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公开(公告)号:US07951524B2
公开(公告)日:2011-05-31
申请号:US12023108
申请日:2008-01-31
申请人: Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Trung , Gregory M. Wallraff
发明人: Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Trung , Gregory M. Wallraff
CPC分类号: G03F7/2041 , C08F220/22 , G03F7/0046 , G03F7/0397 , G03F7/11 , Y10S430/108 , Y10S430/111
摘要: Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
摘要翻译: 光刻胶添加剂聚合物和光致抗蚀剂制剂,可用于浸没式光刻,而不使用额外的面漆。 抗蚀剂组合物包括光致抗蚀剂聚合物,至少一种光致酸产生剂,溶剂; 和光致抗蚀剂添加剂聚合物。 还有一种使用包括光致抗蚀剂添加剂聚合物的光致抗蚀剂制剂的方法。
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公开(公告)号:US20080193879A1
公开(公告)日:2008-08-14
申请号:US12023108
申请日:2008-01-31
申请人: Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Truong , Gregory M. Wallraff
发明人: Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Truong , Gregory M. Wallraff
IPC分类号: C08F220/22 , G03F7/004 , G03F7/20
CPC分类号: G03F7/2041 , C08F220/22 , G03F7/0046 , G03F7/0397 , G03F7/11 , Y10S430/108 , Y10S430/111
摘要: Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
摘要翻译: 光刻胶添加剂聚合物和光致抗蚀剂制剂,可用于浸没式光刻,而不使用额外的面漆。 抗蚀剂组合物包括光致抗蚀剂聚合物,至少一种光致酸产生剂,溶剂; 和光致抗蚀剂添加剂聚合物。 还有一种使用包括光致抗蚀剂添加剂聚合物的光致抗蚀剂制剂的方法。
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