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    Top imaged resists
    4.
    发明授权
    Top imaged resists 失效
    顶级成像抗皱剂

    公开(公告)号：US4810601A

    公开(公告)日：1989-03-07

    申请号：US880212

    申请日：1986-06-30

    申请人： Robert D. Allen ,  Kaolin N. Chiong ,  Ming-Fea Chow ,  Scott A. MacDonald ,  Jer-Ming Yang ,  Carlton G. Willson

    发明人： Robert D. Allen ,  Kaolin N. Chiong ,  Ming-Fea Chow ,  Scott A. MacDonald ,  Jer-Ming Yang ,  Carlton G. Willson

    IPC分类号： H01L21/027 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03C3/00 ,  B05D3/06 ,  G03C5/00

    CPC分类号： G03F7/265 ,  G03F7/038 ,  G03F7/2022 ,  Y10S430/143 ,  Y10S430/167 ,  Y10S430/168

    摘要： The present invention is concerned with methods of converting a single resist layer into a multilayered resist.The upper portion of the single resist layer can be converted into a dry-etch resistant form. The conversion can be a blanket conversion of the upper portion of the resist layer or can be a patterned conversion of areas within the upper portion of the layer. A patternwise-converted resist can be oxygen plasma developed.The upper portion of the single resist layer can be patternwise converted into a chemically different composition or structure having altered absorptivity toward radiation. The difference in radiation absorptivity within the patterned upper portion of the resist enables subsequent use of blanket irradiation of the resist surface to create differences in chemical solubility between areas having the altered absorptivity toward radiation and non-altered areas. The difference in chemical solubility enables wet development of the patterned resist.

    摘要翻译： 本发明涉及将单个抗蚀剂层转化为多层抗蚀剂的方法。 单个抗蚀剂层的上部可以转化成耐干蚀刻形式。 该转换可以是抗蚀剂层的上部的覆盖转化，或者可以是层的上部内的区域的图案化转换。 图案转换的抗蚀剂可以是氧等离子体显影。 单个抗蚀剂层的上部可以被图案化地转换成具有改变的对辐射的吸收率的化学上不同的组成或结构。 在图案化的抗蚀剂上部中的辐射吸收率的差异使得随后可以使用抗蚀剂表面的毯式照射，从而在对辐射和未改变的区域具有改变的吸收率的区域之间产生化学溶解度的差异。 化学溶解度的差异使得图案化抗蚀剂的湿显影。

    Systems and methods for downhole power factor correction
    5.
    发明授权
    Systems and methods for downhole power factor correction 有权
    井下功率因数校正的系统和方法

    公开(公告)号：US08937448B2

    公开(公告)日：2015-01-20

    申请号：US13300900

    申请日：2011-11-21

    申请人： Robert D. Allen ,  William J. Carter ,  Dustin B. Campbell ,  John M. Knapp

    发明人： Robert D. Allen ,  William J. Carter ,  Dustin B. Campbell ,  John M. Knapp

    IPC分类号： G05F1/70 ,  E21B43/12 ,  H02P23/00

    CPC分类号： E21B43/128 ,  H02P23/26 ,  Y02P80/112

    摘要： Systems and methods for processing power provided to downhole electrical systems such as electric submersible pump motors to increase the power factor of the supplied power. In one embodiment, a system comprises a downhole motor and a power factor corrector. The motor may be coupled to drive an electric submersible pump. The power factor corrector is configured to receive input power, process the received input power using one or more capacitive electrical components and thereby impart a capacitive phase shift between the voltage and the current of the received input power. The processed output power is provided to the downhole motor, which consumes the processed output power with a power factor which is greater than it would have been in the absence of the correction.

    摘要翻译： 用于处理提供给井下电气系统的电力的系统和方法，例如电潜泵泵马达，以增加供电功率的因数。 在一个实施例中，系统包括井下电动机和功率因数校正器。 马达可以联接以驱动电潜泵。 功率因数校正器被配置为接收输入功率，使用一个或多个电容性电气部件处理所接收的输入功率，从而在所接收的输入功率的电压和电流之间施加电容相移。 处理的输出功率被提供给井下电动机，其以比在没有校正的情况下更大的功率因数来消耗处理的输出功率。

    PLANARIZATION OVER TOPOGRAPHY WITH MOLECULAR GLASS MATERIALS
    8.
    发明申请
    PLANARIZATION OVER TOPOGRAPHY WITH MOLECULAR GLASS MATERIALS 失效
    分子结构与分子玻璃材料的平面化

    公开(公告)号：US20110079579A1

    公开(公告)日：2011-04-07

    申请号：US12574171

    申请日：2009-10-06

    申请人： Robert D. Allen ,  Mark W. Hart ,  Ratnam Sooriyakumaran

    发明人： Robert D. Allen ,  Mark W. Hart ,  Ratnam Sooriyakumaran

    IPC分类号： B44C1/22 ,  B29C39/12 ,  C09D4/00

    CPC分类号： G03F7/0752 ,  C09D7/63 ,  G03F7/094

    摘要： Molecular glass based planarizing compositions for lithographic processing are disclosed. The processes generally include casting the planarizing composition onto a surface comprised of lithographic features, the planarizing composition comprising at least one molecular glass and at least one solvent; and heating the planarizing composition to a temperature greater than a glass transition temperature of the at least one molecular glass. Exemplary molecular glasses include polyhedral oligomeric silsesquioxane derivatives, calixarenes, cyclodextrin derivatives, and other non-polymeric large molecules.

    摘要翻译： 公开了用于光刻处理的基于分子玻璃的平面化组合物。 所述方法通常包括将平坦化组合物浇铸到由光刻特征组成的表面上，平坦化组合物包含至少一种分子玻璃和至少一种溶剂; 并且将所述平坦化组合物加热至大于所述至少一种分子玻璃的玻璃化转变温度的温度。 示例性分子玻璃包括多面体低聚倍半硅氧烷衍生物，杯芳烃，环糊精衍生物和其它非聚合大分子。