-
公开(公告)号：US11980052B2
公开(公告)日：2024-05-07
申请号：US17154165
申请日：2021-01-21
发明人： Sunghoon Lee , MyongJong Kwon , Wonjae Joo
CPC分类号： H10K50/854 , H10K50/15 , H10K50/16 , H10K50/171 , H10K50/868 , H10K71/00
摘要： A metasurface includes a substrate with a first surface area having first surface energy, and a second surface area formed to surround the first surface area and having second surface energy less than the first surface energy, a polymer layer provided on the substrate at a position corresponding to the first surface area and including a polymer material and a metal reflective layer provided on the polymer layer and having a phase modulation surface including metal.
-
公开(公告)号：US11640353B2
公开(公告)日：2023-05-02
申请号：US17570780
申请日：2022-01-07
发明人： Hyojin Jeong , Youngjoon Choi , Sunghoon Lee , Jae-Hyeon Ju
摘要： A data management method of a data storage device having a data management unit different from a data management unit of a user device receives information regarding a storage area of a file to be deleted, from the user device, selects a storage area which matches with the data management unit of the data storage device, from among the storage area of the deleted file, and performs an erasing operation on the selected storage area which matches with the data management unit.
-
公开(公告)号：US11448918B2
公开(公告)日：2022-09-20
申请号：US16777176
申请日：2020-01-30
发明人： Sunghoon Lee , Mark L. Brongersma , Brandon Born
IPC分类号： G02B5/18 , G02F1/1335 , G02B5/30 , G02B27/01
摘要： Provided are a grating device, a screen including the grating device, a method of manufacturing the screen, and a display apparatus including the screen. The grating device includes a transparent substrate and a diffraction grating arranged on the transparent substrate, the diffraction grating includes a plurality of meta-diffraction patterns, and each meta-diffraction pattern has a curved shape with a center of curvature provided in a direction parallel to the substrate. The screen includes a first polarizer, a second polarizer arranged next to the first polarizer, and a diffraction grating that is transparent to polarized light that has passed through the second polarizer and reflects polarized light having a polarization direction perpendicular to the polarized light, wherein the diffraction grating includes a plurality of meta-diffraction patterns, each meta-diffraction pattern having a curved shape with a center of curvature positioned in a travelling direction of incident light.
-
公开(公告)号：US11409941B2
公开(公告)日：2022-08-09
申请号：US17171267
申请日：2021-02-09
发明人： Sunghoon Lee
IPC分类号： G06F30/398 , G06F30/394 , G06F119/18
摘要： A method of designing a semiconductor chip includes: acquiring first data including information about arrangement of a plurality of cells on the semiconductor chip; acquiring second data including information about routing between the plurality of cells and power and signal lines; and outputting a verification result by detecting an error of arrangement of the plurality of cells based on matching of the first data and the second data.
-
公开(公告)号：US10718891B2
公开(公告)日：2020-07-21
申请号：US15870291
申请日：2018-01-12
发明人： Sunghoon Lee , Joonyong Park , Dongouk Kim , Jihyun Bae , Bongsu Shin , Dongsik Shim , Jaeseung Chung
摘要： An input coupler includes: a plurality of semi-reflectors located along an optical path along which a light incident from a light source travels, each of the plurality of semi-reflectors comprising a reflective surface that is inclined with respect to the optical path and configured to reflect a first portion of the light and transmit a second portion of the light; and a plurality of optical path changing members configured to change an optical path of the light transmitted through the plurality of semi-reflectors, wherein the plurality of semi-reflectors and the plurality of optical path changing members are arranged such that the light passing through at least one of the plurality of semi-reflectors and emitted in one direction has a linear beam distribution.
-
公开(公告)号：US10374074B2
公开(公告)日：2019-08-06
申请号：US15200293
申请日：2016-07-01
发明人： Jihyun Bae , Nae-Eung Lee , Doil Kim , Thanh Tien Nguyen , Sunghoon Lee , Sanghun Jeon
IPC分类号： H01L29/78 , A61B5/0205 , G01L9/00 , G01K7/16 , A61B5/024 , A61B5/01 , A61B5/021 , A61B5/0245 , A61B5/00
摘要： A flexible bimodal sensor includes a gate electrode; a flexible substrate; a source electrode disposed on the flexible substrate; a drain electrode disposed on the flexible substrate apart from the source electrode; a channel layer disposed on the source electrode and the drain electrode and a portion of the flexible substrate between the source electrode and the drain electrode; and a gate insulating layer comprising a plurality of protrusions, the gate insulating layer being disposed on the channel layer and arranged between the channel layer and the gate electrode. The drain electrode outputs a current signal simultaneously indicating a temperature value and a pressure value sensed by the flexible bimodal sensor.
-
公开(公告)号：US10007124B2
公开(公告)日：2018-06-26
申请号：US14838507
申请日：2015-08-28
发明人： Joonyong Park , Dongouk Kim , Jihyun Bae , Bongsu Shin , Jong G. Ok , Ilsun Yoon , Sunghoon Lee , Jaeseung Chung , Sukgyu Hahm
IPC分类号： H01L21/311 , H01L21/3065 , G02B27/62 , G02B5/30 , G02F1/1333
CPC分类号： G02B27/62 , G02B5/3058 , G02F1/13336 , G02F2001/133548 , H01L23/544 , H01L2223/54426
摘要： A master wafer includes: a plurality of unit wafers each including a pattern disposed thereon; a coupling surface defined on each of the unit wafers; and a coupling part which couples adjacent unit wafers among the plurality of unit wafers on which the coupling surface is defined, to each other.
-
公开(公告)号：US20160023400A1
公开(公告)日：2016-01-28
申请号：US14733172
申请日：2015-06-08
发明人： Jaeseung Chung , Dongouk Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Jong G. Ok , Ilsun Yoon , Sunghoon Lee , Sukgyu Hahm
IPC分类号： B29C59/16
CPC分类号： G03F7/0002
摘要： A method of transferring a reverse pattern using an imprint process includes: preparing a master mold, where a first pattern is defined on a surface of the master mold; coating an imprint resin on the master mold to cover the first pattern; pressing the imprint resin toward the master mold using a stamp member; curing the imprint resin to form a second pattern between the master mold and the stamp member, where the second pattern has a reverse shape to a shape of the first pattern; detaching the stamp member from the master mold to separate the second pattern from the master mold; and transferring the second pattern onto a transfer substrate.
摘要翻译： 使用压印处理传送反向图案的方法包括：准备主模具，其中第一图案被限定在主模具的表面上; 在母模上涂覆压印树脂以覆盖第一图案; 使用印模部件将压印树脂压向母模; 固化压印树脂以在主模和印模构件之间形成第二图案，其中第二图案具有与第一图案的形状相反的形状; 将印模部件从主模上拆下，将第二图案与主模分离; 并将第二图案转印到转印衬底上。
-
9.发明申请公开(公告)号：US20150323721A1
公开(公告)日：2015-11-12
申请号：US14541652
申请日：2014-11-14
发明人： Jaeseung Chung , Dongouk Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Sunghoon Lee , Sukgyu Hahm
IPC分类号： G02B5/30 , G02F1/1335
CPC分类号： G02B5/3058 , G02F1/133528 , G02F2001/133548
摘要： A wire grid polarizer includes a substrate, a first layer and a second layer disposed on the first layer, in which a first region and a second region are defined in the first layer, the first layer includes: a first wire grid including a plurality of first wires and disposed in the first region, where the first wires are spaced apart from each other, and no wire grid is disposed in the second region; and a first protection layer which covers the first wire grid, a third region and a fourth region are defined in the second layer, and the second layer includes a second wire grid including a plurality of second wires and disposed in the third region, where the second wires are spaced apart from each other, and no wire grid is disposed in the fourth region.
摘要翻译： 线栅偏振器包括基板，设置在第一层上的第一层和第二层，其中在第一层中限定第一区域和第二区域，第一层包括：第一线栅，包括多个 第一电线并且设置在第一区域中，其中第一电线彼此间隔开，并且在第二区域中不设置线栅; 并且覆盖第一线栅的第一保护层，第三区域和第四区域被限定在第二层中，并且第二层包括包括多个第二线并且设置在第三区域中的第二线栅格， 第二线彼此间隔开，并且在第四区域中不设置线栅。
-
公开(公告)号：US10928573B2
公开(公告)日：2021-02-23
申请号：US16858129
申请日：2020-04-24
发明人： Sunghoon Lee , Joonyong Park , Dongouk Kim , Jihyun Bae , Bongsu Shin , Dongsik Shim , Jaeseung Chung
IPC分类号： G02B5/30 , G03F7/00 , B28D5/02 , G02F1/1335
摘要： A method for manufacturing a pattern structure includes preparing a wafer that has a plurality of fine patterns, generating a first trench by processing the wafer from a first surface to a first depth, and generating a second trench connected to the first trench by processing the wafer from a second surface which is opposite to the first surface to a second depth, thereby cutting the wafer.
-
-
-
-
-
-
-
-
-
搜索结果
60 条记录 (耗时 0.022 秒)
