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公开(公告)号：US09567671B2
公开(公告)日：2017-02-14
申请号：US14237577
申请日：2012-07-30
申请人： Raymond Jacobus Wilhelmus Knaapen , Ruud Olieslagers , Dennis Van Den Berg , Matijs C. Van Den Boer , Diederik Jan Maas , Jacques Cor Johan Van Der Donck , Freddy Roozeboom
发明人： Raymond Jacobus Wilhelmus Knaapen , Ruud Olieslagers , Dennis Van Den Berg , Matijs C. Van Den Boer , Diederik Jan Maas , Jacques Cor Johan Van Der Donck , Freddy Roozeboom
IPC分类号： C23C16/455 , C23C16/44 , C23C16/458 , C23C16/52 , C23C16/54
CPC分类号： C23C16/45589 , C23C16/4401 , C23C16/4409 , C23C16/45517 , C23C16/45525 , C23C16/45536 , C23C16/45551 , C23C16/45578 , C23C16/45587 , C23C16/4586 , C23C16/4588 , C23C16/52 , C23C16/545
摘要： Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum. The method further comprises switching between supplying the precursor gas from the precursor-gas supply towards the substrate over a first part of the rotation trajectory; and interrupting supplying the precursor gas from the precursor-gas supply over a second part of the rotation trajectory.
摘要翻译： 在基板上沉积原子层的方法。 该方法包括从可以是可旋转滚筒的一部分的沉积头的前体气体供应源供应前体气体。 前体气体从前体气体供应源朝向基底提供。 该方法还包括通过沿着衬底旋转沉积头来移动前体气体源，衬底又沿旋转鼓移动。 该方法还包括在旋转轨迹的第一部分上将来自前体气体供应的前体气体供给朝向基底的切换; 并且中断在旋转轨迹的第二部分上从前体气体供应源提供前体气体。
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公开(公告)号：US20150086715A1
公开(公告)日：2015-03-26
申请号：US14237577
申请日：2012-07-30
申请人： Raymond Jacobus Wilhelmus Knaapen , Ruud Olieslagers , Dennis Van Den Berg , Matijs C. Van Den Boer , Diederik Jan Maas , Jacques Cor Johan Van Der Donck , Freddy Roozeboom
发明人： Raymond Jacobus Wilhelmus Knaapen , Ruud Olieslagers , Dennis Van Den Berg , Matijs C. Van Den Boer , Diederik Jan Maas , Jacques Cor Johan Van Der Donck , Freddy Roozeboom
IPC分类号： C23C16/455 , C23C16/52
CPC分类号： C23C16/45589 , C23C16/4401 , C23C16/4409 , C23C16/45517 , C23C16/45525 , C23C16/45536 , C23C16/45551 , C23C16/45578 , C23C16/45587 , C23C16/4586 , C23C16/4588 , C23C16/52 , C23C16/545
摘要： Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum. The method further comprises switching between supplying the precursor gas from the precursor-gas supply towards the substrate over a first part of the rotation trajectory; and interrupting supplying the precursor gas from the precursor-gas supply over a second part of the rotation trajectory
摘要翻译： 在基板上沉积原子层的方法。 该方法包括从可以是可旋转滚筒的一部分的沉积头的前体气体供应源供应前体气体。 前体气体从前体气体供应源朝向基底提供。 该方法还包括通过沿着衬底旋转沉积头来移动前体气体源，衬底又沿旋转鼓移动。 该方法还包括在旋转轨迹的第一部分上将来自前体气体供应的前体气体供给朝向基底的切换; 并且中断在旋转轨迹的第二部分上从前体气体供应源提供前体气体
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公开(公告)号：US20120255161A1
公开(公告)日：2012-10-11
申请号：US13498582
申请日：2010-09-28
CPC分类号： H01L21/67144 , H01L2924/0002 , Y10T29/49002 , Y10T29/53096 , H01L2924/00
摘要： A place station for a pick-and-place machine, comprising: a place stage assembly comprising a place stage for supporting a substrate; a covering for providing a clean environment at the substrate, the covering comprising a first opening in a first face of the covering through which a placement operation may be performed to a limited area of the substrate; wherein the place stage and the covering are mounted for relative movement to allow the opening to achieve a selected relative position over the substrate.
摘要翻译： 一种用于拾取和放置机器的放置台，包括：放置台组件，其包括用于支撑衬底的放置台; 用于在基板上提供清洁环境的覆盖物，所述覆盖物包括在所述覆盖物的第一面中的第一开口，通过所述第一开口可以对所述基板的有限区域进行放置操作; 其中所述放置台和所述覆盖物安装成相对运动以允许所述开口在所述基板上实现选定的相对位置。
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公开(公告)号：US20090014030A1
公开(公告)日：2009-01-15
申请号：US11822695
申请日：2007-07-09
申请人： Anthonius Martinus Cornelis Petrus De Jong , Igor Petrus Maria Bouchoms , Richard Joseph Bruls , Hans Jansen , Martinus Hendrikus Antonius Leenders , Peter Franciscus Wanten , Marcus Theodoor Wilhelmus Van Der Heijden , Jacques Cor Johan Van Der Donck , Frederik Johannes Van Den Bogaard , Jan Groenewold , Sandra Van Der Graaf , Carmen Julia Zoldesi
发明人： Anthonius Martinus Cornelis Petrus De Jong , Igor Petrus Maria Bouchoms , Richard Joseph Bruls , Hans Jansen , Martinus Hendrikus Antonius Leenders , Peter Franciscus Wanten , Marcus Theodoor Wilhelmus Van Der Heijden , Jacques Cor Johan Van Der Donck , Frederik Johannes Van Den Bogaard , Jan Groenewold , Sandra Van Der Graaf , Carmen Julia Zoldesi
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70916
摘要： A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.
摘要翻译： 公开了一种从光刻中使用的设备中除去污染物的方法。 该方法包括将基底装载到装置中，基底包括刚性支撑层和设置在刚性支撑层上的可变形层，使得基底的可变形层与待除去污染的装置的表面接触 引入可变形层与设备表面之间的相对运动，从该表面去除污染物以从表面去除污染物以便去除，并除去脱落的污染物。 还描述和要求保护本发明的其它方面。
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公开(公告)号：US09158206B2
公开(公告)日：2015-10-13
申请号：US13032222
申请日：2011-02-22
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。
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6.发明申请公开(公告)号：US20090025753A1
公开(公告)日：2009-01-29
申请号：US11862873
申请日：2007-09-27
申请人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
CPC分类号： G03F7/70925 , G03F7/2041 , G03F7/70341
摘要： A lithographic apparatus is disclosed having an in situ ozonizer, which is used to produce ozone gas, for example, by UV irradiation of an oxygen-containing gas. The thus produced ozone is dissolved in ultra-pure water by contacting the ozone with the ultra-pure water through a permeable membrane.
摘要翻译： 公开了一种具有原位臭氧发生器的光刻设备，其用于产生臭氧气体，例如通过含氧气体的紫外线照射。 由此产生的臭氧通过渗透膜将臭氧与超纯水接触而溶解在超纯水中。
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公开(公告)号：US20110188013A1
公开(公告)日：2011-08-04
申请号：US13032222
申请日：2011-02-22
申请人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。
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公开(公告)号：US20100097587A1
公开(公告)日：2010-04-22
申请号：US12582214
申请日：2009-10-20
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Jacques Cor Johan Van Der Donck , Harrie Gorter , Johannes Hendrik Van Der Berg
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Jacques Cor Johan Van Der Donck , Harrie Gorter , Johannes Hendrik Van Der Berg
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70916
摘要： A lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt % water; from 1 to 74.99 wt % solvent selected from one or more glycol ethers, esters, alcohols and ketones; and from 0.01 to 5 wt % surfactant.
摘要翻译： 光刻设备包括被配置为向要清洁的表面提供清洁流体的流体供应系统。 清洗流体包括25至98.99重量％的水; 1至74.99重量％的溶剂，其选自一种或多种二醇醚，酯，醇和酮; 和0.01至5重量％的表面活性剂。
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9.发明授权公开(公告)号：US09289802B2
公开(公告)日：2016-03-22
申请号：US12314611
申请日：2008-12-12
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Josephus Cornelius Johannes Antonius Vugts , Jacques Cor Johan Van Der Donck , Teunis Cornelis Van Den Dool , Gerrit Oosterhuis
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Josephus Cornelius Johannes Antonius Vugts , Jacques Cor Johan Van Der Donck , Teunis Cornelis Van Den Dool , Gerrit Oosterhuis
CPC分类号： B08B3/02 , B08B5/02 , G03F7/70341 , G03F7/70925
摘要： A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.
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公开(公告)号：US20090027635A1
公开(公告)日：2009-01-29
申请号：US11862817
申请日：2007-09-27
申请人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。
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