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公开(公告)号:US5055439A
公开(公告)日:1991-10-08
申请号:US458048
申请日:1989-12-27
申请人: Robert D. Allen , William D. Hinsberg, III. , Logan L. Simpson , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
发明人: Robert D. Allen , William D. Hinsberg, III. , Logan L. Simpson , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
IPC分类号: C08F8/00 , C08G59/00 , C08G59/18 , C08G59/68 , G03C1/675 , G03F7/004 , G03F7/031 , G03F7/039 , H01L21/027
CPC分类号: G03F7/031
摘要: A composition including an initiator which generates acid upon exposure to radiation in the presence of a sensitizer. The composition may be mixed with an acid sensitive polymer or prepolymer to make a visible light or laser imageable photoresist. The sensitizer has phenylethynyl and methoxy substituents which, when properly positioned, allow it to utilize all of the visible argon ion laser lines.