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    UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
    5.
    发明申请
    UNDERLAYER COMPOSITIONS AND PATTERNING METHODS 有权

    公开(公告)号：US20220066321A1

    公开(公告)日：2022-03-03

    申请号：US17007903

    申请日：2020-08-31

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  James F. Cameron ,  Emad Aqad ,  Iou-Sheng Ke ,  Suzanne M. Coley

    IPC: G03F7/11 ,  C08G8/04 ,  C09D161/06

    Abstract: An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R1, R2; Ra and Rb are as provided herein; optionally, R1 and R2 can be taken together form a 5- to 7-membered ring; optionally, one of R11 to R13 can be taken together with R1 to form a 5- to 7-membered ring; wherein Ra and Rb optionally may be taken together to form a 5- to 7-membered ring; wherein one of Ra or Rb optionally may be taken together with R2 to form a 5- to 7-membered ring; and when X is O, Ra and Rb are absent.

    Coating composition for photoresist underlayer
    6.
    发明授权
    Coating composition for photoresist underlayer 有权

    公开(公告)号：US11762294B2

    公开(公告)日：2023-09-19

    申请号：US17007877

    申请日：2020-08-31

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  Suzanne M. Coley ,  Iou-Sheng Ke

    IPC: G03F7/11 ,  G03F7/09

    CPC classification number: G03F7/11 ,  G03F7/091 ,  G03F7/094

    Abstract: A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1):




    wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; R1 is hydrogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl; and R2 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl, wherein R1 and R2 can be optionally taken together to form a ring.

    COATING COMPOSITION FOR PHOTORESIST UNDERLAYER
    8.
    发明申请
    COATING COMPOSITION FOR PHOTORESIST UNDERLAYER 有权

    公开(公告)号：US20220066320A1

    公开(公告)日：2022-03-03

    申请号：US17007877

    申请日：2020-08-31

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  Suzanne M. Coley ,  Iou-Sheng Ke

    IPC: G03F7/11 ,  G03F7/09

    Abstract: A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; R1 is hydrogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C1-30 heteroarylalkyl; and R2 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl, wherein R1 and R2 can be optionally taken together to form a ring.

    POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
    9.
    发明申请
    POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS 审中-公开

    公开(公告)号：US20200377713A1

    公开(公告)日：2020-12-03

    申请号：US16885628

    申请日：2020-05-28

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Joshua Kaitz ,  Xisen Hou ,  Mingqi Li ,  Tomas Marangoni ,  Emad Aqad ,  Yang Song

    IPC: C08L33/24 ,  G03F7/004 ,  G03F7/20 ,  C08L33/06 ,  C08L33/14

    Abstract: Disclosed herein is a polymer comprising a first repeat unit and a second repeat unit, where the first repeat unit contains an acid labile group and where the second repeat unit has the structure of formula (1): wherein R1, R2 and R3 are each independently hydrogen, a halogen, a substituted or unsubstituted C1 to C12 alkyl group or C3 to C12 cycloalkyl group optionally containing an ether group, a carbonyl group, an ester group, a carbonate group, an amine group, an amide group, a urea group, a sulfate group, a sulfone group, a sulfoxide group, an N-oxide group, a sulfonate group, a sulfonamide group, or a combination thereof, a substituted or unsubstituted C6 to C14 aryl group, or C3 to C12 heteroaryl group, wherein the substitution is halogen, hydroxyl, cyano, nitro, C1 to C12 alkyl group, C1 to C12 haloalkyl group, C1 to C12 alkoxy group, C3 to C12 cycloalkyl group, amino, C2-C6 alkanoyl, carboxamido, a substituted or unsubstituted C6 to C14 aryl group, or C3 to C12 heteroaryl group; wherein R1 and R2 together optionally form a ring; and wherein n=1-3.

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