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公开(公告)号:US10971333B2
公开(公告)日:2021-04-06
申请号:US15723837
申请日:2017-10-03
Applicant: Samsung Electronics Co., Ltd.
Inventor: Dong-Hyub Lee , Dougyong Sung , Je-Hun Woo , Bongseong Kim , Juho Lee , Yun-Kwang Jeon , Junghyun Cho
Abstract: Embodiments of the inventive concepts provide antennas, plasma generating circuits, plasma processing apparatus, and methods for manufacturing semiconductor devices using the same. The circuits include radio-frequency power sources generating radio-frequency powers, antennas receiving the radio-frequency powers to generate plasma and having a first mutual inductance, and inductors connecting the antennas to the radio-frequency power sources, respectively. The inductors have a second mutual inductance reducing and/or canceling the first mutual inductance.
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公开(公告)号:US20220309643A1
公开(公告)日:2022-09-29
申请号:US17529403
申请日:2021-11-18
Applicant: Samsung Electronics Co., Ltd.
Inventor: Dong-Hyub Lee , Kyungsik Kang , Jeong-Gil Kim , Jinyong Kim , Hochul Kim , Yozo Matsuda , Youngduk Suh , Seungkoo Lee , Sungho Jang , Yoojin Jeong
Abstract: An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.
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公开(公告)号:US11676263B2
公开(公告)日:2023-06-13
申请号:US17529403
申请日:2021-11-18
Applicant: Samsung Electronics Co., Ltd.
Inventor: Dong-Hyub Lee , Kyungsik Kang , Jeong-Gil Kim , Jinyong Kim , Hochul Kim , Yozo Matsuda , Youngduk Suh , Seungkoo Lee , Sungho Jang , Yoojin Jeong
IPC: G06T7/00 , G02B5/10 , G02B5/20 , G02B5/08 , G01M11/00 , G03F7/20 , H04N23/56 , G02B27/10 , G03F7/00
CPC classification number: G06T7/0004 , G01M11/005 , G02B5/0816 , G02B5/0891 , G02B5/10 , G02B5/208 , G02B27/1013 , G03F7/70916 , H04N23/56 , G06T2207/10152
Abstract: An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.