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1.发明授权Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods 有权组件包括调节系统和至少一个物体，调节系统，光刻设备和方法公开(公告)号：US07924399B2
公开(公告)日：2011-04-12
申请号：US11389493
申请日：2006-03-27
申请人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
发明人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70858 , G03F7/70866 , Y10T137/8593
摘要： An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
摘要翻译： 公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。 调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。
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2.发明授权Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods 失效组件包括调节系统和至少一个物体，调节系统，光刻设备和方法公开(公告)号：US08441610B2
公开(公告)日：2013-05-14
申请号：US13084372
申请日：2011-04-11
申请人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
发明人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70858 , G03F7/70866 , Y10T137/8593
摘要： An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
摘要翻译： 公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。 调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。
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3.发明授权Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus 失效用于调节装置制造装置的内部空间的平版印刷装置和方法公开(公告)号：US07728951B2
公开(公告)日：2010-06-01
申请号：US11238156
申请日：2005-09-29
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70883
摘要： A lithographic apparatus is disclosed that includes a first gas shower configured to supply a first gas flow to an interior space of the apparatus, and a second gas shower configured to supply a second gas flow to the interior space of the apparatus, the gas showers configured to direct the first gas flow and the second gas flow at least partly towards each other. Also, a method for conditioning an interior space of a device manufacturing apparatus is provided that includes supplying a first conditioned gas flow and a second conditioned gas flow to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.
摘要翻译： 公开了一种光刻设备，其包括构造成将第一气流提供给设备的内部空间的第一气体淋浴器和被配置为向设备的内部空间供应第二气流的第二气体淋浴器， 以引导第一气流和第二气流至少部分地朝向彼此。 此外，还提供了一种用于调节装置制造装置的内部空间的方法，其包括向所述内部空间供应第一调节气体流和第二调节气体流，使得所述第一调节气体流和所述第二调节气体流在 最少部分指向彼此。
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公开(公告)号：US07432513B2
公开(公告)日：2008-10-07
申请号：US11255195
申请日：2005-10-21
IPC分类号： G01N21/01
CPC分类号： G03F7/70908
摘要： A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical path, the gas distribution chamber being configured to distribute the gas to the optical path, wherein the gas distribution chamber includes a substantially sharp tapered tip.
摘要翻译： 一种用于调节光学装置中的至少一个光路的气体淋浴，其中所述气体淋浴器包括具有喷淋出口侧的气体分配室，用于向所述光路供应气体，所述气体分配室被配置为将所述气体分配到所述光学 路径，其中所述气体分配室包括基本尖锐的锥形尖端。
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公开(公告)号：US07227612B2
公开(公告)日：2007-06-05
申请号：US10937871
申请日：2004-09-10
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70883
摘要： A lithographic apparatus includes a support constructed to support a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an interior space through which an interferometer beam propagates, and a first gas supply for supplying a purge gas to inhibit contamination of the projection system. The purge gas has a predetermined refractive index. The apparatus also includes a second gas supply for supplying a conditioning gas to the interior space for conditioning the interior space, and a refractive index matching system arranged to match the refractive index of the conditioning gas to the predetermined refractive index of the purge gas.
摘要翻译： 光刻设备包括：支撑构件，用于支撑图案形成装置，该构图装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束;构造成保持衬底的衬底台;被配置为投影 图案化的辐射束到基板的目标部分，干涉仪光束传播的内部空间以及用于供应吹扫气体以抑制投影系统的污染的第一气体供应。 净化气体具有预定的折射率。 该设备还包括用于将调节气体供应到内部空间用于调节内部空间的第二气体供应源，以及折射率匹配系统，其布置成使调节气体的折射率与净化气体的预定折射率相匹配。
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公开(公告)号：US20090168037A1
公开(公告)日：2009-07-02
申请号：US12292963
申请日：2008-12-01
申请人： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
发明人： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.
摘要翻译： 公开了一种浸没式光刻投影装置。 该装置包括用于保持基板的基板台和用于向基板供应液体的液体供应系统。 该装置被构造和布置成允许液体从衬底流出并且在衬底台的顶表面的至少两个边缘之上。 可优化边缘的几何形状以减少顶表面上的液体层的静态厚度。
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公开(公告)号：US07253875B1
公开(公告)日：2007-08-07
申请号：US11366803
申请日：2006-03-03
申请人： Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Fransiscus Van Der Pasch , Ronald Van Der Ham , Niek Jacobus Johannes Roset
发明人： Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Fransiscus Van Der Pasch , Ronald Van Der Ham , Niek Jacobus Johannes Roset
CPC分类号： G03F7/70858 , G03F7/70775 , G03F7/70908
摘要： A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.
摘要翻译： 光刻设备包括用于测量衬底支撑件相对于参考框架的位置和/或运动的测量系统。 测量系统包括安装到基板支撑件和参考框架中的一个的目标，安装到基板支撑件和参考框架中的另一个的辐射源以及被配置为检测从目标传播的辐射图案的传感器，指示 衬底支撑件的位置或运动。 衬底支撑件包括一个或多个气体出口，其构造成提供封装辐射束通过其传播到靶的空间体积的气体流。
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8.发明授权Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method 有权气体歧管，光刻设备模块，光刻设备和器件制造方法公开(公告)号：US08675169B2
公开(公告)日：2014-03-18
申请号：US13273817
申请日：2011-10-14
申请人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
发明人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
CPC分类号： G03F7/70891 , G03F7/70091 , G03F7/70991
摘要： A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要翻译： 气体歧管，用于将气流引导到光刻设备的光学部件的两个板之间，气体歧管具有入口，入口下游的扩散器，入口下游的流动矫正器，流动矫直机下游的承重器， 和承包商下游的出口。
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9.发明授权Fluid handling structure, lithographic apparatus and device manufacturing method 有权流体处理结构，光刻设备和器件制造方法公开(公告)号：US08472003B2
公开(公告)日：2013-06-25
申请号：US12820991
申请日：2010-06-22
申请人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Geradus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendrikus Martinus Johannes Bloks
发明人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Geradus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendrikus Martinus Johannes Bloks
CPC分类号： H01L21/6715 , Y10T137/0318 , Y10T137/8593
摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。
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公开(公告)号：US08218126B2
公开(公告)日：2012-07-10
申请号：US12314023
申请日：2008-12-02
申请人： Koen Steffens , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Daniël Jozef Maria Direcks , Gert-Jan Gerardus Johannes Thomas Brands
发明人： Koen Steffens , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Daniël Jozef Maria Direcks , Gert-Jan Gerardus Johannes Thomas Brands
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller.
摘要翻译： 公开了一种液体处理系统，其中在平版印刷设备的投影系统和基板之间的空间中容纳液体的提取器在平面上具有单个角的形状。 提取器设置在液体处理系统的可旋转部分中。 可旋转部分在控制器的控制下旋转。
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