利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

26 条记录 (耗时 0.023 秒)

    Dehydroxylation and purification of calcium fluoride materials using a halogen containing plasma
    1.
    发明申请
    Dehydroxylation and purification of calcium fluoride materials using a halogen containing plasma 失效
    使用含卤素等离子体对氟化钙材料进行脱羟基化和纯化

    公开(公告)号：US20050263064A1

    公开(公告)日：2005-12-01

    申请号：US10856633

    申请日：2004-05-28

    申请人： Robert Bellman ,  Dana Bookbinder ,  Kishor Gadkaree ,  Cynthia Giroux

    发明人： Robert Bellman ,  Dana Bookbinder ,  Kishor Gadkaree ,  Cynthia Giroux

    IPC分类号： C01B9/08 ,  C01F11/22 ,  C30B1/00 ,  C30B9/00 ,  C30B11/00 ,  C30B17/00 ,  C30B28/06 ,  C30B29/12

    CPC分类号： C01B9/08 ,  C01F11/22 ,  C30B11/00 ,  C30B29/12

    摘要： The invention is directed to a process of purifying metal fluoride materials used to make metal fluoride single crystals suitable for making optical elements used in the transmission of wavelengths below 200 nm, and in particular to a process of purifying such materials by the use of a halogen containing plasma to convert metal oxygenates contaminating the feedstocks used in the preparation of the crystals to metal fluorides. The invention also is directed to a process of growing a metal fluoride single crystal using a crystal growth furnace to carry out the foregoing purification procedure followed by the steps of melting the purified material and cooling it using s selected time and temperature cycle to from a metal fluoride single crystal. The plasmas used in practicing the invention can be derived from a variety of halogenated materials including, for example, fluorocarbons, chlorocarbons, boron trihalides, chlorine, fluorine, xenon difluoride and other gaseous or easily volatilized halogenated substances known in the art.

    摘要翻译： 本发明涉及一种净化金属氟化物材料的方法，所述金属氟化物材料用于制备适于制造用于波长低于200nm的透射体的光学元件的金属氟化物单晶，并且特别涉及一种通过使用卤素 将等离子体转化成金属氧化物，将用于制备晶体的原料污染成金属氟化物。 本发明还涉及使用晶体生长炉生长金属氟化物单晶的方法，以执行上述纯化程序，然后是将精制材料熔化并使用选定的时间和温度循环冷却至金属 氟化物单晶。 用于实施本发明的等离子体可以衍生自各种卤化物质，包括例如碳氟化合物，氯代烃，三卤化硼，氯，氟，氙二氟化物以及本领域已知的其它气态或易挥发的卤化物质。

    Methods for producing low binding surfaces
    10.
    发明申请
    Methods for producing low binding surfaces 有权
    生产低粘结表面的方法

    公开(公告)号：US20070196910A1

    公开(公告)日：2007-08-23

    申请号：US11707851

    申请日：2007-02-16

    申请人： Dana Bookbinder ,  Edward Fewkes ,  James Griffin ,  Frances Smith ,  David Tennent

    发明人： Dana Bookbinder ,  Edward Fewkes ,  James Griffin ,  Frances Smith ,  David Tennent

    IPC分类号： C12M1/34

    CPC分类号： C07H21/00 ,  B01L3/50 ,  B01L3/5082 ,  B01L2200/12 ,  B01L2300/16 ,  B05D7/02 ,  C07B2200/11 ,  C08J7/047 ,  C08J7/065 ,  C08J2471/00 ,  C09D5/00 ,  G01N33/54393

    摘要： Hydrophobic polymer surfaces whose level of protein binding is less than about 50-80 ng/cm2 are achieved by: (1) applying a coating solution composed of a solvent and a non-ionic surfactant having a HLB number of less than 5 to the surface; and (2) drying the surface to remove the solvent and thereby bring the surfactant into direct contact with the hydrophobic polymer. The combination of a low HLB number and the drying step have been found to produce low binding surfaces which can withstand multiple washes with water and/or protein-containing solutions Alternatively, the low binding surfaces can be produced by applying the non-ionic surfactant to the mold surfaces which contact molten polymer and form the polymer into a desired shape, e.g., into a multi-well plate, a pipette tip, or the like. Further, the low binding surfaces may be produced by incorporating non-soluble, non-ionic surfactants having an HLB number of less than or equal to 10 into a polymer blend prior to molding the article.

    摘要翻译： 蛋白质结合水平小于约50-80ng / cm 2的疏水性聚合物表面通过以下方式实现：（1）施加由溶剂和具有HLB的非离子表面活性剂组成的涂布溶液 数量小于5的表面; 和（2）干燥表面以除去溶剂，从而使表面活性剂与疏水性聚合物直接接触。 已经发现低HLB值和干燥步骤的组合产生低结合表面，其可以经受水和/或蛋白质溶液的多次洗涤。或者，低结合表面可以通过将非离子表面活性剂施加到 接触熔融聚合物并将聚合物形成所需形状的模具表面，例如多孔板，移液管尖端等。 此外，低粘合表面可以通过将HLB数小于或等于10的非可溶性非离子表面活性剂在模制制品之前掺入聚合物共混物中来制备。