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公开(公告)号：US11754927B2
公开(公告)日：2023-09-12
申请号：US16871228
申请日：2020-05-11
Applicant: Rohm and Haas Electronic Materials LLC
Inventor： Irvinder Kaur , Colin Liu , Xisen Hou , Kevin Rowell , Mingqi Li , Cheng-Bai Xu
IPC: G03F7/38 , G03F7/40 , C07C309/28 , H01L21/311 , H01L21/027 , C07C309/01 , C07C309/39
CPC classification number: G03F7/38 , C07C309/01 , C07C309/28 , C07C309/39 , G03F7/40 , H01L21/0273 , H01L21/31138
Abstract: Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I):
wherein: Ar1 represents an aromatic group; R1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R1 groups together optionally form a fused ring structure with Ar1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar1, and two or more of R1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.
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公开(公告)号：US20210200084A1
公开(公告)日：2021-07-01
申请号：US16731666
申请日：2019-12-31
Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
IPC: G03F7/038 , C08F212/14 , G03F7/039
Abstract: A polymer comprising a first repeating unit derived from a monomer comprising a hydroxy-aryl group; a second repeating unit derived from a monomer comprising a hydroxy-aryl group protected with an acetal or ketal group; a third repeating unit derived from a (meth)acrylate monomer comprising a cycloaliphatic group; and a fourth repeating unit derived from a monomer comprising an acid-sensitive group, wherein the first, the second, the third, and the fourth repeating units are different from each other.
