公开(公告)号：US20150145088A1

公开(公告)日：2015-05-28

申请号：US14554511

申请日：2014-11-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sungkwan Kim ,  Soo-Kyung Kim ,  Jung-kuk Park ,  Myung-Sun Kim ,  Jaesung Yun ,  Junetaeg Lee ,  Hakyu Choi

IPC: H01L27/146

CPC classification number: H01L27/14645 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14685

Abstract: A method of fabricating an image sensor is provided. The method may include preparing a substrate with first to third pixel regions, coating a first color filter layer on the substrate, sequentially forming a first sacrificial layer and a first protection layer to cover the first color filter layer, forming a first photoresist pattern on the first protection layer to be overlapped with the first pixel region, performing a first dry etching process using the first photoresist pattern as an etch mask to the first sacrificial layer and the first protection layer to form a first color filter, a first sacrificial pattern, and a first protection pattern sequentially stacked on the first pixel region, and selectively removing the first sacrificial pattern to separate the first protection pattern from the first color filter.

Abstract translation: 提供了一种制造图像传感器的方法。 该方法可以包括制备具有第一至第三像素区域的衬底，在衬底上涂覆第一滤色器层，顺序地形成第一牺牲层和第一保护层以覆盖第一滤色器层，在第一滤色器层上形成第一光致抗蚀剂图案 第一保护层与第一像素区域重叠，执行使用第一光致抗蚀剂图案作为第一牺牲层和第一保护层的蚀刻掩模的第一干蚀刻工艺以形成第一滤色器，第一牺牲图案和 第一保护图案，其顺序地堆叠在第一像素区域上，并且选择性地去除第一牺牲图案以将第一保护图案与第一滤色器分离。

公开(公告)号：US20240063243A1

公开(公告)日：2024-02-22

申请号：US18300009

申请日：2023-04-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Juyeon IM ,  Sungkwan Kim ,  Junetaeg Lee ,  Doojin Kim ,  Minwook Jung

IPC: H01L27/146

CPC classification number: H01L27/14627 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/14636

Abstract: An image sensor includes a substrate including a pixel array region and an optical black region surrounding the pixel array region, a micro lens over the pixel array region, a dummy lens over the optical black region, and a blocking bar over the optical black region. A length of the blocking bar is greater than a length of the micro lens and a length of the dummy lens. A top surface of the blocking bar is curved.

公开(公告)号：US20220359596A1

公开(公告)日：2022-11-10

申请号：US17719836

申请日：2022-04-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Doojin KIM ,  Junetaeg LEE ,  Sungkwan Kim ,  Seokha LEE

IPC: H01L27/146

Abstract: An image sensor is provided. The image sensor includes: a substrate including a pixel array zone; a microlens layer on the substrate in the pixel array zone; a first passivation layer on the microlens layer; and a second passivation layer on the first passivation layer, wherein the microlens layer includes: a first lens pattern; a second lens pattern at a side of the first lens pattern; and a first point where the first lens pattern meets the second lens pattern, and at least one of the first passivation layer and the second passivation layer is on the first lens pattern, the second lens pattern, and the first point.

公开(公告)号：US09263495B2

公开(公告)日：2016-02-16

申请号：US14554511

申请日：2014-11-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sungkwan Kim ,  Soo-Kyung Kim ,  Jung-kuk Park ,  Myung-Sun Kim ,  Jaesung Yun ,  Junetaeg Lee ,  Hakyu Choi

IPC: H01L21/00 ,  H01L27/146

CPC classification number: H01L27/14645 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14685

Abstract: A method of fabricating an image sensor is provided. The method may include preparing a substrate with first to third pixel regions, coating a first color filter layer on the substrate, sequentially forming a first sacrificial layer and a first protection layer to cover the first color filter layer, forming a first photoresist pattern on the first protection layer to be overlapped with the first pixel region, performing a first dry etching process using the first photoresist pattern as an etch mask to the first sacrificial layer and the first protection layer to form a first color filter, a first sacrificial pattern, and a first protection pattern sequentially stacked on the first pixel region, and selectively removing the first sacrificial pattern to separate the first protection pattern from the first color filter.

Abstract translation: 提供了一种制造图像传感器的方法。 该方法可以包括制备具有第一至第三像素区域的衬底，在衬底上涂覆第一滤色器层，顺序地形成第一牺牲层和第一保护层以覆盖第一滤色器层，在第一滤色器层上形成第一光致抗蚀剂图案 第一保护层与第一像素区域重叠，执行使用第一光致抗蚀剂图案作为第一牺牲层和第一保护层的蚀刻掩模的第一干蚀刻工艺以形成第一滤色器，第一牺牲图案和 第一保护图案，其顺序地堆叠在第一像素区域上，并且选择性地去除第一牺牲图案以将第一保护图案与第一滤色器分离。