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    Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium
    3.
    发明授权
    Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium 有权
    带电粒子束的写入方法，带电粒子束写入装置的支持装置，写入数据生成方法和程序记录的可读记录介质

    公开(公告)号：US07495243B2

    公开(公告)日：2009-02-24

    申请号：US11682494

    申请日：2007-03-06

    申请人： Takashi Kamikubo

    发明人： Takashi Kamikubo

    IPC分类号： G03F7/20 ,  H01J3/14 ,  H01J37/302

    CPC分类号： H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

    摘要： A charged particle beam writing method includes inputting design pattern data, virtually dividing a writing area to be written with the design pattern data into a plurality of small areas in a mesh-like manner, calculating a pattern density in each of the plurality of small areas based on the design pattern data, calculating a resizing amount for each pattern density in a case of irradiating a charged particle beam at an isofocal dose, resizing a dimension of the design pattern data in each of the plurality of small areas, based on the resizing amount in each of the plurality of small areas, and writing a resized design pattern on a target workpiece with the isofocal dose corresponding to the pattern density which was calculated before the resizing in each of the plurality of small areas.

    摘要翻译： 带电粒子束写入方法包括输入设计图案数据，将以设计图案数据写入的写入区域虚拟地分成多个小区域，以网格状方式计算多个小区域中的图案密度 基于设计图案数据，在以异焦点剂量照射带电粒子束的情况下，计算每个图案密度的调整量，基于调整尺寸来调整多个小区域中的每一个中的设计图案数据的尺寸 在多个小区域的每一个区域中的量，并且将具有对应于在多个小区域中的每个小区域中调整大小之前计算的图案密度的等效剂量的目标工件上的调整尺寸的设计图案写入。

    CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD
    4.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD 审中-公开
    充电颗粒光束书写装置和方法

    公开(公告)号：US20080265174A1

    公开(公告)日：2008-10-30

    申请号：US12103321

    申请日：2008-04-15

    申请人： Makoto HIRAMOTO ,  Takashi Kamikubo ,  Shuichi Tamamushi

    发明人： Makoto HIRAMOTO ,  Takashi Kamikubo ,  Shuichi Tamamushi

    IPC分类号： H01J3/26

    CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0209 ,  H01J2237/3045 ,  H01J2237/30461

    摘要： A charged particle beam writing apparatus includes an unit configured to irradiate a beam, a deflector configured to deflect the beam, a stage, on which a target is placed, configured to perform moving continuously, an lens configured to focus the beam onto the target, an unit configured to calculate a correction amount for correcting positional displacement of the beam on a surface of the target resulting from a first magnetic field caused by the lens and a second magnetic field caused by an eddy current generated by the first magnetic field and the moving of the stage, an unit configured to calculate a correction position where the positional displacement on the surface of the target has been corrected using the correction amount, and an unit configured to control the deflector so that the beam may be deflected onto the correction position.

    摘要翻译： 带电粒子束写入装置包括被配置为照射光束的单元，被配置为使光束偏转的偏转器，配置有目标的台阶，其被配置为连续地进行移动;配置成将光束聚焦到目标上的透镜， 被配置为计算校正量，用于校正由由透镜引起的第一磁场产生的目标表面上的光束的位置偏移和由由第一磁场和移动的所产生的涡流引起的第二磁场 所述单元被配置为使用所述校正量来计算已经校正了所述目标的表面上的位置偏移的校正位置，以及被配置为控制所述偏转器使得所述光束可能偏转到所述校正位置的单元。

    Pigment dispersant, and pigment composition, pigment dispersion and printing ink using the same
    5.
    发明授权
    Pigment dispersant, and pigment composition, pigment dispersion and printing ink using the same 有权
    颜料分散剂和颜料组合物，颜料分散体和使用其的印刷油墨

    公开(公告)号：US07083674B1

    公开(公告)日：2006-08-01

    申请号：US11218611

    申请日：2005-09-06

    申请人： Takashi Kamikubo ,  Tetsuya Sai

    发明人： Takashi Kamikubo ,  Tetsuya Sai

    IPC分类号： C09B67/20 ,  C09B67/22 ,  C08K5/23 ,  C09D11/00

    CPC分类号： C09D11/037 ,  C08K5/23 ,  C08K5/42 ,  C09B35/021 ,  C09D7/41 ,  C09D11/322

    摘要： A pigment dispersant represented by the following general formula (1) is provided: wherein R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 each independently is —H, —Cl, —CH3, —CF3, —NO2, —COOCH(CH3)2 or —COOCH2CH2Cl; R11, R12, R13 and R14 each independently is —H, —Cl, —CH3 or —CN; M is one equivalent of a bivalent or trivalent metal; and n is an integer of 1 to 3.

    摘要翻译： 提供由以下通式（1）表示的颜料分散剂：其中R 1，R 2，R 3，R 3， R 5，R 5，R 6，R 7，R 8，R 8， 9和R 10各自独立地是-H，-Cl，-CH 3，-CF 3，-NO，SUB -COOCH（CH 3 3）2或-COOCH 2 CH 2 Cl; R 11，R 12，R 13和R 14各自独立地是-H，-Cl，-CH 3或-CN; M为二价或三价金属当量; n为1〜3的整数。

    Pigment dispersing agent, composition containing the same, and aqueous pigment dispersion
    6.
    发明授权
    Pigment dispersing agent, composition containing the same, and aqueous pigment dispersion 失效
    颜料分散剂，含有它们的组合物和水性颜料分散体

    公开(公告)号：US5854323A

    公开(公告)日：1998-12-29

    申请号：US712452

    申请日：1996-09-11

    申请人： Tadashi Itabashi ,  Takashi Kamikubo ,  Katsuhiko Sawamura

    发明人： Tadashi Itabashi ,  Takashi Kamikubo ,  Katsuhiko Sawamura

    IPC分类号： C09B67/46 ,  C09D17/00 ,  C08K5/34 ,  C08L39/00

    CPC分类号： C09D17/001 ,  C09B67/009

    摘要： The present invention provide an aqueous type pigment dispersing agent having one portion which has a high affinity with a pigment and which has at least one type of selected from the group consisting of an organic dye, anthraquinone and acridone and only at a terminal end or at both terminal ends of at least one aqueous polymer selected from an aqueous linear urethanic polymer and an aqueous linear acrylic polymer, a pigment composition using the same and a pigment dispersion. The portion having a high affinity with the pigment can be adsorbed efficiently on the surface of a pigment. At the same time, for example, a pigment, used for ink or paint can be dispersed stably due to the affinity between the polymer portion and a disperse medium to improve the adaptability in use and the quality of coating articles.

    摘要翻译： 本发明提供一种水性颜料分散剂，其一部分与颜料具有高亲和力，并且具有至少一种选自有机染料，蒽醌和吖啶酮的类型，并且仅在末端或在 至少一种选自水性线性聚氨酯聚合物和水性线性丙烯酸类聚合物的含水聚合物的末端，使用其的颜料组合物和颜料分散体。 与颜料具有高亲和力的部分可以有效地吸附在颜料的表面上。 同时，例如，由于聚合物部分和分散介质之间的亲和性，可以稳定地分散用于油墨或涂料的颜料，以提高使用中的适应性和涂布品的质量。

    CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORRECTION METHOD THEREOF
    8.
    发明申请
    CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORRECTION METHOD THEREOF 有权
    充电粒子束绘图装置及其近似效应校正方法

    公开(公告)号：US20110068281A1

    公开(公告)日：2011-03-24

    申请号：US12882713

    申请日：2010-09-15

    申请人： Shigehiro HARA ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Hitoshi Higurashi ,  Shinji Sakamoto ,  Yusuke Sakai ,  Yoshihiro Okamoto ,  Akihito Anpo

    发明人： Shigehiro HARA ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Hitoshi Higurashi ,  Shinji Sakamoto ,  Yusuke Sakai ,  Yoshihiro Okamoto ,  Akihito Anpo

    IPC分类号： G21K5/10 ,  G03F7/20

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/31769 ,  H01J2237/31776

    摘要： A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.

    摘要翻译： 带电粒子束描绘装置形成具有网格的图，形成代表性图，每个网格中每个代表图的面积等于每个网格中的图形的总面积，并计算每个网格中的带电粒子束的邻近效应校正剂量 在每个网格中每个代表人物的面积的基础上。 如果需要改变带电粒子束的接近效应校正剂量以绘制与至少一个图形相对应的至少一个图案，则带电粒子束描绘装置在代表性图形形成之前改变至少一个图形的面积， 代表图形形成部分，并且改变用于绘制由邻近效应校正剂量计算部分计算的与至少一个图形相对应的至少一个图案的带电粒子束的邻近效应校正剂量。

    Lithography method of electron beam
    9.
    发明申请
    Lithography method of electron beam 审中-公开
    电子束光刻法

    公开(公告)号：US20100178611A1

    公开(公告)日：2010-07-15

    申请号：US12659774

    申请日：2010-03-22

    申请人： Hirohito Anze ,  Takehiko Katsumata ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Rieko Nishimura ,  Makoto Hiramoto ,  Tomoo Motosugi ,  Takazuki Ohnishi

    发明人： Hirohito Anze ,  Takehiko Katsumata ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Rieko Nishimura ,  Makoto Hiramoto ,  Tomoo Motosugi ,  Takazuki Ohnishi

    IPC分类号： G03F7/20

    CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/78 ,  G03F7/0382 ,  G03F7/0392 ,  H01J37/3174

    摘要： A charged particle beam writing method on a chemical amplification type resist, comprising: coating said chemical amplification type resist which contains an acid diffusion inhibitor, on a surface of a mask substrate, exposing charged particle beams to said chemical amplification type resist layer on said surface of the mask substrate, baking said chemical amplification type resist layer which said charged particle beams were exposed, and developing said chemical amplification type resist after the baking, wherein an exposure current density of said electron beams exposing ranges of 50˜5000 A/cm2, said photo acid generator is in an amount ranging from 0.1 to 30 weight percent (wt %) relative to all solid content of said chemical amplification type resist, and said acid diffusion inhibitor is composed of at least one material selected from the group consisting of tertiary amine class, benzyl-carbamate class, benzoin-carbamate class, o-carbamoyl-hydroxy-amine class, o-carbamoyl-oxime class, and dithio-calbamate-quaternary ammonium salt.

    摘要翻译： 一种化学放大型抗蚀剂的带电粒子束写入方法，包括：在掩模基板的表面上涂覆含有酸扩散抑制剂的所述化学放大型抗蚀剂，将带电粒子束暴露于所述表面上的所述化学放大型抗蚀剂层 对所述带电粒子束进行曝光的所述化学放大型抗蚀剂层进行烘烤，烘烤后显影所述化学放大型抗蚀剂，其中所述电子束的曝光电流密度为50〜5000A / cm 2， 所述光酸产生剂的量相对于所述化学增幅型抗蚀剂的全部固体含量为0.1〜30重量％（重量％），所述酸扩散抑制剂由选自三级 胺类，氨基甲酸苄酯类，苯偶姻 - 氨基甲酸酯类，邻氨基甲酰基 - 羟基 - 胺类，邻氨基甲酰基肟 屁股和二硫代氨基甲酸铵 - 季铵盐。

    BICYCLIC HETEROCYCLIC COMPOUND
    10.
    发明申请
    BICYCLIC HETEROCYCLIC COMPOUND 审中-公开
    双相杂环化合物

    公开(公告)号：US20100113391A1

    公开(公告)日：2010-05-06

    申请号：US12596643

    申请日：2008-04-17

    申请人： Yuji Koga ,  Takao Okuda ,  Takashi Kamikubo ,  Michihito Kageyama ,  Hiroyuki Moritomo

    发明人： Yuji Koga ,  Takao Okuda ,  Takashi Kamikubo ,  Michihito Kageyama ,  Hiroyuki Moritomo

    IPC分类号： A61K31/695 ,  C07D215/22 ,  C07D239/80 ,  C07F7/02 ,  C07D243/14 ,  A61K31/47 ,  A61K31/517 ,  A61K31/5513 ,  A61P7/02

    CPC分类号： C07D217/24 ,  C07D239/96 ,  C07D243/14 ,  C07D401/06 ,  C07D403/12 ,  C07D405/04 ,  C07D405/06 ,  C07D413/06 ,  C07D417/06

    摘要： [Problem]Provided is a compound, which exhibits a P2Y12 inhibitory action and is useful as a medical drug, particularly, as a platelet aggregation inhibitor.[Means for Solution]The inventors have eagerly investigated P2Y12 inhibitors. As a result, the inventors have found that a bicyclic heterocyclic compound such as quinazolinedione, isoquinolone, and the like having an amino group substituted with lower alkyl, cycloalkyl, or lower alkylene-cycloalkyl at the specific position exhibits an excellent platelet aggregation inhibitory action, thereby completing the present invention. Since the compound of the invention exhibits excellent P2Y12 inhibitory action and platelet aggregation inhibitory action, it is useful as a platelet aggregation inhibitor.

    摘要翻译： [问题]提供了表现出P2Y12抑制作用的化合物，可用作医药，特别是作为血小板聚集抑制剂。 解决方法本发明人急切地研究P2Y12抑制剂。 结果发现，在具体位置具有被低级烷基，环烷基或低级亚烷基 - 环烷基取代的氨基的喹唑啉二酮，异喹诺酮等双环杂环化合物显示优异的血小板聚集抑制作用， 从而完成了本发明。 由于本发明化合物表现出优异的P2Y12抑制作用和血小板聚集抑制作用，因此作为血小板聚集抑制剂是有用的。