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1.发明授权公开(公告)号：US06447375B2
公开(公告)日：2002-09-10
申请号：US09837506
申请日：2001-04-18
申请人： Paul J. Yancey , Robert L. Rhoades
发明人： Paul J. Yancey , Robert L. Rhoades
IPC分类号： B24B100
CPC分类号： B24B37/04 , B24B57/02 , Y10S977/888
摘要： A polishing method uses a dry particulate solids composition that is reconstituted into an aqueous composition for delivery to a polishing apparatus. In one aspect of the invention, the dry particulate solids composition is provided in a package size that is just substantially sufficient to make a reconstituted slurry for completing the polishing of a predetermined number of work pieces. The quantity of dry particulate solids delivered to a reconstitution apparatus can be an amount appropriate for polishing one work piece or a small number of work pieces, or the system can operate in larger batches or a continuous flow mode. The reconstituted aqueous polishing solution can be monitored for physical or chemical properties, filtered, blended with other chemical mixtures, or modified in other ways prior to being used in the polishing apparatus.
摘要翻译： 抛光方法使用干重的颗粒固体组合物，其被重构成水性组合物以输送到抛光装置。 在本发明的一个方面，干燥颗粒固体组合物以包装尺寸提供，该包装尺寸基本上足以制备用于完成预定数量工件的抛光的重构浆料。 输送到重构装置中的干燥颗粒固体的量可以是适合于抛光一个工件或少量工件的量，或者该系统可以较大批量或连续流动模式操作。 可以监测重构的水性抛光溶液的物理或化学性质，过滤，与其它化学混合物混合，或者在用于抛光装置之前以其它方式改性。
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公开(公告)号：US06572449B2
公开(公告)日：2003-06-03
申请号：US09836915
申请日：2001-04-18
申请人： Robert L. Rhoades , Paul J. Yancey
发明人： Robert L. Rhoades , Paul J. Yancey
IPC分类号： B24B100
CPC分类号： B24B37/04 , B24B57/02 , C09G1/02 , H01L21/3212
摘要： A dry solids composition is provided which may be reconstituted into a chemical-mechanical polishing composition comprising no abrasive particles.
摘要翻译： 提供干固体组合物，其可以重构成不包含磨料颗粒的化学机械抛光组合物。
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3.发明授权
公开(公告)号：US6143662A
公开(公告)日：2000-11-07
申请号：US252279
申请日：1999-02-18
IPC分类号： H01L21/3105 , H01L21/321 , H01L21/762 , H01L21/304
CPC分类号： H01L21/31055 , H01L21/3212 , H01L21/76229
摘要： The present invention provides a chemical mechanical polishing method for the planarization of shallow trench isolation structure and other integrated circuit structures. The method of the invention comprises the steps of providing a substrate having a plurality of patterned regions and polishing the substrate with a chemical mechanical polishing slurry comprising small abrasive particles having a mean diameter of between about 2 and 30 nm and large abrasive particles having a mean diameter of between 2 and 10 times larger than the mean diameter of the small abrasive particles. The chemical mechanical polishing slurries can also include viscosity additives and etchants for use in the invention.
摘要翻译： 本发明提供了一种用于平坦化浅沟槽隔离结构和其他集成电路结构的化学机械抛光方法。 本发明的方法包括以下步骤：提供具有多个图案化区域的基材和用包含平均直径在约2nm至30nm之间的小磨料颗粒的化学机械抛光浆料抛光该基材，以及具有平均值的大磨料颗粒 直径比小磨料颗粒的平均直径大2至10倍。 化学机械抛光浆料还可以包括用于本发明的粘度添加剂和蚀刻剂。
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公开(公告)号：US06365520B1
公开(公告)日：2002-04-02
申请号：US09620150
申请日：2000-07-20
IPC分类号： H01L21302
CPC分类号： H01L21/31055 , H01L21/3212 , H01L21/76229
摘要： The present invention provides a chemical mechanical polishing slurry for the planarization of shallow trench isolation structures and other integrated circuit structures. The chemical mechanical polishing slurry of this invention comprises small abrasive particles having a mean diameter of between about 2 and 30 nm and large abrasive particles having a mean diameter of between 2 and 10 times larger than the mean diameter of the small abrasive particles. In use, the chemical mechanical polishing slurry of this invention can also include viscosity additives and etchants.
摘要翻译： 本发明提供了用于平坦化浅沟槽隔离结构和其它集成电路结构的化学机械抛光浆料。 本发明的化学机械抛光浆料包括平均直径为约2nm至30nm的小磨料颗粒和平均直径比小磨料颗粒的平均直径大2至10倍的较大磨料颗粒。 在使用中，本发明的化学机械抛光浆料还可以包括粘度添加剂和蚀刻剂。
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公开(公告)号：US06413288B2
公开(公告)日：2002-07-02
申请号：US09847907
申请日：2001-05-03
申请人： Paul J. Yancey
发明人： Paul J. Yancey
IPC分类号： C09K314
CPC分类号： B24B37/04 , B24B57/02 , C09G1/02 , H01L21/3212
摘要： A dry particulate solids composition is provided which may be reconstituted into a chemical-mechanical polishing slurry.
摘要翻译： 提供干燥的颗粒固体组合物，其可以重构成化学机械抛光浆料。
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公开(公告)号：US06464741B2
公开(公告)日：2002-10-15
申请号：US10081706
申请日：2002-02-21
申请人： Paul J. Yancey
发明人： Paul J. Yancey
IPC分类号： C09K314
CPC分类号： B24B37/04 , B24B57/02 , C09G1/02 , H01L21/3212
摘要： A method of making a slurry, by mixing a quantity of water with dissolvable constituents of an aqueous slurry used for polishing, with the dissolvable constituents being apportioned according to their desired per cent concentrations thereof in the aqueous slurry, and drying the mixture to obtain a reconstitutable slurry having solids of the dissolvable constituents.
摘要翻译： 一种通过将一定量的水与用于抛光的含水浆料的可溶成分混合的可制成浆料的方法，其中可溶成分根据其在含水浆料中的所需百分数浓度分配，并将该混合物干燥以获得 具有可溶成分的固体的可再生浆料。
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公开(公告)号：US06428586B1
公开(公告)日：2002-08-06
申请号：US09734089
申请日：2000-12-11
申请人： Paul J. Yancey
发明人： Paul J. Yancey
IPC分类号： B32
CPC分类号： B24B37/205 , B24D3/28 , B24D11/001 , B24D18/009 , Y10T428/249971 , Y10T428/249972 , Y10T428/249974 , Y10T428/249976 , Y10T428/249981 , Y10T428/249986
摘要： Manufacture of a polishing pad for polishing a semiconductor substrate, involves, transporting a backing layer to successive manufacturing stations, supplying a fluid phase polymer composition onto the transported backing layer, shaping the fluid phase polymer composition into a surface layer having a measured thickness, and curing the polymer composition on the transported backing layer in a curing oven to convert the liquid phase polymer composition to a solid phase polishing layer attached to the transported backing layer.
摘要翻译： 用于抛光半导体衬底的抛光垫的制造涉及将背衬层输送到连续的制造站，将流体相聚合物组合物供应到所输送的背衬层上，将流体相聚合物组合物成形为具有测量厚度的表面层，以及 在固化烘箱中固化所输送的背衬层上的聚合物组合物，以将液相聚合物组合物转化成附着于运输背衬层的固相抛光层。
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公开(公告)号：US06241586B1
公开(公告)日：2001-06-05
申请号：US09413083
申请日：1999-10-06
申请人： Paul J. Yancey
发明人： Paul J. Yancey
IPC分类号： B24B100
CPC分类号： B24B37/04 , B24B57/02 , C09G1/02 , H01L21/3212
摘要： A dry particulate solids composition is provided which may be reconstituted into a chemical-mechanical polishing slurry.
摘要翻译： 提供干燥的颗粒固体组合物，其可以重构成化学机械抛光浆料。
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公开(公告)号：US4353875A
公开(公告)日：1982-10-12
申请号：US183518
申请日：1980-09-02
申请人： Paul J. Yancey
发明人： Paul J. Yancey
CPC分类号： C30B15/02 , C30B15/005 , C30B15/34 , C30B27/02 , Y10T117/1044 , Y10T117/1052
摘要： Improvement in apparatus for growing crystalline materials by seed pulling from a melt whereby crystalline product produced is substantially free of voids and/or inclusions which were previously caused by the continuous feeding operation. Source material is fed through a bed of particulate refractory material whereby entrained gases in the melting feed material are eliminated thereby resulting in a crystalline product which is substantially free of voids and inclusions. The apparatus improvement comprises providing an inner container for solid particulate material within a crucible and spaced therefrom which container has one or more openings at the bottom thereof to permit exiting of liquid therethrough to the crucible. Such apparatus is particularly adapted to effectuate the process improvement of the invention.
摘要翻译： 通过从熔体中提取种子来生长结晶材料的装置的改进，由此产生的结晶产品基本上没有由连续进料操作引起的空隙和/或夹杂物。 源材料通过颗粒状耐火材料床进料，从而消除熔融进料中的夹带气体，从而得到基本上没有空隙和夹杂物的结晶产物。 设备改进包括在坩埚内提供用于固体颗粒材料的内部容器并且与其隔开，该容器在其底部具有一个或多个开口以允许液体通过其排出到坩埚中。 这种装置特别适用于实现本发明的工艺改进。
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公开(公告)号：US4269652A
公开(公告)日：1981-05-26
申请号：US958089
申请日：1978-11-06
申请人： Paul J. Yancey
发明人： Paul J. Yancey
CPC分类号： C30B27/02 , C30B15/005 , C30B15/02 , C30B15/34
摘要： Improvement in the method for growing crystalline materials by seed pulling from a melt whereby crystalline product produced is substantially free of voids and/or inclusions which were previously caused by the continuous feeding operation. The improved method comprises feeding the source material through a bed of particulate refractory material whereby entrained gases in the melting feed material are eliminated thereby resulting in a crystalline product which is substantially free of voids and inclusions.
摘要翻译： 通过从熔体中提取种子来生长结晶物质的方法的改进，由此产生的结晶产物基本上没有先前由连续进料操作引起的空隙和/或夹杂物。 改进的方法包括将源材料通过颗粒状耐火材料床进料，由此消除熔融进料中的夹带气体，从而得到基本上没有空隙和夹杂物的结晶产物。
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