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1.
公开(公告)号:US07563558B2
公开(公告)日:2009-07-21
申请号:US11924005
申请日:2007-10-25
申请人: Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
发明人: Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
IPC分类号: G03F7/00 , G03F7/004 , C08F214/18
CPC分类号: G03F7/0046 , C08F220/24 , C08F222/06 , C08F232/08 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
摘要翻译: 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含(1)具有极性官能团的第一单体; (2)第二单体; 和(3)赋予选自可交联官能团,耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关,而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物,其还可以包括光酸产生剂,交联剂,碱性化合物,溶剂,溶解促进剂,光碱产生剂,潜碱性化合物,表面活性剂,粘合促进剂和消泡剂。
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2.
公开(公告)号:US07300739B2
公开(公告)日:2007-11-27
申请号:US10449181
申请日:2003-05-29
申请人: Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
发明人: Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
CPC分类号: G03F7/0046 , C08F220/24 , C08F222/06 , C08F232/08 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
摘要翻译: 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含(1)具有极性官能团的第一单体; (2)第二单体; 和(3)赋予选自可交联官能团,耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关,而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物中,其还可以包括光酸产生剂,交联剂,碱性化合物,溶剂,溶解促进剂,光碱产生剂,潜碱性化合物,表面活性剂,粘合促进剂和消泡剂。
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3.
公开(公告)号:US20080233517A1
公开(公告)日:2008-09-25
申请号:US11924005
申请日:2007-10-25
申请人: Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
发明人: Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
IPC分类号: G03F7/004
CPC分类号: G03F7/0046 , C08F220/24 , C08F222/06 , C08F232/08 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
摘要翻译: 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含(1)具有极性官能团的第一单体; (2)第二单体; 和(3)赋予选自可交联官能团,耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关,而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物,其还可以包括光酸产生剂,交联剂,碱性化合物,溶剂,溶解促进剂,光碱产生剂,潜碱性化合物,表面活性剂,粘合促进剂和消泡剂。
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4.
公开(公告)号:US07393624B2
公开(公告)日:2008-07-01
申请号:US11820862
申请日:2007-06-20
申请人: Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
发明人: Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
IPC分类号: G03C1/00
CPC分类号: G03F7/0046 , C08F220/24 , C08F222/06 , C08F232/08 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
摘要翻译: 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含(1)具有极性官能团的第一单体; (2)第二单体; 和(3)赋予选自可交联官能团,耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关,而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物,其还可以包括光酸产生剂,交联剂,碱性化合物,溶剂,溶解促进剂,光碱产生剂,潜碱性化合物,表面活性剂,粘合促进剂和消泡剂。
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公开(公告)号:US07014980B2
公开(公告)日:2006-03-21
申请号:US10916934
申请日:2004-08-12
申请人: Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
发明人: Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
CPC分类号: C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108
摘要: A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl(CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.
摘要翻译: 提供了一种光致抗蚀剂组合物,其包括具有至少一个具有下式的丙烯酸酯或甲基丙烯酸酯单体的聚合物,其中R 1表示氢(H),1至20个碳的直链或支链烷基或 1至20个碳的半或全氟化直链或支链烷基; 其中R 2表示未取代的脂族基团或具有与取代的脂族基团的每个碳上连接的具有0或1个三氟甲基(CF 3 N 3)基团的取代的脂族基团,或 取代或未取代的芳基; 其中R 3表示氢(H),甲基(CH 3),三氟甲基(CF 3),二氟甲基(CHF 2) (CH 2 CO 2),或半或全氟化脂族链; 并且其中R 4表示三氟甲基(CF 3 S),二氟甲基(CH 2)2,氟甲基(CH 2 CH 2) )或半或全氟取代或未取代的脂族基团。 本文还提供了使用光致抗蚀剂组合物图案化衬底的方法。
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公开(公告)号:US06806026B2
公开(公告)日:2004-10-19
申请号:US10159635
申请日:2002-05-31
申请人: Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
发明人: Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
IPC分类号: G03F7039
CPC分类号: C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108
摘要: A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula: where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.
摘要翻译: 提供了一种光致抗蚀剂组合物,其包括具有至少一种具有下式的丙烯酸酯或甲基丙烯酸酯单体的聚合物:其中R 1表示氢(H),1-20个碳的直链或支链烷基,或半或全氟 1〜20个碳原子的直链或支链烷基; 并且其中R 2表示未取代的脂族基团或具有连接在取代的脂族基团的每个碳上的零个或一个三氟甲基(CF 3)基团的取代的脂族基团,或取代或未取代的芳族基团; 并且其中R 3表示氢(H),甲基(CH 3),三氟甲基(CF 3),二氟甲基(CHF 2),氟甲基(CH 2 F)或半或全氟化脂族链; 并且其中R 4表示三氟甲基(CF 3),二氟甲基(CHF 2),氟甲基(CH 2 F)或半或全氟取代或未取代的脂族基团。 本文还提供了使用光致抗蚀剂组合物图案化衬底的方法。
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公开(公告)号:US07135595B2
公开(公告)日:2006-11-14
申请号:US11330659
申请日:2006-01-12
申请人: Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
发明人: Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
IPC分类号: C08F118/00 , C08F18/20 , C08F120/22 , C07C69/62 , C07C69/52
CPC分类号: C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108
摘要: A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.
摘要翻译: 提供了一种光致抗蚀剂组合物,其包括具有至少一个具有下式的丙烯酸酯或甲基丙烯酸酯单体的聚合物,其中R 1表示氢(H),1至20个碳的直链或支链烷基或 1至20个碳的半或全氟化直链或支链烷基; 其中R 2表示未取代的脂族基团或具有与取代的脂族基团的每个碳上连接的具有0或1个三氟甲基(CF 3 N 3)基团的取代的脂族基团,或 取代或未取代的芳基; 其中R 3表示氢(H),甲基(CH 3),三氟甲基(CF 3),二氟甲基(CHF 2) (CH 2 CO 2),或半或全氟化脂族链; 并且其中R 4表示三氟甲基(CF 3 S),二氟甲基(CH 2)2,氟甲基(CH 2 CH 2) )或半或全氟取代或未取代的脂族基团。 本文还提供了使用光致抗蚀剂组合物图案化衬底的方法。
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公开(公告)号:US06927015B2
公开(公告)日:2005-08-09
申请号:US10920762
申请日:2004-08-18
申请人: Mahmoud M. Khojasteh , Timothy M. Hughes , Ranee W. Kwong , Pushkara Rao Varanasi , William R. Brunsvold , Margaret C. Lawson , Robert D. Allen , David R. Medeiros , Ratnam Sooriyakumaran , Phillip Brock
发明人: Mahmoud M. Khojasteh , Timothy M. Hughes , Ranee W. Kwong , Pushkara Rao Varanasi , William R. Brunsvold , Margaret C. Lawson , Robert D. Allen , David R. Medeiros , Ratnam Sooriyakumaran , Phillip Brock
IPC分类号: C08F30/08 , C08F32/00 , C08F230/08 , C08K5/41 , C08K5/54 , C08L43/04 , C08L45/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075 , G03F7/09 , G11B5/31 , H01L21/027 , G03F7/40 , G03F7/11
CPC分类号: G03F7/094 , G03F7/0045 , G03F7/0382 , G03F7/0395 , G03F7/0758 , G11B5/3163
摘要: Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslinker, or (B) a polymer containing: (i) saturated polycyclic moieties, and (ii) aromatic moieties for compositions requiring a separate crosslinker. The compositions provide outstanding optical, mechanical and etch selectivity properties. The compositions are especially useful in lithographic processes using radiation less than 200 nm in wavelength to configure underlying material layers.
摘要翻译: 适用于形成用于多层平版印刷工艺的平坦化底层的组合物的特征在于(A)含有(i)环醚部分,(ii)饱和多环部分和(iii)不需要单独交联剂的组合物的芳族部分的聚合物 ,或(B)含有:(i)饱和多环部分的聚合物,和(ii)需要单独交联剂的组合物的芳族部分。 该组合物提供优异的光学,机械和蚀刻选择性。 组合物在使用波长小于200nm的辐射的光刻工艺中特别有用,以配置下层材料层。
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公开(公告)号:US06730454B2
公开(公告)日:2004-05-04
申请号:US10124087
申请日:2002-04-16
申请人: Dirk Pfeiffer , Marie Angelopoulos , Katherina Babich , Phillip Brock , Wu-Song Huang , Arpan P. Mahorowala , David R. Medeiros , Ratnam Sooriyakumaran
发明人: Dirk Pfeiffer , Marie Angelopoulos , Katherina Babich , Phillip Brock , Wu-Song Huang , Arpan P. Mahorowala , David R. Medeiros , Ratnam Sooriyakumaran
IPC分类号: G03F700
CPC分类号: H01L21/0276 , G03F7/0045 , G03F7/0757 , G03F7/091 , Y10S430/151
摘要: Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantageously useful with shorter wavelength lithographic processes and/or have minimal residual acid content.
摘要翻译: 存在具有发色团部分和透明部分的含SiO聚合物的抗反射组合物是光刻工艺中有用的抗反射硬掩模组合物。 这些组合物提供突出的光学,机械和蚀刻选择性,同时适用于使用旋涂应用技术。 本发明的组合物有利地用于较短波长的光刻工艺和/或具有最小的残留酸含量。
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公开(公告)号:US06818381B2
公开(公告)日:2004-11-16
申请号:US10026184
申请日:2001-12-21
申请人: Mahmoud M. Khojasteh , Timothy M. Hughes , Ranee W. Kwong , Pushkara Rao Varanasi , William R. Brunsvold , Margaret C. Lawson , Robert D. Allen , David R. Medeiros , Ratnam Sooriyakumaran , Phillip Brock
发明人: Mahmoud M. Khojasteh , Timothy M. Hughes , Ranee W. Kwong , Pushkara Rao Varanasi , William R. Brunsvold , Margaret C. Lawson , Robert D. Allen , David R. Medeiros , Ratnam Sooriyakumaran , Phillip Brock
IPC分类号: G03F711
CPC分类号: G03F7/094 , G03F7/0045 , G03F7/0382 , G03F7/0395 , G03F7/0758 , G11B5/3163
摘要: Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslinker, or (B) a polymer containing: (i) saturated polycyclic moieties, and (ii) aromatic moieties for compositions requiring a separate crosslinker. The compositions provide outstanding optical, mechanical and etch selectivity properties. The compositions are especially useful in lithographic processes using radiation less than 200 nm in wavelength to configure underlying material layers.
摘要翻译: 适用于形成用于多层平版印刷工艺的平坦化底层的组合物的特征在于(A)含有(i)环醚部分,(ii)饱和多环部分和(iii)不需要单独交联剂的组合物的芳族部分的聚合物 ,或(B)含有:(i)饱和多环部分的聚合物,和(ii)需要单独交联剂的组合物的芳族部分。 该组合物提供优异的光学,机械和蚀刻选择性。 组合物在使用波长小于200nm的辐射的光刻工艺中特别有用,以配置下层材料层。
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