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公开(公告)号:US5272042A
公开(公告)日:1993-12-21
申请号:US761183
申请日:1991-09-17
申请人: Robert D. Allen , William R. Brunsvold , Burton J. Carpenter , William D. Hinsberg , Joseph LaTorre , Michael G. McMaster , Melvin W. Montgomery , Wayne M. Moreau , Logan L. Simpson , Robert J. Tweig , Gregory M. Wallraff
发明人: Robert D. Allen , William R. Brunsvold , Burton J. Carpenter , William D. Hinsberg , Joseph LaTorre , Michael G. McMaster , Melvin W. Montgomery , Wayne M. Moreau , Logan L. Simpson , Robert J. Tweig , Gregory M. Wallraff
CPC分类号: G03F7/039 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S430/127
摘要: Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.
摘要翻译: 公开了一种正性光致抗蚀剂。 光致抗蚀剂具有基本上水和碱不溶性的光不稳定聚合物作为其聚合物组分。 光致抗蚀剂还包括能够形成强酸的光酸产生剂。 该光酸产生剂可以是衍生自N-羟基酰胺或N-羟基酰亚胺的磺酸酯。 最后,光致抗蚀剂组合物包括适当的光敏剂。