Linear position indicator system and method
    1.
    发明申请
    Linear position indicator system and method 失效
    线性位置指示器系统及方法

    公开(公告)号:US20070186648A1

    公开(公告)日:2007-08-16

    申请号:US11525501

    申请日:2006-09-22

    IPC分类号: G01F23/56

    CPC分类号: G01F23/68 G01F23/72

    摘要: The present invention is directed to system and method for determining a fluid level. The system comprises a sensing rod assembly comprised of releasably connectable rod segments. Each rod segment carries a processor and a plurality of inductors. Each inductor generates a position signal responsive to a float signal. A float assembly comprises a housing containing a circuit having an integrally formed coil periodically energizable by a processor to emit the float signal. A control assembly receives the generated position signals and determines the fluid level. The method comprises providing releasably connectable rod segments with inductors that generate a position signal responsive to a float signal, determining a sensing rod assembly length, forming the sensing rod assembly, disposing it within a container, providing a float assembly periodically actuated to generate a float signal, generating position signals responsive to the float signal and analyzing those signals to determine the fluid level.

    摘要翻译: 本发明涉及用于确定流体液位的系统和方法。 该系统包括由可释放地连接的杆段组成的感测杆组件。 每个杆段承载处理器和多个电感器。 每个电感器响应于浮动信号产生位置信号。 浮子组件包括壳体,该外壳包含具有由处理器周期性激励的整体形成的线圈以发射浮动信号的电路。 控制组件接收所产生的位置信号并确定液位。 该方法包括提供具有电感器的可释放地连接的杆段,其产生响应于浮子信号的位置信号,确定感测杆组件长度,形成感测杆组件,将其设置在容器内,提供周期性致动以产生浮子的浮子组件 信号,响应于浮动信号产生位置信号并分析这些信号以确定流体水平。

    Wireless sensor analysis monitor
    2.
    发明申请
    Wireless sensor analysis monitor 审中-公开
    无线传感器分析监视器

    公开(公告)号:US20060238311A1

    公开(公告)日:2006-10-26

    申请号:US11255788

    申请日:2005-10-21

    IPC分类号: G09F25/00

    CPC分类号: G01H1/00 G01D9/005 G01D11/24

    摘要: A monitoring device adapted to monitor a condition includes a sensor that produces an output signal representative of the condition, a filter configured to at least partially operate on the output signal, a sampling arrangement adapted to sample the output signal at a predetermined frequency to thereby collect a plurality of samples, and an analysis arrangement adapted to at least partially analyze the plurality of samples to thereby produce data. The filter has a controllable knee the knee is related to the sample frequency.

    摘要翻译: 适于监测条件的监测装置包括产生代表条件的输出信号的传感器,被配置为至少部分地对输出信号进行操作的滤波器,适于以预定频率对输出信号进行采样从而收集 多个样本,以及适于至少部分地分析多个样本从而产生数据的分析装置。 滤波器具有可控的膝盖,膝盖与采样频率有关。

    Sensing diaphragm for a differential pressure sensor with over-pressure protection and methods
    3.
    发明申请
    Sensing diaphragm for a differential pressure sensor with over-pressure protection and methods 审中-公开
    用于具有过压保护和方法的差压传感器的感应隔膜

    公开(公告)号:US20050081638A1

    公开(公告)日:2005-04-21

    申请号:US10934327

    申请日:2004-09-03

    摘要: A differential pressure sensor includes a housing having first and second housing members. The first and second housing members define opposing sections of a pressure chamber. The differential pressure sensor also includes a multi-layer laminate forming a pressure sensing diaphragm. The diaphragm is positioned between the first and the second housing members such that it generally bisects the pressure chamber into first and second chamber sections such that a pressure differential between the chamber sections causes the diaphragm to deflect toward the chamber section having the lower pressure. The first and second housing members are positioned to provide an overpressure stop that limits deflection of the diaphragm beyond a predetermined deflection limit.

    摘要翻译: 差压传感器包括具有第一和第二壳体构件的壳体。 第一和第二壳体构件限定压力室的相对部分。 差压传感器还包括形成压力感测隔膜的多层层压体。 隔膜定位在第一和第二壳体构件之间,使得其通常将压力室平分成第一和第二室部分,使得腔室部分之间的压力差导致隔膜朝向具有较低压力的腔室部分偏转。 定位第一和第二壳体构件以提供限制隔膜超过预定偏转极限的偏转的超压停止。

    Multi-Pitch Scatterometry Targets
    5.
    发明申请
    Multi-Pitch Scatterometry Targets 有权
    多点散射测光目标

    公开(公告)号:US20100209830A1

    公开(公告)日:2010-08-19

    申请号:US12371193

    申请日:2009-02-13

    IPC分类号: G03F7/20

    摘要: The invention can provide a method of processing a substrate using multi-pitch scatterometry targets (M-PSTs) for de-convolving lithographic process parameters during Single-Patterning (S-P), Double-Patterning (D-P) procedures, and Double-Exposure (D-E) procedures.

    摘要翻译: 本发明可以提供一种使用多间距散射仪(M-PST)处理衬底的方法,用于在单图案化(SP),双图案化(DP)程序和双曝光(DE)期间去卷积光刻工艺参数 )程序。