公开(公告)号：US09443932B2

公开(公告)日：2016-09-13

申请号：US14330777

申请日：2014-07-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ki-Chul Kim ,  Joonghan Shin ,  Bongjin Kuh ,  Taegon Kim ,  Hanmei Choi

IPC: H01L21/70 ,  H01L29/06 ,  H01L27/092 ,  H01L21/8238

CPC classification number: H01L29/0696 ,  H01L21/823807 ,  H01L21/845 ,  H01L27/092 ,  H01L27/1211

Abstract: Provided are a semiconductor device and a method of fabricating the same. The semiconductor device may include a plurality of unit cells provided on a semiconductor substrate. Each of the unit cells may include a buried insulating pattern buried in the semiconductor substrate, a first active pattern provided on the buried insulating pattern, and a second active pattern provided on the buried insulating pattern and spaced apart from the first active pattern. The buried insulating pattern may define a unit cell region, in which each of the unit cells may be disposed.

Abstract translation: 提供半导体器件及其制造方法。 半导体器件可以包括设置在半导体衬底上的多个单元电池。 每个单电池可以包括埋在半导体衬底中的掩埋绝缘图案，设置在掩埋绝缘图案上的第一有源图案和设置在掩埋绝缘图案上并与第一有源图案间隔开的第二有源图案。 埋置的绝缘图案可以限定单位单元区域，其中可以布置每个单位单元。

公开(公告)号：US10269594B2

公开(公告)日：2019-04-23

申请号：US15203399

申请日：2016-07-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Nam Hoon Lee ,  Jungwoo Seo ,  Joonghan Shin ,  Byung Joo Oh ,  Jeongmin Lee ,  Gi-Nam Park ,  Jonghyun Lee

IPC: H05B3/00 ,  F21V9/00 ,  G02B5/00 ,  G02B5/20 ,  C23C14/48 ,  H01L21/67 ,  H01L21/687

Abstract: A transparent plate and a substrate processing system including the same are disclosed. The substrate processing system may include a chamber, a lamp provided below the chamber, and a plate provided in the chamber to load a substrate. The plate may include a center region having a first transmittance value and an edge region having with a second transmittance value higher than the first transmittance value.

公开(公告)号：US09728666B2

公开(公告)日：2017-08-08

申请号：US14141547

申请日：2013-12-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Bongjin Kuh ,  Kichul Kim ,  JeongMeung Kim ,  Joonghan Shin ,  Jongsung Lim ,  Hanmei Choi

IPC: H01L31/0248 ,  H01L31/105 ,  H01L31/0224 ,  H01L31/0232 ,  H01L31/0352 ,  H01L31/18

CPC classification number: H01L31/105 ,  H01L31/022408 ,  H01L31/02327 ,  H01L31/03529 ,  H01L31/1808 ,  H01L31/1872 ,  Y02E10/50 ,  Y02P70/521

Abstract: A semiconductor device includes a substrate, a first insulation layer formed on the substrate in a first region, a photon absorption seed layer formed on the first insulation layer in the first region and on the substrate in a second region separate from the first region, and a photon absorption layer formed on the photon absorption seed layer in the first region. The photon absorption seed layer has a particular structure that may assist in reducing dislocation density in a region that includes a photon absorption layer.

公开(公告)号：US20170076965A1

公开(公告)日：2017-03-16

申请号：US15203399

申请日：2016-07-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Nam Hoon Lee ,  Jungwoo Seo ,  Joonghan Shin ,  Byung Joo Oh ,  Jeongmin Lee ,  Gi-Nam Park ,  Jonghyun Lee

IPC: H01L21/67 ,  H01L21/687 ,  G02B5/00 ,  H05B3/00 ,  C23C14/48 ,  G02B5/20

CPC classification number: H01L21/67115 ,  C23C14/48 ,  G02B5/003 ,  G02B5/205 ,  H01L21/68735 ,  H01L21/6875 ,  H01L21/68757 ,  H05B3/0047

Abstract: A transparent plate and a substrate processing system including the same are disclosed. The substrate processing system may include a chamber, a lamp provided below the chamber, and a plate provided in the chamber to load a substrate. The plate may include a center region having a first transmittance value and an edge region having with a second transmittance value higher than the first transmittance value.

Abstract translation: 公开了一种透明板和包括该透明板的基板处理系统。 衬底处理系统可以包括腔室，设置在腔室下方的灯以及设置在腔室中以加载衬底的板。 该板可以包括具有第一透射率值的中心区域和具有比第一透射率值高的第二透射率值的边缘区域。