Semiconductor devices
    1.
    发明授权

    公开(公告)号:US10707254B2

    公开(公告)日:2020-07-07

    申请号:US16152625

    申请日:2018-10-05

    Abstract: Semiconductor devices are provided. The semiconductor devices may include a substrate, a device isolation pattern in the substrate to electrically isolate a first pixel and a second pixel from each other, a conductive pattern in the device isolation pattern, and a doping layer on a side surface of the device isolation pattern. The doping layer may have a conductivity type different from a conductivity type of the substrate.

    CMOS image sensor
    3.
    发明授权
    CMOS image sensor 有权
    CMOS图像传感器

    公开(公告)号:US09293489B2

    公开(公告)日:2016-03-22

    申请号:US14315730

    申请日:2014-06-26

    CPC classification number: H01L27/14621 H01L27/14627 H01L27/1463 H01L27/1464

    Abstract: An image sensor includes a semiconductor substrate, a storage node region in the semiconductor substrate, an insulating portion on the semiconductor substrate, a via contact extending through the insulating portion, a photo-electric converter in the semiconductor substrate and spaced apart from the storage node region, an organic photo-electric layer on the insulating portion, and a buffer interposed between and electrically connecting the via contact and the storage node region.

    Abstract translation: 图像传感器包括半导体衬底,半导体衬底中的存储节点区域,半导体衬底上的绝缘部分,延伸穿过绝缘部分的通孔接触,半导体衬底中的光电转换器,并与存储节点间隔开 区域,绝缘部分上的有机光电层,以及插入在电触点和存储节点区域之间并将其电连接的缓冲器。

    IMAGE SENSOR
    4.
    发明公开
    IMAGE SENSOR 审中-公开

    公开(公告)号:US20240321930A1

    公开(公告)日:2024-09-26

    申请号:US18612450

    申请日:2024-03-21

    Abstract: Provided is an image sensor including a first substrate including a first surface to which light is incident and a second surface opposite the first surface, a second substrate facing the second surface of the first substrate, a wiring layer between the first substrate and the second substrate and including an insulating layer and a conductive structure in the insulating layer, a first floating diffusion region provided in the first substrate, a first through electrode penetrating through the second substrate and electrically connected to the first floating diffusion region through the conductive structure, a second floating diffusion region provided in the second substrate, and a landing pad arranged on a bottom surface of the second substrate and electrically connected to the second floating diffusion region, wherein a bottom surface of the first through electrode may be in contact with the landing pad.

    Semiconductor devices
    5.
    发明授权

    公开(公告)号:US10134792B2

    公开(公告)日:2018-11-20

    申请号:US15499333

    申请日:2017-04-27

    Abstract: Semiconductor devices are provided. The semiconductor devices may include a substrate, a device isolation pattern in the substrate to electrically isolate a first pixel and a second pixel from each other, a conductive pattern in the device isolation pattern, and a doping layer on a side surface of the device isolation pattern. The doping layer may have a conductivity type different from a conductivity type of the substrate.

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