极，其中所述第二电极设置在所述第二电极下方，并且偏置设置在所述抛光垫中的第三电极，所述第三电极位于所述第二电极的径向外侧。
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公开(公告)号：US07678245B2
公开(公告)日：2010-03-16
申请号：US10880752
申请日：2004-06-30
申请人： Yan Wang , Siew Neo , Feng Liu , Stan D. Tsai , Yongqi Hu , Alain Duboust , Antoine Manens , Ralph M. Wadensweiler , Rashid Mavliev , Liang-Yuh Chen , Donald J. K. Olgado , Paul D. Butterfield , Ming-Kuei Tseng , Shou-Sung Chang , Lizhong Sun
发明人： Yan Wang , Siew Neo , Feng Liu , Stan D. Tsai , Yongqi Hu , Alain Duboust , Antoine Manens , Ralph M. Wadensweiler , Rashid Mavliev , Liang-Yuh Chen , Donald J. K. Olgado , Paul D. Butterfield , Ming-Kuei Tseng , Shou-Sung Chang , Lizhong Sun
IPC分类号： C25B9/00
CPC分类号： B23H5/06 , B23H5/08 , B23H5/10 , B24B37/046 , B24B37/16 , B24B49/16 , B24B53/017 , H01L21/32125
摘要： Embodiments of the invention generally provide a method and apparatus for processing a substrate in an electrochemical mechanical planarizing system. In one embodiment, a cell for polishing a substrate includes a processing pad disposed on a top surface of a platen assembly. A plurality of conductive elements are arranged in a spaced-apart relation across the upper planarizing surface and adapted to bias the substrate relative to an electrode disposed between the pad and the platen assembly. A plurality of passages are formed through the platen assembly between the top surface and a plenum defined within the platen assembly. In another embodiment, a system is provided having a bulk processing cell and a residual processing cell. The residual processing cell includes a biased conductive planarizing surface. In further embodiments, the conductive element is protected from attack by process chemistries.
摘要翻译： 本发明的实施方案通常提供用于在电化学机械平面化系统中处理基底的方法和装置。 在一个实施例中，用于抛光衬底的单元包括设置在压板组件的顶表面上的处理衬垫。 多个导电元件跨过上平坦化表面以间隔的关系布置，并且适于相对于设置在垫和压板组件之间的电极偏压衬底。 多个通道通过压板组件形成在顶表面和限定在压板组件内的气室之间。 在另一个实施例中，提供了具有批处理单元和残余处理单元的系统。 残余处理单元包括偏置的导电平面化表面。 在另外的实施方案中，保护导电元件免受过程化学物质的侵蚀。
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公开(公告)号：US07655565B2
公开(公告)日：2010-02-02
申请号：US11043570
申请日：2005-01-26
申请人： Antoine P. Manens , Vladimir Galburt , Yan Wang , Alain Duboust , Donald J. K. Olgado , Liang-Yuh Chen
发明人： Antoine P. Manens , Vladimir Galburt , Yan Wang , Alain Duboust , Donald J. K. Olgado , Liang-Yuh Chen
IPC分类号： H01L21/44 , H01L21/302 , H01L21/461
CPC分类号： B23H5/08 , B24B37/042 , C25D17/10 , C25F7/00
摘要： A method and apparatus for electroprocessing a substrate is provided. In one embodiment, a method for electroprocessing a substrate includes the steps of biasing a first electrode to establish a first electroprocessing zone between the electrode and the substrate, and biasing a second electrode disposed radially outward of substrate with a polarity opposite the bias applied tot he first electrode.
摘要翻译： 提供了一种用于电子处理衬底的方法和装置。 在一个实施例中，一种用于对衬底进行电处理的方法包括以下步骤：偏置第一电极以在电极和衬底之间建立第一电处理区，并且以与其施加的偏压相反的极性偏置衬底径向外侧的第二电极 第一电极。
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公开(公告)号：US20080216867A1
公开(公告)日：2008-09-11
申请号：US11411215
申请日：2006-04-24
IPC分类号： B08B7/00
CPC分类号： H01L21/67046 , B08B1/04 , H01L21/67028
摘要： In one aspect, an apparatus for cleaning an edge of a substrate is provided. The apparatus includes (1) one or more rollers of a first diameter adapted to contact an edge of a substrate and rotate the substrate; and (2) one or more rollers of a second diameter that is larger than the first diameter adapted to contact an edge of the substrate and to clean the edge of the substrate. The one or more rollers of the first diameter and the one or more rollers of the second diameter may be adapted to rotate at substantially the same speed. Numerous other aspects are provided.
摘要翻译： 一方面，提供了一种用于清洁基板的边缘的装置。 该设备包括（1）一个或多个第一直径的辊，其适于接触衬底的边缘并旋转衬底; 和（2）一个或多个第二直径的辊，其大于适于接触所述衬底的边缘并且清洁所述衬底的所述边缘的所述第一直径。 第一直径的一个或多个辊和第二直径的一个或多个辊可以适于以基本上相同的速度旋转。 提供了许多其他方面。
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公开(公告)号：US07285036B2
公开(公告)日：2007-10-23
申请号：US11562320
申请日：2006-11-21
申请人： Shou-Sung Chang , Stan D. Tsai , Donald J. K. Olgado , Liang-Yuh Chen , Alain Duboust , Ralph M. Wadensweiler
发明人： Shou-Sung Chang , Stan D. Tsai , Donald J. K. Olgado , Liang-Yuh Chen , Alain Duboust , Ralph M. Wadensweiler
CPC分类号： B24B37/22 , B23H5/06 , B23H5/08 , B23H5/10 , B24B37/046 , B24B37/11 , B24B37/24 , B24B37/26 , B24B49/16 , B24B53/017 , C25D17/10 , H01L21/32125
摘要： Embodiments of a pad assembly for processing a substrate are provided. The pad assembly includes a processing layer having a working surface adapted to process a substrate, a lower layer coupled to and disposed below the processing layer, and an electrode having an upper surface disposed above the lower layer and below the working surface of the processing layer. The upper surface of the electrode is at least partially exposed to the working surface by a plurality of apertures to provide an electrolyte pathway between the upper surface of the electrode and the working surface of the pad assembly.
摘要翻译： 提供了用于处理基板的垫组件的实施例。 焊盘组件包括处理层，其具有适于处理衬底的工作表面，耦合到处理层的下层并设置在处理层下方的电极，以及具有设置在处理层的工作表面下方和下方的上表面的电极 。 电极的上表面通过多个孔至少部分地暴露于工作表面，以在电极的上表面和焊盘组件的工作表面之间提供电解质通路。
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公开(公告)号：US07114693B1
公开(公告)日：2006-10-03
申请号：US09676362
申请日：2000-09-29
IPC分类号： F16M13/00
CPC分类号： H01L21/67126 , C25D7/12 , G05B2219/40351 , G05B2219/41457 , H01L21/2885 , H01L21/67051 , H01L21/67742 , H01L21/68707 , H05K3/241
摘要： A stable platform supports a cell, the stable platform comprises a lower mainframe, an upper mainframe, and a dampener system. The upper mainframe includes a plurality of recesses. Each recess is configured to receive a cell. The dampener system connects the lower mainframe to the upper mainframe. In one embodiment, the dampener system comprises a dampener element, such as sand, to dampen vibrations between the lower mainframe and the lower mainframe.
摘要翻译： 稳定的平台支持电池，稳定的平台包括下主机，上主机和减振器系统。 上主机包括多个凹槽。 每个凹槽被配置成接收单元。 阻尼器系统将下主机连接到上主机。 在一个实施例中，阻尼器系统包括阻尼器元件，例如沙子，以阻尼下主机和下主机之间的振动。
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