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公开(公告)号:US20090168042A1
公开(公告)日:2009-07-02
申请号:US12292962
申请日:2008-12-01
申请人: Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Gerardus Arnoldus Hendricus Franciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
发明人: Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Gerardus Arnoldus Hendricus Franciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
IPC分类号: G03B27/60
CPC分类号: G03F7/70341
摘要: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described.
摘要翻译: 公开了一种浸没式光刻投影装置。 所述设备包括用于保持基板的基板台,所述基板台被构造和布置成允许液体从所述基板流出并且超过所述基板台的顶表面的边缘,以及用于收集所述边缘下方的液体流的槽 。 描述了用于改善液体回收的几个特征。
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公开(公告)号:US08988650B2
公开(公告)日:2015-03-24
申请号:US13214289
申请日:2011-08-22
申请人: Jan Steven Christiaan Westerlaken , Engelbertus Antonius Fransiscus Van Der Pasch , Peter Paul Steijaert , Franciscus Van De Mast , Gerardus Arnoldus Hendricus Franciscus Janssen
发明人: Jan Steven Christiaan Westerlaken , Engelbertus Antonius Fransiscus Van Der Pasch , Peter Paul Steijaert , Franciscus Van De Mast , Gerardus Arnoldus Hendricus Franciscus Janssen
CPC分类号: G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
摘要: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
摘要翻译: 一种光刻设备,其具有第一出口以向至少部分传感器光束路径提供具有第一流动特性的热调节流体,以及与第一出口相关联的第二出口并提供具有第二流动特性的热调节流体, 与第一流动特性不同,邻近来自第一出口的热调节流体。
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