Gas inlets for wafer processing chamber
    1.
    发明授权
    Gas inlets for wafer processing chamber 失效
    晶圆处理室气体入口

    公开(公告)号:US5916369A

    公开(公告)日:1999-06-29

    申请号:US485058

    申请日:1995-06-07

    摘要: A system of supplying processing fluid to a substrate processing apparatus having walls, the inner surfaces of which define a processing chamber in which a substrate supporting susceptor is located. The system consists of a number of fluid storages, each which stores a separate processing fluid, at least two fluid conduits along which processing fluid flows from the fluid storages to the processing apparatus and a fluid inlet which connects the fluid conduits to the processing chamber. The inlet has a separate fluid passage, corresponding to each of the fluid conduits, formed along it. Each fluid passage opens at or near an inner surface of a wall to together define a fluid mixing zone, so that fluid moving along one fluid passage is prevented from mixing with fluid moving along any other passage until reaching the mixing zone.

    摘要翻译: 向具有壁的基板处理装置供给处理流体的系统,其内表面限定了处理室,基板支撑基座位于该处理室中。 该系统由许多流体储存器组成,每个流体存储器存储单独的处理流体,至少两个流体管道,处理流体从该流体流体流过流体储存器至处理装置;以及流体入口,其将流体导管连接到处理室。 入口具有与沿其形成的每个流体管道相对应的单独的流体通道。 每个流体通道在壁的内表面处或附近开口以一起限定流体混合区域,从而防止沿着一个流体通道移动的流体与沿着任何其它通道移动的流体混合直到到达混合区域。

    Gas inlets for wafer processing chamber
    2.
    发明授权
    Gas inlets for wafer processing chamber 失效
    晶圆处理室气体入口

    公开(公告)号:US06500734B2

    公开(公告)日:2002-12-31

    申请号:US09325597

    申请日:1999-06-02

    IPC分类号: H01L2120

    摘要: A system for supplying processing fluid to a substrate processing apparatus having walls, the inner surfaces of which define a processing chamber in which a substrate supporting susceptor is located. The system consists of a number of fluid storages, each which stores a separate processing fluid, at least two fluid conduits along which processing fluid flows from the fluid storages to the processing apparatus and a fluid inlet which connects the fluid conduits to the processing chamber. The inlet has a separate fluid passage, corresponding to each of the fluid conduits, formed along it. Each fluid passage opens at or near an inner surface of a wall to define a fluid mixing zone, so that fluid moving along one fluid passage is prevented from mixing with fluid moving along any other passage until reaching the mixing zone.

    摘要翻译: 一种用于向具有壁的基板处理装置提供处理流体的系统,其内表面限定了处理室,其中基板支撑基座位于该处理室中。 该系统由许多流体储存器组成,每个流体存储器存储单独的处理流体,至少两个流体管道,处理流体从该流体流体流过流体储存器至处理装置;以及流体入口,其将流体导管连接到处理室。 入口具有与沿其形成的每个流体管道相对应的单独的流体通道。 每个流体通道在壁的内表面处或附近打开以限定流体混合区,从而防止沿着一个流体通道移动的流体与沿着任何其它通道移动的流体混合直至到达混合区。