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公开(公告)号：US11107705B2
公开(公告)日：2021-08-31
申请号：US16505488
申请日：2019-07-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Beom Jin Yoo , Min Hyoung Kim , Sang Ki Nam , Won Hyuk Jang , Kyu Hee Han , Young Do Kim , Jeong Min Bang
Abstract: A cleaning solution production system is for cleaning a semiconductor substrate. The system includes a pressure tank, a plasma reaction tank configured to form a plasma in gas bubbles suspended in a decompressed liquid obtained from the pressure tank to thereby generate radical species in the decompressed liquid, a storage tank configured to store a cleaning solution containing the radical species generated in the plasma reaction tank, and a nozzle configured to supply the cleaning solution from the storage tank to a semiconductor substrate.
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公开(公告)号：US11664242B2
公开(公告)日：2023-05-30
申请号：US17381246
申请日：2021-07-21
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Beom Jin Yoo , Min Hyoung Kim , Sang Ki Nam , Won Hyuk Jang , Kyu Hee Han , Young Do Kim , Jeong Min Bang
CPC classification number: H01L21/67051 , H01J37/32541 , H01J37/32559 , H01J37/32568 , H01L21/02057 , H01L21/67017 , H01L21/67253 , H01J2237/335 , H01L21/02068
Abstract: A cleaning solution production system is for cleaning a semiconductor substrate. The system includes a pressure tank, a plasma reaction tank configured to form a plasma in gas bubbles suspended in a decompressed liquid obtained from the pressure tank to thereby generate radical species in the decompressed liquid, a storage tank configured to store a cleaning solution containing the radical species generated in the plasma reaction tank, and a nozzle configured to supply the cleaning solution from the storage tank to a semiconductor substrate.
