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公开(公告)号：US08440387B2
公开(公告)日：2013-05-14
申请号：US12687380
申请日：2010-01-14
CPC分类号： G03F7/2041 , G03F7/11 , Y10S438/952
摘要： A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
摘要翻译： 用于浸渍光刻的面漆材料和使用面漆材料进行浸渍光刻的方法。 面漆材料包括第一聚合物和第二聚合物的混合物。 面涂层材料的第一和第二聚合物当面涂层材料形成浸渍流体和光致抗蚀剂层之间的顶涂层时，不均匀地分散在整个顶涂层中。
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公开(公告)号：US20100168337A1
公开(公告)日：2010-07-01
申请号：US12687380
申请日：2010-01-14
IPC分类号： C08L27/12
CPC分类号： G03F7/2041 , G03F7/11 , Y10S438/952
摘要： A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
摘要翻译： 用于浸渍光刻的面漆材料和使用面漆材料进行浸渍光刻的方法。 面漆材料包括第一聚合物和第二聚合物的混合物。 面涂层材料的第一和第二聚合物当面涂层材料形成浸渍流体和光致抗蚀剂层之间的顶涂层时，不均匀地分散在整个顶涂层中。
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公开(公告)号：US07678537B2
公开(公告)日：2010-03-16
申请号：US12058893
申请日：2008-03-31
CPC分类号： G03F7/2041 , G03F7/11 , Y10S438/952
摘要： A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
摘要翻译： 用于浸渍光刻的面漆材料和使用面漆材料进行浸渍光刻的方法。 面漆材料包括第一聚合物和第二聚合物的混合物。 面涂层材料的第一和第二聚合物当面涂层材料形成浸渍流体和光致抗蚀剂层之间的顶涂层时，不均匀地分散在整个顶涂层中。
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公开(公告)号：US20080311530A1
公开(公告)日：2008-12-18
申请号：US11763705
申请日：2007-06-15
CPC分类号： G03F7/2041 , G03F7/11 , Y10S438/952
摘要： A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
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公开(公告)号：US20080311506A1
公开(公告)日：2008-12-18
申请号：US12058893
申请日：2008-03-31
CPC分类号： G03F7/2041 , G03F7/11 , Y10S438/952
摘要： A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
摘要翻译： 用于浸渍光刻的面漆材料和使用面漆材料进行浸渍光刻的方法。 面漆材料包括第一聚合物和第二聚合物的混合物。 面涂层材料的第一和第二聚合物当面涂层材料形成浸渍流体和光致抗蚀剂层之间的顶涂层时，不均匀地分散在整个顶涂层中。
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公开(公告)号：US20080193879A1
公开(公告)日：2008-08-14
申请号：US12023108
申请日：2008-01-31
申请人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Truong , Gregory M. Wallraff
发明人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Truong , Gregory M. Wallraff
IPC分类号： C08F220/22 , G03F7/004 , G03F7/20
CPC分类号： G03F7/2041 , C08F220/22 , G03F7/0046 , G03F7/0397 , G03F7/11 , Y10S430/108 , Y10S430/111
摘要： Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
摘要翻译： 光刻胶添加剂聚合物和光致抗蚀剂制剂，可用于浸没式光刻，而不使用额外的面漆。 抗蚀剂组合物包括光致抗蚀剂聚合物，至少一种光致酸产生剂，溶剂; 和光致抗蚀剂添加剂聚合物。 还有一种使用包括光致抗蚀剂添加剂聚合物的光致抗蚀剂制剂的方法。
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公开(公告)号：US07951524B2
公开(公告)日：2011-05-31
申请号：US12023108
申请日：2008-01-31
申请人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Trung , Gregory M. Wallraff
发明人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Trung , Gregory M. Wallraff
CPC分类号： G03F7/2041 , C08F220/22 , G03F7/0046 , G03F7/0397 , G03F7/11 , Y10S430/108 , Y10S430/111
摘要： Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
摘要翻译： 光刻胶添加剂聚合物和光致抗蚀剂制剂，可用于浸没式光刻，而不使用额外的面漆。 抗蚀剂组合物包括光致抗蚀剂聚合物，至少一种光致酸产生剂，溶剂; 和光致抗蚀剂添加剂聚合物。 还有一种使用包括光致抗蚀剂添加剂聚合物的光致抗蚀剂制剂的方法。
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公开(公告)号：US07993812B2
公开(公告)日：2011-08-09
申请号：US12507968
申请日：2009-07-23
发明人： Luisa D. Bozano , Hiroshi Ito , Linda K. Sundberg
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106
摘要： Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a photoacid generator; and a solvent, and wherein the blend and the photoacid generator are soluble in the solvent. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
摘要翻译： 光致抗蚀剂组合物包括至少一种完全保护的杯[4]间苯二酚和至少一种未保护的杯[4]间苯二酚的共混物，其中完全保护的杯[4]间苯二酚具有用酸不稳定保护基保护的酚基; 光致酸发生器; 和溶剂，并且其中所述共混物和光致酸产生剂可溶于溶剂中。 还公开了使用光致抗蚀剂组合物在衬底上产生抗蚀剂图像的方法。
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9.发明授权公开(公告)号：US08530136B2
公开(公告)日：2013-09-10
申请号：US12971292
申请日：2010-12-17
申请人： Luisa D. Bozano , Gregory Breyta , Ekmini A. DeSilva , William D. Hinsberg , Ratnam Sooriyakumaran , Linda K. Sundberg
发明人： Luisa D. Bozano , Gregory Breyta , Ekmini A. DeSilva , William D. Hinsberg , Ratnam Sooriyakumaran , Linda K. Sundberg
CPC分类号： G03F7/0046 , C07C39/42 , C07C69/96 , C07C2603/92 , G03F7/0382 , G03F7/0392
摘要： Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
摘要翻译： 酚醛分子玻璃如杯芳烃包括至少一种含氟代醇单元。 含氟代醇的分子玻璃可用于光致抗蚀剂组合物中。 还公开了使用光致抗蚀剂组合物在衬底上产生抗蚀剂图像的方法。
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10.发明申请Fluoroalcohol Containing Molecular Photoresist Materials and Processes of Use 失效含有分子光致抗蚀剂的氟化物材料及其使用方法公开(公告)号：US20120156611A1
公开(公告)日：2012-06-21
申请号：US12971292
申请日：2010-12-17
申请人： Luisa D. Bozano , Gregory Breyta , Ekmini A. DeSilva , William D. Hinsberg , Ratnam Sooriyakumaran , Linda K. Sundberg
发明人： Luisa D. Bozano , Gregory Breyta , Ekmini A. DeSilva , William D. Hinsberg , Ratnam Sooriyakumaran , Linda K. Sundberg
CPC分类号： G03F7/0046 , C07C39/42 , C07C69/96 , C07C2603/92 , G03F7/0382 , G03F7/0392
摘要： Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
摘要翻译： 酚醛分子玻璃如杯芳烃包括至少一种含氟代醇单元。 含氟代醇的分子玻璃可用于光致抗蚀剂组合物中。 还公开了使用光致抗蚀剂组合物在衬底上产生抗蚀剂图像的方法。
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