Integrated memory cube, structure and fabrication
    2.
    发明授权
    Integrated memory cube, structure and fabrication 失效
    集成存储立方体,结构和制造

    公开(公告)号:US5563086A

    公开(公告)日:1996-10-08

    申请号:US406284

    申请日:1995-03-17

    IPC分类号: G11C5/00 H01L25/065 H01L21/70

    摘要: An integrated memory cube structure and method of fabrication wherein stacked semiconductor memory chips are integrated by a controlling logic chip such that a more powerful memory architecture is defined with the functional appearance of a single, higher level memory chip. A memory/logic cube is formed having N memory chips and at least one logic chip, with each memory chip of the cube having M memory devices. The controlling logic chip coordinates external communication with the N memory chips such that a single memory chip architecture with N.times.M memory devices appears at the cube's I/O pins. A corresponding fabrication technique includes an approach for facilitating metallization patterning on the side surface of the memory subunit.

    摘要翻译: 一种集成的存储立方体结构和制造方法,其中堆叠的半导体存储器芯片由控制逻辑芯片集成,使得更强大的存储器架构被定义为单个更高级存储器芯片的功能外观。 形成具有N个存储器芯片和至少一个逻辑芯片的存储器/逻辑立方体,其中立方体的每个存储器芯片具有M个存储器件。 控制逻辑芯片协调与N个存储器芯片的外部通信,使得具有NxM存储器件的单个存储器芯片架构出现在立方体的I / O引脚处。 相应的制造技术包括用于在存储器子单元的侧表面上促进金属化图案化的方法。

    Stacked double dense read only memory
    3.
    发明授权
    Stacked double dense read only memory 失效
    堆叠双密度只读存储器

    公开(公告)号:US4603341A

    公开(公告)日:1986-07-29

    申请号:US530452

    申请日:1983-09-08

    摘要: A read only memory array of stacked IGFET devices composed of first and second sub-arrays of field effect transistors. The first sub-array of first field effect transistors is formed in a substrate. Each of the first field effect transistor devices is responsive to a polysilicon gate electrode. The second sub-array of second field effect transistors is formed in a layer of laser annealed polysilicon material which overlies the first sub-array. The gate electrodes of the first field effect transistors act as the gate electrodes of the second field effect transistors.

    摘要翻译: 由场效应晶体管的第一和第二子阵列组成的堆叠IGFET器件的只读存储器阵列。 第一场效应晶体管的第一子阵列形成在衬底中。 第一场效应晶体管器件中的每一个都响应于多晶硅栅电极。 第二场效应晶体管的第二子阵列形成在覆盖在第一子阵列上的激光退火多晶硅材料层中。 第一场效应晶体管的栅电极用作第二场效应晶体管的栅电极。

    Method or forming self-aligned halo-isolated wells
    4.
    发明授权
    Method or forming self-aligned halo-isolated wells 失效
    方法或形成自对准的卤素隔离井

    公开(公告)号:US5972745A

    公开(公告)日:1999-10-26

    申请号:US866674

    申请日:1997-05-30

    摘要: A method of forming a self-aligned halo-isolated well with a single mask is disclosed. First, a layer of resist is disposed over at least a portion of a substrate's surface. Then, an impurity of a first polarity type is implanted at an angle into the substrate through a gap in the layer of resist, thus forming a well having the impurity of the first polarity, which extends beneath the layer of resist. An impurity of a second polarity type is also implanted, using the same mask as previously used. The second implantation forms a well of the impurity of the second polarity disposed within the well of to impurity of the first polarity.

    摘要翻译: 公开了一种用单一掩模形成自对准卤素隔离井的方法。 首先,将抗蚀剂层设置在衬底表面的至少一部分上。 然后,第一极性类型的杂质通过抗蚀剂层中的间隙以一定角度注入到衬底中,从而形成具有在抗蚀剂层下方延伸的具有第一极性杂质的阱。 使用与以前使用的相同的掩模也植入第二极性类型的杂质。 第二次注入形成设置在第一极性杂质的阱内的第二极性杂质的阱。

    Integrated memory cube structure
    7.
    发明授权
    Integrated memory cube structure 失效
    集成内存立方体结构

    公开(公告)号:US5561622A

    公开(公告)日:1996-10-01

    申请号:US120993

    申请日:1993-09-13

    摘要: An integrated memory cube structure and method of fabrication wherein stacked semiconductor memory chips are integrated by a controlling logic chip such that a more powerful memory architecture is defined with the functional appearance of a single, higher level memory chip. A memory/logic cube is formed having N memory chips and at least one logic chip, with each memory chip of the cube having M memory devices. The controlling logic chip coordinates external communication with the N memory chips such that a single memory chip architecture with N.times.M memory devices appears at the cube's I/O pins. A corresponding fabrication technique includes an approach for facilitating metallization patterning on the side surface of the memory subunit.

    摘要翻译: 一种集成的存储立方体结构和制造方法,其中堆叠的半导体存储器芯片由控制逻辑芯片集成,使得更强大的存储器架构被定义为单个更高级存储器芯片的功能外观。 形成具有N个存储器芯片和至少一个逻辑芯片的存储器/逻辑立方体,其中立方体的每个存储器芯片具有M个存储器件。 控制逻辑芯片协调与N个存储器芯片的外部通信,使得具有NxM存储器件的单个存储器芯片架构出现在立方体的I / O引脚处。 相应的制造技术包括用于在存储器子单元的侧表面上促进金属化图案化的方法。

    Power up detection circuits
    8.
    发明授权
    Power up detection circuits 失效
    上电检测电路

    公开(公告)号:US5463335A

    公开(公告)日:1995-10-31

    申请号:US969594

    申请日:1992-10-30

    IPC分类号: H01L27/00 H03K17/22

    CPC分类号: H03K17/223

    摘要: A power up detection circuit is provided which includes a power supply terminal, an output terminal, an impedance device coupling the output terminal to the power supply terminal and a latch including a first inverter having a first device connected between the output terminal and a point of reference potential and a second device connected between the output terminal and the power supply terminal, the devices are designed so that subthreshold current passing through the first device is greater than the effective subthreshold current passing through the impedance device and the second device, and a second inverter including third and fourth devices which are designed so that a smaller subthreshold current passes through the third device than the subthreshold current passing through the fourth device. The power up circuit may further include a capacitor connected between the power supply terminal and gate electrodes of the first and second devices.

    摘要翻译: 提供了一种上电检测电路,其包括电源端子,输出端子,将输出端子耦合到电源端子的阻抗装置和包括第一反相器的锁存器,第一反相器具有连接在输出端子与点 参考电位和连接在输出端子和电源端子之间的第二器件,器件被设计成使得通过第一器件的亚阈值电流大于通过阻抗器件和第二器件的有效亚阈值电流,并且第二器件 逆变器包括第三和第四器件,其被设计为使得比通过第四器件的亚阈值电流更小的亚阈值电流通过第三器件。 上电电路还可以包括连接在第一和第二器件的电源端子和栅电极之间的电容器。

    Flexible/compressed array macro design
    10.
    发明授权
    Flexible/compressed array macro design 失效
    灵活/压缩阵列宏设计

    公开(公告)号:US4566022A

    公开(公告)日:1986-01-21

    申请号:US461421

    申请日:1983-01-27

    CPC分类号: H01L27/112

    摘要: A transistor array arrangement for providing high-density semiconductor logic circuits in double polysilicon technology is described. Semiconductor, for example, FET, logic circuits have four independent but simultaneously accessible FET devices which are formed by intersecting sets of polysilicon gate lines. The four FET devices share a common first diffusion, for example a source, surrounded by four logically independent second diffusions, for example drains. A three-bit decode device is made which includes this array design.

    摘要翻译: 描述了用于在双晶体技术中提供高密度半导体逻辑电路的晶体管阵列布置。 半导体,例如FET,逻辑电路具有四个独立但可同时访问的FET器件,它们由多个多晶硅栅极线的相交组合形成。 四个FET器件共享共同的第一扩散,例如由四个逻辑上独立的第二扩散(例如漏极)包围的源。 制作了一个包含这种阵列设计的三位解码器。