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    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS
    6.
    发明申请
    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS 审中-公开
    用于氧化固化的光固化胺基

    公开(公告)号：US20110190412A1

    公开(公告)日：2011-08-04

    申请号：US12812795

    申请日：2009-01-06

    申请人： Katia Studer ,  Kurt Dietliker ,  Tunja Jung

    发明人： Katia Studer ,  Kurt Dietliker ,  Tunja Jung

    IPC分类号： C08J3/28 ,  C08F222/22 ,  C08F122/10 ,  C08F122/22

    CPC分类号： C08F2/50 ,  G03F7/031

    摘要： The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.

    摘要翻译： 本发明涉及用于自由基可固化制剂的氧化还原固化的照相脒基，即包含（a1）光引发脒基的组合物; 或（a2）光致胺基; 或（a3）（a1）和（a2）的混合物; 和（b）自由基聚合性化合物; 和（c）能够被胺和/或脒，特别是过氧化物还原的自由基引发剂。

    METHOD OF BONDING
    7.
    发明申请
    METHOD OF BONDING 审中-公开
    结合方法

    公开(公告)号：US20100236707A1

    公开(公告)日：2010-09-23

    申请号：US12399146

    申请日：2007-07-09

    申请人： Katia Studer ,  Tunja Jung ,  Kurt Dietliker

    发明人： Katia Studer ,  Tunja Jung ,  Kurt Dietliker

    IPC分类号： B29C65/14 ,  C07C221/00

    CPC分类号： C08G18/3876 ,  C08G18/10 ,  C08G18/1841 ,  C08G18/2063 ,  C09J5/00 ,  C09J175/04 ,  C09J2475/00 ,  C08G18/40 ,  C08G18/6618

    摘要： The invention relates to a first method of bonding a first substrate to a second substrate, comprising the steps of a) applying an UV-curable adhesive resin composition comprising a photolatent base to at least one transparent surface of at least one of said first and second substrates, b) bringing said first and second substrates together with said adhesive composition there between, c) exposing said adhesive composition to actinic radiation to effect curing or alternatively to a second method of bonding a first substrate to a second substrate, comprising the steps of a) applying a UV-curable adhesive resin composition comprising a photolatent base to one surface, b) exposing said adhesive composition to actinic radiation to effect curing, c) bringing said first and second substrates together with said adhesive composition there between.

    摘要翻译： 本发明涉及将第一衬底粘合到第二衬底的第一种方法，包括以下步骤：a）将包含光致变色基底的UV可固化粘合剂树脂组合物施加到所述第一和第二衬底中的至少一个的至少一个透明表面上 衬底，b）将所述第一和第二衬底与其间的所述粘合剂组合物一起，c）将所述粘合剂组合物暴露于光化辐射以实现固化，或者替代地将第一衬底结合到第二衬底的第二种方法，包括以下步骤： a）将包含光致变色基底的UV可固化粘合剂树脂组合物施加到一个表面上，b）将所述粘合剂组合物暴露于光化辐射以进行固化，c）将所述第一和第二基底与其间的所述粘合剂组合物一起使用。

    PHOTOACTIVABLE NITROGEN BASES
    8.
    发明申请
    PHOTOACTIVABLE NITROGEN BASES 有权
    可摄氮

    公开(公告)号：US20100105794A1

    公开(公告)日：2010-04-29

    申请号：US12532840

    申请日：2008-03-25

    申请人： Kurt Dietliker ,  Katharina Misteli ,  Katia Studer ,  Tunja Jung ,  Lothar Alexander Engelbrecht

    发明人： Kurt Dietliker ,  Katharina Misteli ,  Katia Studer ,  Tunja Jung ,  Lothar Alexander Engelbrecht

    IPC分类号： C08F2/50 ,  C08K5/3462

    CPC分类号： G03F7/0382 ,  C07D487/04 ,  C08F2/50 ,  G03F7/0045

    摘要： Compounds of the Formula (I), (II) and (III) wherein Ar is for example phenylene, biphenylene or naphthylene, all of which are unsubstituted or substituted by C1-C4-alkyl, C2-C4-alkenyl, CN, OR11, SR11, CH2OR11, COOR12, CONR12R13 or halogen; R1, R2, R7 and R8 independently of one another other are hydrogen or C1-C6-alkyl; R3 and R5 together and R4 and R6 together form a C2-C6-alkylene bridge which is unsubstituted or substituted by one or more C1-C4-alkyl; R11 is hydrogen or C1-C6-alkyl; R12 and R13 independently of one another for example are hydrogen, phenyl, C1-C18-alkyl, C1-C18-alkyl which is interrupted by one or more O; n is 1-10; X is O, S or NR10; A and A1 are suitable linking groups; are suitable as photolatent bases.

    摘要翻译： 其中Ar为例如亚苯基，亚联苯基或亚萘基的式（I），（II）和（III）的化合物，其全部未被取代或被C 1 -C 4 - 烷基，C 2 -C 4 - 烯基，CN，OR 11， SR11，CH2OR11，COOR12，CONR12R13或卤素; R 1，R 2，R 7和R 8彼此独立地是氢或C 1 -C 6 - 烷基; R3和R5一起以及R4和R6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 6亚烷基桥; R11是氢或C1-C6-烷基; R 12和R 13彼此独立地例如是氢，苯基，C 1 -C 18 - 烷基，被一个或多个O中断的C 1 -C 18 - 烷基; n为1-10; X是O，S或NR10; A和A1是适合的连接基团; 适合作为照相底座。