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    Top imaged resists
    4.
    发明授权
    Top imaged resists 失效
    顶级成像抗皱剂

    公开(公告)号：US4810601A

    公开(公告)日：1989-03-07

    申请号：US880212

    申请日：1986-06-30

    申请人： Robert D. Allen ,  Kaolin N. Chiong ,  Ming-Fea Chow ,  Scott A. MacDonald ,  Jer-Ming Yang ,  Carlton G. Willson

    发明人： Robert D. Allen ,  Kaolin N. Chiong ,  Ming-Fea Chow ,  Scott A. MacDonald ,  Jer-Ming Yang ,  Carlton G. Willson

    IPC分类号： H01L21/027 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03C3/00 ,  B05D3/06 ,  G03C5/00

    CPC分类号： G03F7/265 ,  G03F7/038 ,  G03F7/2022 ,  Y10S430/143 ,  Y10S430/167 ,  Y10S430/168

    摘要： The present invention is concerned with methods of converting a single resist layer into a multilayered resist.The upper portion of the single resist layer can be converted into a dry-etch resistant form. The conversion can be a blanket conversion of the upper portion of the resist layer or can be a patterned conversion of areas within the upper portion of the layer. A patternwise-converted resist can be oxygen plasma developed.The upper portion of the single resist layer can be patternwise converted into a chemically different composition or structure having altered absorptivity toward radiation. The difference in radiation absorptivity within the patterned upper portion of the resist enables subsequent use of blanket irradiation of the resist surface to create differences in chemical solubility between areas having the altered absorptivity toward radiation and non-altered areas. The difference in chemical solubility enables wet development of the patterned resist.

    摘要翻译： 本发明涉及将单个抗蚀剂层转化为多层抗蚀剂的方法。 单个抗蚀剂层的上部可以转化成耐干蚀刻形式。 该转换可以是抗蚀剂层的上部的覆盖转化，或者可以是层的上部内的区域的图案化转换。 图案转换的抗蚀剂可以是氧等离子体显影。 单个抗蚀剂层的上部可以被图案化地转换成具有改变的对辐射的吸收率的化学上不同的组成或结构。 在图案化的抗蚀剂上部中的辐射吸收率的差异使得随后可以使用抗蚀剂表面的毯式照射，从而在对辐射和未改变的区域具有改变的吸收率的区域之间产生化学溶解度的差异。 化学溶解度的差异使得图案化抗蚀剂的湿显影。

    Composition for photo imaging
    8.
    发明授权
    Composition for photo imaging 失效
    摄影成像的组成

    公开(公告)号：US5264325A

    公开(公告)日：1993-11-23

    申请号：US918304

    申请日：1992-07-21

    申请人： Robert D. Allen ,  Richard A. Day ,  Donald H. Glatzel ,  William D. Hinsberg ,  John R. Mertz ,  David J. Russell ,  Gregory M. Wallraff

    发明人： Robert D. Allen ,  Richard A. Day ,  Donald H. Glatzel ,  William D. Hinsberg ,  John R. Mertz ,  David J. Russell ,  Gregory M. Wallraff

    IPC分类号： G03F7/038 ,  G03F7/20 ,  H05K3/00 ,  H05K3/28 ,  D04H1/08

    CPC分类号： G03F7/2053 ,  G03F7/0385 ,  H05K3/0082 ,  H05K3/287

    摘要： An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which preferably is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60.degree. C. and about 110.degree. C. and a molecular weight of between about 600 and 2,500. A third resin, either an epoxy cresol novolak or a polyepoxy resin, is also added to the resin system. To this resin system is added about 0.1 to about 15 parts by weight per 100 parts of resin of a cationic photoinitiator capable of initiating polymerization of said epoxidized resin system upon exposure to actinic radiation; the system being further characterized by having an absorbance of light in the 330 to 700 nm region of less than 0.1 for a 2.0 mil thick film. Optionally a photosensitizer such as perylene and its derivatives or anthracene and its derivatives may be added.

    摘要翻译： 提供了一种改进的可光成像的可阳离子聚合的环氧基涂料，其适用于各种基材。 该材料包括基本上由约10重量％至约80重量％的多元醇树脂组成的环氧树脂体系，多元醇树脂优选为分子量为约40,000至130,000的表氯醇和双酚A的缩合产物; 和约35重量％至72重量％的软化点为约60℃至约110℃，分子量为约600至2,500的溴化双酚A的环氧化缩水甘油醚。 树脂体系中还加入第三树脂，环氧甲酚酚醛清漆或聚环氧树脂。 向该树脂体系中添加约0.1〜约15重量份/ 100份阳离子光引发剂的树脂，其能够在暴露于光化辐射下引发所述环氧化树脂体系的聚合; 该系统的特征还在于，对于2.0密耳厚的膜，在330至700nm区域中的光的吸光度小于0.1。 任选地，可加入光敏剂如苝及其衍生物或蒽及其衍生物。

    Systems and methods for downhole power factor correction
    10.
    发明授权
    Systems and methods for downhole power factor correction 有权
    井下功率因数校正的系统和方法

    公开(公告)号：US08937448B2

    公开(公告)日：2015-01-20

    申请号：US13300900

    申请日：2011-11-21

    申请人： Robert D. Allen ,  William J. Carter ,  Dustin B. Campbell ,  John M. Knapp

    发明人： Robert D. Allen ,  William J. Carter ,  Dustin B. Campbell ,  John M. Knapp

    IPC分类号： G05F1/70 ,  E21B43/12 ,  H02P23/00

    CPC分类号： E21B43/128 ,  H02P23/26 ,  Y02P80/112

    摘要： Systems and methods for processing power provided to downhole electrical systems such as electric submersible pump motors to increase the power factor of the supplied power. In one embodiment, a system comprises a downhole motor and a power factor corrector. The motor may be coupled to drive an electric submersible pump. The power factor corrector is configured to receive input power, process the received input power using one or more capacitive electrical components and thereby impart a capacitive phase shift between the voltage and the current of the received input power. The processed output power is provided to the downhole motor, which consumes the processed output power with a power factor which is greater than it would have been in the absence of the correction.

    摘要翻译： 用于处理提供给井下电气系统的电力的系统和方法，例如电潜泵泵马达，以增加供电功率的因数。 在一个实施例中，系统包括井下电动机和功率因数校正器。 马达可以联接以驱动电潜泵。 功率因数校正器被配置为接收输入功率，使用一个或多个电容性电气部件处理所接收的输入功率，从而在所接收的输入功率的电压和电流之间施加电容相移。 处理的输出功率被提供给井下电动机，其以比在没有校正的情况下更大的功率因数来消耗处理的输出功率。