公开(公告)号：US20140104533A1

公开(公告)日：2014-04-17

申请号：US13787315

申请日：2013-03-06

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seon Uk Lee ,  Won Tae Kim ,  Yu Jin Kim ,  Woo Jae Lee ,  Kyung-Tae Chae

IPC: G02F1/1343

CPC classification number: G02F1/134363 ,  G02F1/133377 ,  G02F1/133707 ,  G02F1/136209 ,  G02F1/1393 ,  G02F2001/134345

Abstract: A manufacturing method of a liquid crystal display includes forming a sacrificial layer on a liquid crystal panel, forming an etch stop layer on the sacrificial layer, forming a photo resist pattern on the etch stop layer, completing the etch stop layer using the photo resist pattern as a mask, ashing the photo resist pattern and the sacrificial layer by using the completed etch stop layer as a mask, forming a microcavity by removing a portion of the sacrificial layer and forming a liquid crystal layer in the microcavity.

Abstract translation: 液晶显示器的制造方法包括在液晶面板上形成牺牲层，在牺牲层上形成蚀刻停止层，在蚀刻停止层上形成光刻胶图案，使用光刻胶图案完成蚀刻停止层 作为掩模，通过使用完成的蚀刻停止层作为掩模来灰化光致抗蚀剂图案和牺牲层，通过去除牺牲层的一部分并在微腔中形成液晶层来形成微腔。

公开(公告)号：US09140939B2

公开(公告)日：2015-09-22

申请号：US13787315

申请日：2013-03-06

Applicant: Samsung Display Co., Ltd.

Inventor： Seon Uk Lee ,  Won Tae Kim ,  Yu Jin Kim ,  Woo Jae Lee ,  Kyung-Tae Chae

IPC: G02F1/1341 ,  G02F1/1333 ,  G02F1/1337 ,  G02F1/1362 ,  G02F1/1343 ,  G02F1/139

CPC classification number: G02F1/134363 ,  G02F1/133377 ,  G02F1/133707 ,  G02F1/136209 ,  G02F1/1393 ,  G02F2001/134345

Abstract: A manufacturing method of a liquid crystal display includes forming a sacrificial layer on a liquid crystal panel, forming an etch stop layer on the sacrificial layer, forming a photo resist pattern on the etch stop layer, completing the etch stop layer using the photo resist pattern as a mask, ashing the photo resist pattern and the sacrificial layer by using the completed etch stop layer as a mask, forming a microcavity by removing a portion of the sacrificial layer and forming a liquid crystal layer in the microcavity.

Abstract translation: 液晶显示器的制造方法包括在液晶面板上形成牺牲层，在牺牲层上形成蚀刻停止层，在蚀刻停止层上形成光刻胶图案，使用光刻胶图案完成蚀刻停止层 作为掩模，通过使用完成的蚀刻停止层作为掩模来灰化光致抗蚀剂图案和牺牲层，通过去除牺牲层的一部分并在微腔中形成液晶层来形成微腔。