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公开(公告)号：US07910290B2
公开(公告)日：2011-03-22
申请号：US12128129
申请日：2008-05-28
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译： 使用面漆组合物形成图像的方法。 提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。
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公开(公告)号：US20090011377A1
公开(公告)日：2009-01-08
申请号：US12128129
申请日：2008-05-28
IPC分类号： G03F7/20
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译： 使用面漆组合物形成图像的方法。 提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。
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公开(公告)号：US07399581B2
公开(公告)日：2008-07-15
申请号：US11064871
申请日：2005-02-24
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译： 一种组合物，其包含式T m 3的功能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12和Q n M R1，R2，R3其中n等于8,10或12。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。
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4.发明授权公开(公告)号：US08034532B2
公开(公告)日：2011-10-11
申请号：US11380744
申请日：2006-04-28
申请人： Robert David Allen , Phillip Joe Brock , Carl E. Larson , Ratnam Sooriyakumaran , Linda Karin Sundberg , Hoa D Truong
发明人： Robert David Allen , Phillip Joe Brock , Carl E. Larson , Ratnam Sooriyakumaran , Linda Karin Sundberg , Hoa D Truong
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/0752 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.
摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含酸惰性化合物。 面漆材料还包括聚合物或低聚物或保持架结构，其与成像层混合可忽略，并且可溶于碱性显影液。 还公开了在基材上形成图案化材料层的方法和包含面漆材料的涂布基材。
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公开(公告)号：US07855045B2
公开(公告)日：2010-12-21
申请号：US11868320
申请日：2007-10-05
申请人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
发明人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000 /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。
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公开(公告)号：US07901868B2
公开(公告)日：2011-03-08
申请号：US12128171
申请日：2008-05-28
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译： 提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。
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公开(公告)号：US20080227028A1
公开(公告)日：2008-09-18
申请号：US12128171
申请日：2008-05-28
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译： 一种组合物，其包含式T m 3的功能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12和Q n M R1，R2，R3其中n等于8,10或12。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。
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公开(公告)号：US07288362B2
公开(公告)日：2007-10-30
申请号：US11063940
申请日：2005-02-23
申请人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
发明人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000 /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。
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9.发明授权Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials 失效基于多面体低聚倍半硅氧烷的压印材料和使用多面体低聚倍半硅氧烷的压印材料的压印工艺公开(公告)号：US08603584B2
公开(公告)日：2013-12-10
申请号：US13170221
申请日：2011-06-28
申请人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
发明人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
IPC分类号： B05D5/12 , B05D3/06 , H05K3/12 , C09D183/04
CPC分类号： B05D3/067 , C09D183/04 , C09D183/06 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/311 , H01L21/3122 , H01L21/31695 , H01L21/76807 , H01L21/76817 , H01L21/7682 , H01L2221/1047 , H05K3/1258
摘要： A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; andone or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.
摘要翻译： 通过压印基于倍半硅氧烷的可聚合组合物形成低介电对比度结构的方法。 所述印记组合物包括：一个或多个多面体倍半硅氧烷低聚物，其各自具有一个或多个可聚合基团，其中所述一个或多个可聚合基团中的每一个与所述一个或多个多面体倍半硅氧烷低聚物的不同硅原子结合; 和一种或多种可聚合稀释剂，所述稀释剂占组合物的至少50重量％。
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10.发明申请POLYMERIC FILMS MADE FROM POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) AND A HYDROPHILIC COMONOMER 有权聚偏氟乙烯（POSS）和亲水性聚合物制成的聚合物薄膜公开(公告)号：US20110120940A1
公开(公告)日：2011-05-26
申请号：US12624605
申请日：2009-11-24
CPC分类号： B01D69/12 , B01D69/125 , B01D71/70 , B01D71/82 , B01D2323/34 , B01D2325/20 , C08J7/18
摘要： A composite membrane includes a filtration membrane and a layer on a surface of the filtration membrane. The layer includes a polymer including a polyhedral oligomeric silsesquioxane (POSS) derivative with a hydrophilic moiety attached to at least one vertex thereof. A method for making a composite membrane includes applying to a surface of a filtration membrane a photopolymerizable composition including a POSS compound, a hydrophilic comonomer, and a photoinitiator. The composition is cured to form a hydrophilic layer on the filtration membrane.
摘要翻译： 复合膜包括过滤膜和过滤膜表面上的层。 该层包括聚合物，其包括具有连接到其至少一个顶点的亲水部分的多面体低聚倍半硅氧烷（POSS）衍生物。 制造复合膜的方法包括向过滤膜的表面施加包含POSS化合物，亲水性共聚单体和光引发剂的光聚合性组合物。 固化组合物以在过滤膜上形成亲水层。
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